An electrode plate includes: a plurality of plate-like electrode members; and a joining part joining the electrode members to each other in a thickness direction. The joining part has a heat resistance to withstand a temperature of at least 150 C., melts at 700 C. or below.

A boron carbide sintered body includes necked boron carbide-containing particles. The thermal conductivity of the boron carbide sintered body at 400 C. is 27 W/m.Math.K or less and the ratio of the thermal conductivity of the boron carbide sintered body at 25 C. to that of the boron carbide sintered body at 800 C. is 1:0.2 to 1:3.

In an embodiment, a plasma source includes a first electrode, configured for transfer of one or more plasma source gases through first perforations therein; an insulator, disposed in contact with the first electrode about a periphery of the first electrode; and a second electrode, disposed with a periphery of the second electrode against the insulator such that the first and second electrodes and the insulator define a plasma generation cavity. The second electrode is configured for movement of plasma products from the plasma generation cavity therethrough toward a process chamber. A power supply provides electrical power across the first and second electrodes to ignite a plasma with the one or more plasma source gases in the plasma generation cavity to produce the plasma products. One of the first electrode, the second electrode and the insulator includes a port that provides an optical signal from the plasma.

A liquid treatment apparatus includes a flow channel, first and second electrodes at least part of each of which is disposed within the flow channel, an insulator, a gas supply device, and a power supply source that applies a voltage between the first and second electrodes and generates plasma. The insulator has a tubular shape and an opening on an end surface of the insulator, and surrounds a lateral surface of the first electrode with a space interposed between the insulator and the first electrode. The gas supply device supplies and ejects a gas into the liquid via the opening. At least part of the flow channel extends in a first direction which is inclined with respect to a horizontal direction so that the liquid flows obliquely upward with respect to the horizontal direction. The opening is positioned within the at least part of the flow channel.

A ring-shaped element for an etcher includes a body portion having an outer diameter surface connecting an outer contour of an upper surface and an outer contour of a bottom surface, and an inner diameter surface connected to an inner contour of the upper surface, and a mounting portion having an upper surface connected to the inner diameter surface of the body portion at a position lower than the upper surface of the body portion, and an inner diameter surface connecting an inner contour of the upper surface and an inner contour of a bottom surface. The upper surface of the mounting portion is stepped from the upper surface of the body portion to constitute a substrate mounting portion. The surface or entire body of the ring-shaped element includes necked boron carbide-containing particles, and the thermal conductivity of the ring-shaped element at 400 C. is 27 W/m.Math.K or less.

A system and method for reducing particle contamination on substrates during a deposition process using a particle control system is disclosed here. In one embodiment, a film deposition system includes: a processing chamber sealable to create a pressurized environment and configured to contain a plasma, a target and a substrate in the pressurized environment; and a particle control unit, wherein the particle control unit is configured to provide an external force to each of at least one charged atom and at least one contamination particle in the plasma, wherein the at least one charged atom and the at last one contamination particle are generated by the target when it is in direct contact with the plasma, wherein the external force is configured to direct the at least one charged atom to a top surface of the substrate and to direct the at least one contamination particle away from the top surface of the substrate.

According to the present invention, an electrode plate for a plasma processing apparatus is provided, which includes an air hole through which a gas for plasma generation passes, the electrode plate for a plasma processing apparatus including: a base; and a coating layer provided on at least one front surface of the base, and in which the base is formed of a material having a plasma resistance higher than the plasma resistance of a material forming the coating layer.

An embodiment of the present invention provides a part for manufacturing a semiconductor, the part comprising a composite containing SiC and C, wherein an atomic ratio of Si:C in the composite is 1:1.1 to 1:2.8.

A method includes anisotropically etching an etching target layer of a target object through an opening of the target object by generating plasma of a first gas within a processing vessel in which the target object is accommodated; and then forming a film on an inner surface of the opening by repeating a sequence comprising: a first process of supplying a second gas into the processing vessel; a second process of purging a space within the processing vessel; a third process of generating plasma of a third gas containing an oxygen atom within the processing vessel; and a fourth process of purging the space within the processing vessel. The first gas contains a carbon atom and a fluorine atom. The second gas contains an aminosilane-based gas. The etching target layer is a hydrophilic insulating layer containing silicon. Plasma of the first gas is not generated in the first process.

A ring-shaped electrode includes a silicon ring body, and a cover body joined to at least a part of a surface of the ring body via a joining part, and having a better plasma resistance than silicon. The joining part has a heat resistance to withstand a temperature of at least 150 C., melts at 700 C. or below, and contains boron oxide.