H01J49/142

Surface Hydration with an Ion Beam
20230282470 · 2023-09-07 ·

Systems and methods for controllably forming an analyte layer comprising amorphous ice and/or other frozen amorphous solids on a substrate. In an embodiment, the present invention provides simplified systems and methods for the preparation of cryo-EM samples, where the same particle beam, such as an ion beam, is used to deposit the desired analyte onto the substrate as well as to generate the amorphous ice or frozen solid layer on the substrate

NANOPARTICULATE ASSISTED NANOSCALE MOLECULAR IMAGING BY MASS SPECTROMETRY

Methods and devices for mass spectrometry are described, specifically the use of nanoparticulate implantation as a matrix for secondary ion and more generally secondary particles. A photon beam source or a nanoparticulate beam source can be used a desorption source or a primary ion/primary particle source.

High-throughput label-free enzymatic bioassays using DESI-MS

The invention generally relates to high-throughput label-free enzymatic bioassays using desorption electrospray ionization-mass spectrometry (DESI-MS).

HIGH-THROUGHPUT LABEL-FREE ENZYMATIC BIOASSAYS USING DESI-MS
20220326180 · 2022-10-13 ·

The invention generally relates to high-throughput label-free enzymatic bioassays using desorption electrospray ionization-mass spectrometry (DESI-MS).

SAMPLE ANALYSIS SYSTEMS AND METHODS OF USE THEREOF
20220301844 · 2022-09-22 ·

The invention generally relates to sample analysis systems and methods of use thereof. In certain aspects, the invention provides a system for analyzing a sample that includes an ion generator configured to generate ions from a sample. The system additionally includes an ion separator configured to separate at or above atmospheric pressure the ions received from the ion generator without use of laminar flowing gas, and a detector that receives and detects the separated ions.

SYSTEMS AND METHODS FOR CONDUCTING REACTIONS AND SCREENING FOR REACTION PRODUCTS
20220277948 · 2022-09-01 ·

The invention generally relates to systems and methods for conducting reactions and screening for reaction products.

Nanoparticulate assisted nanoscale molecular imaging by mass spectrometry

Methods and devices for mass spectrometry are described, specifically the use of nanoparticulate implantation as a matrix for secondary ion and more generally secondary particles. A photon beam source or a nanoparticulate beam source can be used a desorption source or a primary ion/primary particle source.

Sample analysis systems and methods of use thereof

The invention generally relates to sample analysis systems and methods of use thereof. In certain aspects, the invention provides a system for analyzing a sample that includes an ion generator configured to generate ions from a sample. The system additionally includes an ion separator configured to separate at or above atmospheric pressure the ions received from the ion generator without use of laminar flowing gas, and a detector that receives and detects the separated ions.

HIGH RESOLUTION IMAGING APPARATUS AND METHOD
20220223398 · 2022-07-14 · ·

The present invention relates to the high resolution imaging of samples using imaging mass spectrometry (IMS) and to the imaging of biological samples by imaging mass cytometry (IMC™) in which labelling atoms are detected by IMS. LA-ICP-MS (a form of IMS in which the sample is ablated by a laser, the ablated material is then ionised in an inductively coupled plasma before the ions are detected by mass spectrometry) has been used for analysis of various substances, such as mineral analysis of geological samples, analysis of archaeological samples, and imaging of biological substances. However, traditional LA-ICP-MS systems and methods may not provide high resolution. Described herein are methods and systems for high resolution IMS and IMC.

Inspection system and inspection method to qualify semiconductor structures

An inspection system serves to qualify semiconductor structures. The inspection system has an ion beam source for space-resolved exposition of the structures to be qualified with an ion beam. The inspection system also includes a secondary ion detection device with a mass spectrometer. The mass spectrometer is configured to measure an ion mass to charge ratio in a given bandwidth.