In a system for processing gas, a gas analyzer in a gas analyzer chamber measures a quantity of ions generated from a gas. An ionization source includes an ionization chamber and an electron source for generating ions for the gas analyzer. The ionization chamber encompasses an ionization region in which particles of the gas are charged to form the ions. A channel directs the gas from a gas source into the ionization chamber, and the channel extends to a surface of the ionization chamber. An ionization source vacuum pump is in gaseous communication with the ionization chamber via a substantially large opening, and operates to draw gas from the ionization chamber.

An electron source in a gas-source mass spectrometer the electron source comprising: an electron emitter cathode presenting a thermionic electron emitter surface in communication with a gas-source chamber of the gas-source mass spectrometer for providing electrons there to; a heater element electrically isolated from the electron emitter cathode and arranged to be heated by an electrical current therein and to radiate heat to the electron emitter cathode sufficient to liberate electrons thermionically from said electron emitter surface, therewith to provide a source of electrons for use in ionising a gas the gas-source chamber.

In an embodiment of the present ambient ionization experiment, the abundance of background chemicals relative to ions of interest is decreased by pulsing the carrier gas used to generate the excited species directed at the sample. The excited species are stepwise directed at the sample reducing the overall abundance of background chemicals introduced into the ionizing region. In an embodiment of the present ambient ionization experiment, the combination of stepping the sample in front of the excited species and pulsing the carrier gas used to generate the excited species increases the sensitivity of detection.

A method for detecting radicals in process gases in a semiconductor fabrication assembly is provided where the semiconductor fabrication includes a plasma source and a mass spectrometer with an ion source. The method includes separating ions from the process gases and determining a fixed electron energy in which to measure the process gases. Process gases in the semiconductor fabrication assembly are continuously sampled. A first measurement is performed on the sampled process gases at the electron energy using the mass spectrometer, where the first measurement is performed with the plasma source off. A second measurement of the sampled process gases is performed at the fixed electron energy using the mass spectrometer, where the second measurement is performed with the plasma source on. An amount of a radical present in the sampled process gases is determined as a difference between the second measurement and the first measurement.

An electron source in a gas-source mass spectrometer the electron source comprising: an electron emitter cathode presenting a thermionic electron emitter surface in communication with a gas-source chamber of the gas-source mass spectrometer for providing electrons there to; a heater element electrically isolated from the electron emitter cathode and arranged to be heated by an electrical current therein and to radiate heat to the electron emitter cathode sufficient to liberate electrons thermionically from said electron emitter surface, therewith to provide a source of electrons for use in ionising a gas the gas-source chamber.

A spectroscopy device including: an electron source arranged to emit a flux of electrons towards a sample, a pulsed photon source emitting photon pulses towards the sample, at least one spectrometer for receiving a flux of electrons originating from the sample, at least one electron detector; and
at least one deflector, between the electron source and the at least one electron detector, synchronized with the pulsed photon source to allow or prevent the passage of electrons emitted by the electron source, towards the electron detector.

An analyzer apparatus (1) includes: an ionization unit (11) that ionizes molecules to analyze; a filter unit (13) that forms a field for selectively passing ions generated by the ionization unit; a detector unit (14) that detects ions that have passed through the filter unit; an ion drive circuitry (61) that electrically drives the ionization unit; a field drive circuitry (62) that electrically drives the filter unit; and a control unit (22) that controls outputs of the ion drive circuitry and the field drive circuitry, wherein the control unit controls the ion drive circuitry to ramp up and down a filament voltage supplied to a filament of the ionization unit when the analyzer apparatus starts and stops.

This disclosure presents inventions for ionization, for example, for use in mass spectrometer devices and methods. In an embodiment, a device is provided for introduction of pulses of a first carrier gas into an ionization chamber and introduction of a second carrier gas into the ionization chamber. Electrodes in the chamber ionize the carrier gas and direct the ionized gas toward a sample for analysis. The second carrier gas can either assist in washing out the first carrier gas or may become ionized along with the first carrier gas to improve ionization of an analyte. In an embodiment, a method for producing ionized carrier gasses is provided.

In an embodiment of the present ambient ionization experiment, the abundance of background chemicals relative to ions of interest is decreased by pulsing the carrier gas used to generate the excited species directed at the sample. The excited species are stepwise directed at the sample reducing the overall abundance of background chemicals introduced into the ionizing region. In an embodiment of the present ambient ionization experiment, the combination of stepping the sample in front of the excited species and pulsing the carrier gas used to generate the excited species increases the sensitivity of detection.

An ion source can include a magnetic field generator configured to generate a magnetic field in a direction parallel to a direction of the electron beam and coincident with the electron beam. However, this magnetic field can also influence the path of ionized sample constituents as they pass through and exit the ion source. An ion source can include an electric field generator to compensate for this effect. As an example, the electric field generator can be configured to generate an electric field within the ion source chamber, such that an additional force is imparted on the ionized sample constituents, opposite in direction and substantially equal in magnitude to the force imparted on the ionized sample constituents by the magnetic field.