A system, method, and computer program product for optimizing the cooling of a UV bulb during a UV irradiation process is described. A power level in which to operate the UV bulb is received. In addition, a particular type of UV bulb being used in the UV irradiation process is received. Thereafter, at least one optimal UV cooling parameter that corresponds to the power level and the type of UV bulb is retrieved from a UV source parameters database. At least one control signal is then sent to a cooling device that is based on the retrieved optimal UV cooling parameter, and the control signal instructs the cooling device to cool the particular type of UV bulb according to the retrieved optimal UV cooling parameter during the UV irradiation process.

A system (2) for storing and delivering a gas includes a container (4), a porous absorbent material (7) provided within the container, the porous absorbent material storing the gas in a concentrated form, and an adapter assembly (6) structured to be coupled to the container. The adapter assembly is structured to enable the gas to be extracted from the container and delivered to an individual through a cannula or the like.

A system (2) for storing and delivering a gas includes a container (4), a porous absorbent material (7) provided within the container, the porous absorbent material storing the gas in a concentrated form, and an adapter assembly (6) structured to be coupled to the container. The adapter assembly is structured to enable the gas to be extracted from the container and delivered to an individual through a cannula or the like.

A lamp system, and a method of operating the lamp system, are provided. The lamp system includes a gas discharge lamp, an electronic ballast and a control unit. A performance influencing control variable of the lamp system is used. The method allows operation with a high emission performance independent of the design thereof and of any potential changes caused by lamp aging and without any knowledge of the optimal operating temperature. According to the invention a light intensity control is provided, in which an actual value of a light intensity emitted by the gas discharge lamp is measured using a light sensor and the emitted light intensity is used as an actuating variable.

An ultraviolet mercury low-pressure amalgam lamp includes a tube having a first end and a second end, a first electrode placed in the first end of the tube, and a second electrode placed in the second end of the tube, whereby when the lamp is energized a discharge path is formed between the first and second electrodes. At least one amalgam deposit is adjacent to one of the first and second electrodes out of the discharge path between the first and second electrodes. The tube has at least one constriction, wherein the at least one amalgam deposit is placed behind the constriction with respect to the discharge path such that the at least one amalgam deposit is protected by the constriction from the heat emitted by the electrodes.

An ultraviolet mercury low-pressure amalgam lamp includes a tube having a first end and a second end, a first electrode placed in the first end of the tube, and a second electrode placed in the second end of the tube, whereby when the lamp is energized a discharge path is formed between the first and second electrodes. At least one amalgam deposit is adjacent to one of the first and second electrodes out of the discharge path between the first and second electrodes. The tube has at least one constriction, wherein the at least one amalgam deposit is placed behind the constriction with respect to the discharge path such that the at least one amalgam deposit is protected by the constriction from the heat emitted by the electrodes.

An envelope of an ultraviolet (UV) bulb comprises a tube of UV transmissive material configured to contain a UV emissive material and a plasma resistant coating on an inner surface of the tube wherein the coating has been deposited by atomic layer deposition (ALD) and is the only material attached to the inner surface of the tube. The tube can be an endless tube having a circular shape and the coating can be an ALD aluminum oxide coating. The UV transmissive material can comprise quartz or fused silica and the tube can have a wall thickness of about 1 to about 2 mm. The coating can have a thickness of no greater than about 200 nm such as about 120 nm to 160 nm. The circular tube can be formed into a torus shape which can have an outer diameter of about 200 mm and the tube itself can have an outer diameter of about 30 mm. The ALD aluminum oxide coating can be a pinhole free conformal coating. A UV bulb comprising the envelope can contain mercury and inert gas such as argon with pressure inside the UV bulb below 100 Torr. A method of curing a film on a semiconductor substrate, comprises supporting a semiconductor substrate in a curing chamber and exposing a layer on the semiconductor substrate to UV radiation produced by the UV bulb. Other uses include semiconductor substrate surface cleaning or sterilization of fluids and objects.

A line-narrowed KrF excimer laser apparatus includes a laser chamber, a line narrow optical system, an actuator, an output coupling mirror, a wavelength detecting unit, and a wavelength controller. The actuator is capable of changing a wavelength of light selected by the line narrow optical system. The wavelength detecting unit includes a low-pressure mercury lamp accommodating mercury, a getter material that adsorbs at least a part of the mercury, and a hot cathode that excites at least a part of the mercury, an etalon provided at a position where reference light emitted from the low-pressure mercury lamp and detected light emitted from the output coupling mirror are incident on the etalon, and a light intensity distribution sensor configured to detect an intensity distribution profile of interference fringes of the reference light and an intensity distribution profile of interference fringes of the detected light.

An ultraviolet curing module includes a first light source and a second light source. The first light source is configured to emit ultraviolet with a first spectrum. The first spectrum has a first peak wavelength. The second light source is configured to emit ultraviolet with a second spectrum. The second spectrum has a second peak wavelength. Wherein, a difference between the first peak wavelength and the second peak wavelength is greater than 35 nm, and an irradiation range of ultraviolet of the first light source on an irradiated object at least partially overlaps an irradiation range of ultraviolet of the second light source on the irradiated object.

An ultraviolet curing module includes a first light source and a second light source. The first light source is configured to emit ultraviolet with a first spectrum. The first spectrum has a first peak wavelength. The second light source is configured to emit ultraviolet with a second spectrum. The second spectrum has a second peak wavelength. Wherein, a difference between the first peak wavelength and the second peak wavelength is greater than 35 nm, and an irradiation range of ultraviolet of the first light source on an irradiated object at least partially overlaps an irradiation range of ultraviolet of the second light source on the irradiated object.