Systems and methods for reducing contamination of one or more arc lamps are provided. One example implementation is directed to a millisecond anneal system. The millisecond anneal system includes a processing chamber for thermally treating a substrate using a millisecond anneal process. The system further includes one or more arc lamps. Each of the one or more arc lamps is coupled to a water loop for circulating water through the arc lamp during operation of the arc lamp. The system includes a reagent injection source configured to introduce a reagent, such as nitrogen gas, into water circulating through the arc lamp during operation of the arc lamp.

A cooling apparatus for cooling a light source unit is provided. The cooling apparatus includes a cooling unit provided outside a path of light from the light source unit, and a heat pipe configured to connect a heat generating portion of the light source unit and the cooling unit. The heat pipe also serves as an electrode wire of the light source unit.

A radiation source apparatus comprising: a container comprising walls for defining a space for containing a gaseous medium in which plasma which emits plasma emitted radiation is generated following excitation of the gaseous medium by a driving radiation; and a thermal load applicator adapted to apply a thermal load to at least part of the walls of the container to reduce stresses in the walls.

An arc lamp includes an arc tube configured to receive a reaction gas therein, and an anode and a cathode disposed opposite one another within the arc tube and configured to generate an electrical arc. The anode includes an anode head portion extending inwardly from an end portion of the arc tube, and an anode tip portion bonded to the anode head portion and comprising a trench extending in a top surface along a peripheral region of the anode tip portion.

Systems and methods for reducing contamination of one or more arc lamps are provided. One example implementation is directed to a millisecond anneal system. The millisecond anneal system includes a processing chamber for thermally treating a substrate using a millisecond anneal process. The system further includes one or more arc lamps. Each of the one or more arc lamps is coupled to a water loop for circulating water through the arc lamp during operation of the arc lamp. The system includes a reagent injection source configured to introduce a reagent, such as nitrogen gas, into water circulating through the arc lamp during operation of the arc lamp.

Electrode tips for arc lamps for use in, for instance, a millisecond anneal system are provided. In one example implementation, an electrode for an arc lamp can have an electrode tip. The surface of the electrode tip can have one or more grooves to reduce the transportation of molten material across the surface of the electrode tip. The electrode can include an interface between the electrode tip and a heat sink. The interface can have a shape designed to have a desired lateral temperature distribution across the surface of the electrode tip.

An arc lamp includes an arc tube configured to receive a reaction gas therein, and an anode and a cathode disposed opposite one another within the arc tube and configured to generate an electrical arc. The anode includes an anode head portion extending inwardly from an end portion of the arc tube, and an anode tip portion bonded to the anode head portion and comprising a trench extending in a top surface along a peripheral region of the anode tip portion.

An irradiation device includes a housing, reflectors arranged on sides of the housing, an excimer emitter as a UV radiation source, porous sintered metal distributor elements, a chamber acting as a buffer volume, a high-voltage socket, an earth connection, and an emitter head having holes. The excimer emitter has an inner electrode and an outer electrode. The distributor elements are arranged along the excimer emitter. The emitter head is provided as a molded body to accommodate the inner electrode and the outer electrode. The emitter head form-fittingly guides the inner electrode and the outer electrode to the high-voltage socket and/or to the earth connection, and provides a supply of deionized cooling water to an inner cooling channel and to an outer cooling channel via the holes to cool the excimer emitter. A nitrogen flushing takes place via the distributor elements and the chamber.