H01J2237/06333

Electron gun, electron gun component, electron beam applicator, and alignment method
11842879 · 2023-12-12 · ·

Provided are an electron gun, an electron gun component, an electron beam applicator, and an alignment method that can align the emission axis of an electron beam with the optical axis of the electron optical system of the counterpart device even when misalignment of a mounted position of the electron gun being mounted to the counterpart device is larger. The electron gun includes: a light source; a vacuum chamber; a photocathode that emits an electron beam in response to receiving light from the light source; an electrode kit; and an electrode kit drive device, the electrode kit includes a photocathode supporting part, and an anode arranged spaced apart from the photocathode supporting part, the photocathode is placed on the photocathode supporting part, and the electrode kit drive device moves the electrode kit in an X-Y plane, where one direction is defined as an X direction, a direction orthogonal to the X direction is defined as a Y direction, and a plane including the X direction and the Y direction is defined as the X-Y plane.

ELECTRON GUN AND ELECTRON BEAM APPLICATION DEVICE

The apparatus includes: a photocathode including a substrate and a photoelectric film formed on the substrate; a light source configured to emit a pulsed excitation light; a condenser lens facing the substrate of the photocathode and configured to condense the pulsed excitation light toward the photocathode; a first anode electrode and a second anode electrode facing the photoelectric film of the photocathode; a first power supply configured to apply a first control voltage between the first anode electrode and the second anode electrode; and a second power supply configured to apply an acceleration voltage between the photocathode and the second anode electrode. The first anode electrode is disposed between the photocathode and the second anode electrode. A surface of the first anode electrode facing the second anode electrode has a recessed shape, and a surface of the second anode electrode facing the first anode electrode has a protruding shape.

ULTRAFAST ELECTRON DIFFRACTION APPARATUS

There is provided an ultrafast electron diffraction apparatus including: a photoelectron gun configured to emit an electron beam; a bending portion for emitting the electron beam emitted from the photoelectron gun by changing a travel direction of the electron beam by a predetermined angle; and a sample portion including a sample to be analyzed by the electron beam emitted from the bending portion. The electron beam reaches the sample portion in a state that a pulse of the electron beam is compressed and the timing jitter between the pumping light and probe electron pulse is completely reduced as the travel direction of the electron beam is changed by the predetermined angle through the bending portion.

Broad-Energy Spectrum Electron Gun

Various embodiments of the present technology generally relate to devices and methods for generating and directing energetic electrons toward a target. More specifically, some embodiments relate to devices, systems, and methods for generating and directing energetic electrons based in the photoelectric effect and directing electric field-focused beams of the energetic electrons toward a target. Electron guns according to the present technology include one or more light sources to stimulate electron transmission, and a series of differentially charged stages to provide a hollow path allowing electrons generated by the photoelectric effect of the light irradiated on interior surfaces defining the path through the stages to travel to an exit of the electron gun. Each of the differentially charged stages have a different potential, thereby providing electrons having two or more different and tunable energy levels exiting as a beam from the electron gun.

ELECTRON GUN, ELECTRON BEAM APPLICATION DEVICE, METHOD FOR EMITTING ELECTRON USING ELECTRON GUN, AND ELECTRON BEAM FOCAL POSITION ADJUSTMENT METHOD
20210134551 · 2021-05-06 ·

The present invention addresses the problem of providing a device with which it is possible to adjust the focal point of an electron beam both toward a shorter focal point and toward a longer focal point after an electronic gun was fitted on a counterpart device.

The aforementioned problem can be solved by an electron gun including a photocathode, and an anode, the electron gun furthermore comprising an intermediate electrode disposed between the photocathode and the anode, the intermediate electrode comprising an electron-beam passage hole through which an electron beam released from the photocathode passes, and the electron-beam passage hole having formed therein a drift space in which, when an electrical field is formed between the photocathode and the anode due to application of a voltage, the effect of the electrical field can be disregarded.

LIGHT MODULATED ELECTRON SOURCE

A light modulated electron source utilizes a photon-beam source to modulate the emission current of an electron beam emitted from a silicon-based field emitter. The field emitter's cathode includes a protrusion fabricated on a silicon substrate and having an emission tip covered by a coating layer. An extractor generates an electric field that attracts free electrons toward the emission tip for emission as part of the electron beam. The photon-beam source generates a photon beam including photons having an energy greater than the bandgap of silicon, and includes optics that direct the photon beam onto the emission tip, whereby each absorbed photon creates a photo-electron that combines with the free electrons to enhance the electron beam's emission current. A controller modulates the emission current by controlling the intensity of the photon beam applied to the emission tip. A monitor measures the electron beam and provides feedback to the controller.

Interferometric electron microscope

An interferometric electron microscope with increased irradiating electric current density which causes electron waves to interfere with each other and includes: an electron source; an irradiating lens system a focusing lens system an observational plane an artificial grating disposed between the electron source and the irradiating lens system and diffracting the electron beam emitted from the electron source to produce a first electron wave and a second electron wave; an electron beam biprism deflecting the first electron wave and the second electron wave to pass the first electron wave through the specimen for use as an object wave and to use the second electron wave as a reference wave; and an electron beam biprism in a focusing system deflecting the objective wave and the reference wave to superimpose the objective wave and the reference wave on the observational plane to produce an image.

DEVICE FOR PROVIDING ELECTRONS AND METHOD FOR MAKING THE SAME

A device for providing electrons and its method of making. The device includes an optical fiber with a tip and a metallic arrangement arranged at the tip. The metallic arrangement is arranged to be excited by an energy source to emit electrons or electron beams.

Electron imaging method and system

A transmission electron microscopy system for imaging a sample, comprising: a pulse generator for generating an initial electron pulse towards the sample, the initial electron pulse to be propagated through the sample to obtain a transmitted electron pulse; an encoding device for encoding the transmitted electron pulse according to a predefined pattern to obtain an encoded electron pulse; a shearing device for temporally shearing the encoded electron pulse in a given direction to obtain a given electron pulse; a detector for detecting the given electron pulse to obtain a single image of the sample; and a datacube generator for determining a spatiotemporal datacube from the single image using the predefined pattern, and outputting the spatiotemporal datacube.

Spatially Phase-Modulated Electron Wave Generation Device
20210043411 · 2021-02-11 ·

The present invention is to generate a spatially phase modulated electron wave. A laser radiating apparatus, a spatial light phase modulator, and a photocathode are provided. The photocathode has a semiconductor film having an NEA film formed on a surface thereof, and a thickness of the semiconductor film is smaller than a value obtained by multiplying a coherent relaxation time of electrons in the semiconductor film by a moving speed of the electrons in the semiconductor film. According to the configuration, a spatial distribution of phase and a spatial distribution of intensity of spatial phase modulated light are transferred to an electron wave, and the electron wave emitted from an NEA film is modulated into the spatial distribution of phase and the spatial distribution of intensity of the light. Since the spatial distribution of phase of the light can be modulated as intended by a spatial phase modulation technique for light, it is possible to generate an electron wave having a spatial distribution of phase modulated as intended.