Patent classifications
H01J2237/1415
Multipole unit and charged particle beam device
An object is to provide a multipole unit capable of achieving both high positional accuracy and ease of assembling and preventing a decrease in the transmission rate of the magnetic flux. A multipole unit 109a includes a pole 1 that is made of a soft magnetic metal material, a shaft 2 that is made of a soft magnetic metal material and is magnetically connected to the pole, and a coil 3 that is wound around the shaft 2. The pole 1 is provided with a first fitting portion JP1 that forms a first recessed portion or a first protruding portion. The shaft 2 is provided with a second fitting portion JP2 that forms a second protruding portion or a second recessed portion. The first fitting portion JP1 and the second fitting portion JP2 are fitted with each other such that the pole 1 and the shaft 2 are physically separated from each other.
AXIAL ALIGNMENT ASSEMBLY, AND CHARGED PARTICLE MICROSCOPE COMPRISING SUCH AN ALIGNMENT ASSEMBLY
An axial alignment assembly (100) comprising a first body and a second body. The first body has a substantially cylindrical outer jacket, and has a first alignment axis. The second body comprises a substantially cylindrical inner jacket, and has a second alignment axis. The second body is positioned with respect to said first body in so that said inner jacket faces said outer jacket and in between said inner jacket and said outer jacket a substantially annular recess is formed. The axial alignment assembly further comprises a plurality of resilient elements that are positioned within said annular recess, wherein each resilient element is in contact with said outer jacket of said first body and with said inner jacket of said second body. Each resilient element exerts a force onto said outer jacket and onto said inner jacket for aligning said first alignment axis and said second alignment axis.
Axial alignment assembly, and charged particle microscope comprising such an alignment assembly
An axial alignment assembly (100) comprising a first body and a second body. The first body has a substantially cylindrical outer jacket, and has a first alignment axis. The second body comprises a substantially cylindrical inner jacket, and has a second alignment axis. The second body is positioned with respect to said first body in so that said inner jacket faces said outer jacket and in between said inner jacket and said outer jacket a substantially annular recess is formed. The axial alignment assembly further comprises a plurality of resilient elements that are positioned within said annular recess, wherein each resilient element is in contact with said outer jacket of said first body and with said inner jacket of said second body. Each resilient element exerts a force onto said outer jacket and onto said inner jacket for aligning said first alignment axis and said second alignment axis.
Charged particle beam apparatus
A charged particle beam apparatus covering a wide range of detection angles of charged particles emitted from a sample includes an objective lens for converging charged particle beams emitted from a charged particle source and a detector for detecting charged particles emitted from a sample. The objective lens includes inner and outer magnetic paths which are formed so as to enclose a coil. A first inner magnetic path is disposed at a position opposite to an optical axis of the charged particle beams. A second inner magnetic path, formed at a slant with respect to the optical axis of the charged particle beams, includes a leading end. A detection surface of the detector is disposed at the outer side from a virtual straight line that passes through the leading end and that is parallel to the optical axis of the charged particle beams.
POLE PIECE FOR A TRANSMISSION ELECTRON MICROSCOPE
A pole piece for a transmission electron microscope, the pole piece comprising an upper pole piece, containing a first pathway for an electron beam, a lower pole piece which is coupled to the upper pole piece and which contains a second pathway operatively connected to the first pathway, the upper pole piece and lower pole piece being separated by a gap between the first pathway and the second pathway. The pole piece has a mechanism which can extend or reduce the distance between the upper pole piece and the lower pole piece by changing the distance between the first pathway and the second pathway.
Adjustable Permanent Magnetic Lens Having Shunting Device
A fine-adjustable charged particle lens comprises a magnetic circuit assembly including permanent magnets, a yoke body, and a shunting device comprising a shunting component, and this assembly surrounds a beam passage extending along the longitudinal axis (cx). The shunting device is placed in the yoke body besides the permanent magnets and may be composed of several sector components, comprising different high magnetically permeable materials. The permanent magnet and the yoke body form a magnetic circuit having at least two gaps, in order to generate a magnetic field reaching inwards into the beam passage, into which a sleeve insert having electrostatic electrodes can be inserted, which may also generate an electric field spatially overlapping said magnetic field. The shunting device partially bypasses the magnetic flux of said circuit assembly and thus reduces the magnetic field to a desired value.
Magnetic field free sample plane for charged particle microscope
An adjustable magnetic field free objective lens for a charged particle microscope is disclosed herein. An example charged particle microscope at least includes first and second optical elements arranged on opposing sides of a sample plane, a third optical element arranged around the sample plane, and a controller coupled to control the first, second and third optical elements. The controller coupled to excite the first and second optical elements to generate first and second magnetic lenses, the first and second magnetic lenses formed on opposing sides of the sample plane and oriented in the same direction, and excite the third optical element to generate a third magnetic lens at the sample plane that is oriented in an opposite direction, where a ratio of the excitation of the third optical element to the excitation of the first and second optical elements adjusts a magnetic field at the sample plane.
Multipole Unit and Charged Particle Beam Device
An object is to provide a multipole unit capable of achieving both high positional accuracy and ease of assembling and preventing a decrease in the transmission rate of the magnetic flux. A multipole unit 109a includes a pole 1 that is made of a soft magnetic metal material, a shaft 2 that is made of a soft magnetic metal material and is magnetically connected to the pole, and a coil 3 that is wound around the shaft 2. The pole 1 is provided with a first fitting portion JP1 that forms a first recessed portion or a first protruding portion. The shaft 2 is provided with a second fitting portion JP2 that forms a second protruding portion or a second recessed portion. The first fitting portion JP1 and the second fitting portion JP2 are fitted with each other such that the pole 1 and the shaft 2 are physically separated from each other.
Charged particle beam optical system, exposure apparatus, exposure method and device manufacturing method
A charged particle beam optical system is provided with a plurality of irradiation optical systems each of which irradiates an object W with a charged particle beam EB, the plurality of irradiation optical system includes a first irradiation optical system and a second irradiation optical system that generates a second magnetic field having a characteristics different from a characteristics of a first magnetic field generated by the first irradiation optical system.
PARTICLE BEAM SYSTEM FOR AZIMUTHAL DEFLECTION OF INDIVIDUAL PARTICLE BEAMS AND METHOD FOR AZIMUTH CORRECTION IN A PARTICLE BEAM SYSTEM
A particle beam system includes a multi-beam particle source for generating a multiplicity of charged individual particle beams, and a magnetic multi-deflector array for deflecting the individual particle beams in the azimuthal direction. The magnetic multi-deflector array includes a magnetically conductive multi-aperture plate having a multiplicity of openings, which is arranged in the beam path of the particle beams such that the individual particle beams substantially pass through the openings of the multi-aperture plate. The magnetic multi-deflector array also includes a magnetically conductive aperture plate having an individual opening. The aperture plate is arranged in the beam path of the particle beams such that the individual particle beams substantially pass through the first aperture plate. The multi-aperture plate and the first aperture plate are connected to each other such that a cavity is formed between the two plates. A first coil for generating a magnetic field is arranged in the cavity between the first aperture plate and the multi-aperture plate such that the multiplicity of individual particle beams substantially pass through the coil.