A semiconductor package includes a semiconductor chip disposed over a first main surface of a first substrate, a package lid disposed over the semiconductor chip, and spacers extending from the package lid through corresponding holes in the first substrate. The spacers enter the holes at a first main surface of the first substrate and extend beyond an opposing second main surface of the first substrate.

Techniques regarding qubit chip assemblies are provided. For example, one or more embodiments described herein can include an apparatus that can comprise a qubit chip positioned on an interposer chip. The apparatus can also comprise an electrical connector in direct contact with the interposer chip. The electrical connector can establish an electrical communication between a wire and a contact pad of the interposer chip that is coupled to the qubit chip.

Techniques regarding qubit chip assemblies are provided. For example, one or more embodiments described herein can include an apparatus that can comprise a qubit chip positioned on an interposer chip. The apparatus can also comprise an electrical connector in direct contact with the interposer chip. The electrical connector can establish an electrical communication between a wire and a contact pad of the interposer chip that is coupled to the qubit chip.

Embodiments described herein may be related to apparatuses, processes, and techniques for a barrier that surrounds one or more dies which are electrically coupled with one or more electrical connections on a wafer. The barrier may be a hermetic barrier that is formed on a wafer prior to singulation to prevent moisture intrusion from a side of the wafer that may compromise the one or more electrical connections. Other embodiments may be described and/or claimed.

Embodiments described herein may be related to apparatuses, processes, and techniques for a barrier that surrounds one or more dies which are electrically coupled with one or more electrical connections on a wafer. The barrier may be a hermetic barrier that is formed on a wafer prior to singulation to prevent moisture intrusion from a side of the wafer that may compromise the one or more electrical connections. Other embodiments may be described and/or claimed.

Heat spreading substrate with embedded interconnects. In an embodiment in accordance with the present invention, an apparatus includes a metal parallelepiped comprising a plurality of wires inside the metal parallelepiped. The plurality of wires have a different grain structure than the metal parallelepiped. The plurality of wires are electrically isolated from the metal parallelepiped. The plurality of wires may be electrically isolated from one another.

Heat spreading substrate with embedded interconnects. In an embodiment in accordance with the present invention, an apparatus includes a metal parallelepiped comprising a plurality of wires inside the metal parallelepiped. The plurality of wires have a different grain structure than the metal parallelepiped. The plurality of wires are electrically isolated from the metal parallelepiped. The plurality of wires may be electrically isolated from one another.

A semiconductor package includes an encapsulant body; an upper electrically conductive element having an outwardly exposed metal surface; a lower carrier substrate having an upper electrically conductive layer, a lower electrically conductive layer having an outwardly exposed surface, and an electrical insulation layer; a first electrically conductive spacer between the upper electrically conductive element and the upper electrically conductive layer; a power semiconductor chip between the upper electrically conductive element and the upper electrically conductive layer; and a second electrically conductive spacer between the upper electrically conductive element and the power semiconductor chip, a first carrier region of the upper electrically conductive layer is connected to a first power terminal, a second carrier region of the upper electrically conductive layer is alongside the first carrier region and is connected to a phase terminal, a first region of the upper electrically conductive element is connected to a second power terminal.

A semiconductor package includes an encapsulant body; an upper electrically conductive element having an outwardly exposed metal surface; a lower carrier substrate having an upper electrically conductive layer, a lower electrically conductive layer having an outwardly exposed surface, and an electrical insulation layer; a first electrically conductive spacer between the upper electrically conductive element and the upper electrically conductive layer; a power semiconductor chip between the upper electrically conductive element and the upper electrically conductive layer; and a second electrically conductive spacer between the upper electrically conductive element and the power semiconductor chip, a first carrier region of the upper electrically conductive layer is connected to a first power terminal, a second carrier region of the upper electrically conductive layer is alongside the first carrier region and is connected to a phase terminal, a first region of the upper electrically conductive element is connected to a second power terminal.

An electronic component package includes: a sealing resin layer; a metal member buried therein and including a die bond portion and a terminal electrode portion located outside the die bond portion; a ceramic substrate buried in the sealing resin layer; and an electronic component disposed on the die bond portion. When viewed in plan, the die bond portion and the ceramic substrate are partially overlapped to be in contact with each other, and the terminal electrode portion and the ceramic substrate are partially overlapped to be in contact with each other. The electronic component is electrically connected to the terminal electrode portion. The metal member includes a first plating layer and a second plating layer, and the average crystal grain diameter of the first plating layer is smaller than the average crystal grain diameter of the second plating layer.