An electronic component includes an electronic component main body including a first surface, a signal bump electrode arranged on the first surface to protrude from the first surface of the electronic component main body, and a protective film provided with an opening through which a part of the signal bump electrode is exposed, the protective film being arranged to cover a portion of the signal bump electrode other than a portion exposed through the opening. The protective film includes a first insulating film, a second insulating film that covers the first insulating film, and a first shield film arranged as lying between the first insulating film and the second insulating film. The first shield film is covered with at least one of the first insulating film and the second insulating film so as not to be exposed at an inner surface of the opening.

A chip packaging structure and a method for preparing the same, and a method for packaging a semiconductor structure are provided, which relate to the technical field of semiconductors, and solve the technical problem of low yield of a chip. The chip packaging structure includes: a chip, an intermediate insulating layer arranged on the chip and a non-conductive adhesive layer arranged on the intermediate insulating layer, where a plurality of conductive pillar bumps are arranged on the chip, and each conductive pillar bump penetrates through the intermediate insulating layer; the intermediate insulating layer is provided with at least one group of holding holes, and the non-conductive adhesive layer fills the holding holes, so that grooves respectively matched with the holding holes are formed in a surface, far away from the intermediate insulating layer, of the non-conductive adhesive layer.

A package structure includes at least two semiconductor structures that are stacked onto one another. The first surface of one semiconductor structure of the at least two semiconductor structures that are stacked onto one another directly faces toward the second surface of another semiconductor structure of the at least two semiconductor structures which is adjacent to said one semiconductor structure; the first metal layer of said one semiconductor structure is in contact with and bonded to the third metal layer of said another semiconductor structure; and the second metal layer of said one semiconductor structure is in contact with and bonded to the fourth metal layer of said another semiconductor structure.

A method for manufacturing a package substrate, includes: providing a glass frame having a through hole and a chip embedding cavity; fixing an electronic component in the chip embedding cavity; coating a dielectric layer to an upper surface of the glass frame, the through hole and the chip embedding cavity and curing the dielectric layer; photoetching the dielectric layer to form an opening window arranged above the through hole; depositing metal through the opening window and patterning the metal to form a metal pillar and a circuit layer, the metal pillar passing through the through hole, the circuit layer being arranged on the upper surface and/or a lower surface of the glass frame and being connected to the electronic component and the metal pillar; forming a solder mask on a surface of the circuit layer, patterning the solder mask to form a pad connected to the circuit layer.

A surface acoustic wave device includes a surface acoustic wave element including a functional element and a bump on one main surface, a substrate on which the surface acoustic wave element is mounted by using the bump as a joint, a frame positioned on the substrate to surround the surface acoustic wave element in a plan view of the surface acoustic wave element mounted on the substrate, and a sealing material that seals the surface acoustic wave element and seals a gap between the frame and the electronic component. The frame includes at least one recess adjacent to the surface acoustic wave element.

A method for manufacturing semiconductor devices include steps of depositing a first photoresist over a first dielectric layer, first exposing the first photoresist to a first light-exposure using a first lithographic mask, and second exposing the first photoresist to a second light-exposure using a second lithographic mask. An overlap region of the first photoresist is exposed to both the first light-exposure and the second light-exposure. The first dielectric layer is thereafter patterned to form a mask overlay alignment mark in the overlap region. The patterning includes etching the first dielectric layer form a trench, and filling the trench with a conductive material to produce the alignment mark. A second dielectric layer is deposited over the alignment mark, and a second photoresist is deposited over the second dielectric layer. A third lithographic mask is aligned to the second photoresist using the underlying mask overlay alignment mark for registration.

A wire structure (50A) includes: a column-like bump (45), provided to be adjacent to a second electronic component (32b) installed on a substrate (31); and a looping wire (50), bonded onto the substrate (31) to stride over the second electronic component (32b). The looping wire (50) includes: a second raised part (54), wherein a tip is bonded to the substrate (31) on a side of the column-like bump (45) opposite to the second electronic component (32b) to be raised from the substrate (31); a loop part (55), extending to stride over the second electronic component (32b); and a bent part (56), bent to be engaged with an upper end of the column-like bump (45) to connect the loop part (55) and the second raised part (54).

The present disclosure relates to thin-form-factor reconstituted substrates and methods for forming the same. The reconstituted substrates described herein may be utilized to fabricate homogeneous or heterogeneous high-density 3D integrated devices. In one embodiment, a silicon substrate is structured by direct laser patterning to include one or more cavities and one or more vias. One or more semiconductor dies of the same or different types may be placed within the cavities and thereafter embedded in the substrate upon formation of an insulating layer thereon. One or more conductive interconnections are formed in the vias and may have contact points redistributed to desired surfaces of the reconstituted substrate. The reconstituted substrate may thereafter be integrated into a stacked 3D device.

In one aspect of the invention, a method to create an advanced through silicon via structure is described. A high aspect ratio through substrate via in a substrate is provided. The through substrate via has vertical sidewalls and a horizontal bottom. A metallic barrier layer is deposited on the sidewalls of the through substrate via. A nitridation process is performed to convert a surface portion of the metallic barrier layer to a nitride surface layer. The nitride surface layer enhances the nucleation of subsequent depositions. A metal is deposited to fill the through substrate via. Another aspect of the invention is a device created by the method.

An integrated circuit device includes a first substrate having a ground plane. The integrated circuit device also includes a second substrate. The second substrate has a first layer of passive devices. The passive devices include at least one inductor on a first side of the second substrate. The first layer of passive devices is substantially orthogonal to the ground plane and the second substrate supported by the first substrate. An inductor magnetic field is substantially parallel to the ground plane.