A workpiece processing method is provided for processing a workpiece including a device region, a peripheral surplus region surrounding the device region, and key patterns being arranged on a top surface side in the peripheral surplus region so as to correspond to a plurality of planned dividing lines, the method including: a resin sheet sticking step of sticking a resin sheet to the top surface side of the workpiece, and transferring the key patterns onto the resin sheet; a peripheral surplus region removing step of dividing the peripheral surplus region from the workpiece, and peeling off the peripheral surplus region from the resin sheet; and a device region processing step of identifying a position of at least one planned dividing line by using, as marks, traces of the key patterns exposed in the peripheral surplus region removing step, and processing the device region along the plurality of planned dividing lines.

A laminate processing method includes a water-soluble resin filling step of filling a water-soluble resin in a division groove formed in a dividing step, a modified layer removing step of positioning a cutting blade in the division groove formed in a back surface of a wafer to cut the division groove in a state in which the water-soluble resin is solidified or half-solidified, thereby removing a modified layer, and a water-soluble resin removing step of supplying cleaning water from the back surface of the wafer with a state in which an expandable tape is expanded being maintained, thereby removing the water-soluble resin being filled in a cut groove and the division groove.

There are provided a stage for cutting a substrate, and a substrate-cutting apparatus. The stage includes a supporting member for having the substrate mounted thereon, including a plurality of cell areas, and defining a groove line having a groove shape between the plurality of cell areas, and a first tube line inserted into the groove line to contact an inner wall of the groove line, and having an open upper portion.

In a cutting method of a workpiece, a half-cut groove having a groove bottom that reflects light of an epi-illumination part is formed in a range of a peripheral surplus region of a planned dividing line that has not been cut, and the half-cut groove is detected with discrimination from a laser-processed groove that diffusely reflects the light and is darkly displayed.

In a described example, a method includes: forming stress induced dislocations along scribe lanes between semiconductor dies on a semiconductor wafer using a laser; mounting a first side of the semiconductor wafer on the first side of a first dicing tape; removing a backgrinding tape from the semiconductor wafer; attaching a second dicing tape to a second side of the semiconductor wafer opposite the first side, the second dicing tape adhering to portions of the first dicing tape that are spaced from the semiconductor wafer, forming a dual taped wafer dicing assembly; separating the semiconductor dies by stretching the first dicing tape and stretching the second dicing tape; removing the second dicing tape from the semiconductor dies; and removing the semiconductor dies from the first dicing tape.

A method of manufacturing a stacked substrate by bonding a first substrate and a second substrate, including a step of determining, based on information about curving of each of the first substrate and the second substrate, whether or not the first substrate and the second substrate satisfy a predetermined condition, and, a step of bonding the first substrate and the second substrate if the predetermined condition is satisfied. The stacked substrate manufacturing method described above includes a step of estimating, based on the information, an amount of misalignment which occurs after the first substrate is bonded to the second substrate and the predetermined condition may include that the amount of misalignment is equal to or less than a threshold.

An apparatus for manufacturing a display device includes a first jig including a first side, the first side having a concave groove for receiving a cover window, wherein the cover window includes a first planar portion, a first curved portion and a second curved portion, wherein the first and second curved portions are disposed at opposite ends of the first planar portion in a first direction, a second jig including a planar side for receiving a display panel, wherein when the second jig is moved in a second direction crossing the first direction with the display panel on the planar side, the display panel is disposed between the first and second curved portions of the cover window, and a pair of third jigs for supporting the first and second curved portions of the cover window.

A method for sawing a semiconductor wafer is provided. The method includes sawing a semiconductor wafer to form a first opening. In addition, the semiconductor wafer includes a dicing tape and a substrate attached to the dicing tape by a die attach film (DAF), and the first opening is formed in an upper portion of the substrate. The method further includes sawing through the substrate and the DAF of the semiconductor wafer from the first opening to form a middle opening under the first opening and a second opening under the middle opening, so that the semiconductor wafer is divided into two dies. In addition, a slope of a sidewall of the middle opening is different from slopes of sidewalls of the first opening and the second opening.

A substrate bonding apparatus includes a lower chuck, an upper chuck, an electric actuator on a central portion of the upper chuck, a pressure sensor, and a controller. The lower chuck may support a lower substrate, the upper chuck may face the lower chuck such that a lower surface of the upper chuck faces the upper surface of the lower chuck, and the upper chuck may support an upper substrate. The electric actuator may lower a bonding pin through the upper chuck to apply a pressure to the upper substrate supported on the upper chuck. The pressure sensor may be below the lower substrate supported on the lower chuck. The pressure sensor may sense a lowering pressure applied by the bonding pin to the pressure sensor in real time. The controller may control the lowering pressure applied by the bonding pin.

A method of controlling polishing includes storing a base measurement, the base measurement being a measurement of a substrate after deposition of at least one layer overlying a semiconductor wafer and before deposition of an outer layer over the at least one layer, after deposition of the outer layer over the at least one layer and during polishing of the outer layer on substrate, receiving a sequence of raw measurements of the substrate from an in-situ monitoring system, normalizing each raw measurement in the sequence of raw measurement to generate a sequence of normalized measurements using the raw measurement and the base measurement, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on at least the sequence of normalized measurements.