An EUV reticle pod is provided. The pod includes an inner and an outer box assembly. The inner box assembly contained in the outer box assembly includes a base and a cover. The base has an upper surface and a surrounding wall. The upper surface includes a carry surface, at least one trench, and a first contacting surface. The EUV reticle is carried above the carry surface. The trench has a circular loop structure and its bottom is lower than the carry surface. The carry surface, the trench, and the first contacting surface are sequentially distributed from the center of the upper surface towards the surrounding wall. The cover has a concave for accommodating the EUV reticle and a second contacting surface for cooperating with the first contacting surface to form an air-tight seal. The trench captures and traps particles to reduce the particle contamination on the reticle.

The present invention provides a reticle pod comprising a lower cover and a support mechanism. The lower cover includes a carrying surface and a plurality of securing seats distributed on the carrying surface. The support mechanism includes a supporting portion extending upward for supporting a reticle or a reticle carrier, and a securing portion opposite the supporting portion, wherein the securing portion is detachably connected with a corresponding securing seat, so that the support mechanism can be selectively installed on the lower cover.

An apparatus for storing and transporting semiconductor elements includes a first portion and a second portion. The first portion includes a first front side wall, a first rear side wall, a top wall, and at least one pin holder integrally extending from the first rear side wall. The second portion includes a second front side wall, a second rear side wall, a bottom wall, and at least one pivotal pin structure integrally coupled with and extending from the second rear side wall. The at least one pivotal pin structure comprises a shaft, and a head connected with the shaft. The at least one pin holder defines a cavity sized and shaped to accept the head of the at least one pivotal pin structure. The first portion and the second portion are pivotally movable between an open configuration and a closed container configuration.

A substrate processing apparatus includes: a substrate processing part including a load port configured to place thereon a substrate accommodating vessel in which at least one substrate is accommodated, and configured to take out the at least one substrate from the substrate accommodating vessel and to perform a series of processes on the at least one substrate; and a controller configured to control an opening and closing of a lid of the substrate accommodating vessel, wherein the controller performs control to open the lid after the substrate accommodating vessel is placed on the load port, and the controller performs control to close the lid when an abnormality occurs in the substrate processing part and when none of the at least one substrate removed from the substrate accommodating vessel can be recovered to the substrate accommodating vessel after a predetermined period of time from the occurrence of the abnormality.

A first lid opening-and-closing mechanism includes: a first holder that holds an upper lid of a first container; a first protrusion provided to protrude from the first holder toward one side direction with respect to the first holder and extends to outside of a casing; and a first raising/lowering driver that raises and lowers the first holder in a cantilevered manner with the first protrusion interposed therebetween. A second lid opening-and-closing mechanism includes: a second holder that holds an upper lid of a second container; a second protrusion provided to protrude from the second holder toward the one side direction and extends to the outside of the casing; and a second raising/lowering driver that raises and lowers the second holder in a cantilevered manner with the second protrusion interposed therebetween. The first raising/lowering driver and the second raising/lowering driver are located outside the casing in the one side direction.

A mask container for storing a mask for photolithography, includes a cover and a base having a plurality of tapered corners. The tapered corners taper outward and downward from a top major surface of the base. The cover having the tapered corners extends downward that covers the tapered corners of the base when the cover is attached to the base. The tapered corners of the cover are tapered at about the same angle as the tapered corners of the base so that a surface of the tapered corners of the cover is substantially parallel to a corresponding surface of the tapered corner of the base when the cover is attached to the base. A recess is located in the tapered corners of the cover. A biasing member and a ball-shaped member are located in the tapered corners of the base to mate with the recess when the cover is attached to the base.

The present invention discloses a reticle container which comprises an upper cover and a lower cover. A plurality of identification modules is disposed on the edge of the reticle container. Therefore, the user can quickly identify the usage of the reticle container or number per se. On the other hand, the reticle container of the present invention further comprises supporters, sustainers and connecting modules. Therefore, the reticle container of the present invention is able to satisfy various structural requirements and conditions for carrying the reticle in a sealed environment.

A manufacturing method of the ESD protection device includes the following steps. A surface treatment is performed on the substrate. A link layer is formed on the substrate after the surface treatment, wherein a material of the link layer includes a metal material. A progressive layer is formed on the link layer, wherein a material of the progressive layer includes a non-stoichiometric metal oxide material, and an oxygen concentration in the non-stoichiometric metal oxide material is increased gradually away from the substrate in a thickness direction of the progressive layer. A composite layer is formed on the progressive layer, wherein the composite layer includes a stoichiometric metal oxide material and a non-stoichiometric metal oxide material, and a ratio of the non-stoichiometric metal oxide material and the stoichiometric metal oxide material in the composite layer may make a sheet resistance value of the composite layer 1×10.sup.7 to 1×10.sup.8 Ω/sq.

A lid opening-and-closing device that opens and closes an upper lid of a container, the container including: a container body; the upper lid; a locking mechanism that locks the upper lid onto the container body when the upper lid is mounted on the container body; and a strip provided to the upper lid, the device including: a placement platform on which the container is placed; a guide provided on both sides above the placement platform and comes into contact with a lower face of the strip to rotate the strip upward to an extent exceeding the predetermined value with respect to the container body when the container is inserted in the horizontal direction to a specified position of the placement platform; and a raising/lowering mechanism that moves the container body and the upper lid for which locking by the locking mechanism has been released, relatively in an up-and-down direction.

A reticle pod having a positioning member includes a base, a lid and a plurality of positioning members. The lid shuts relative to the base to form a substantially cuboid case. The case has a storing space for receiving a reticle. The positioning members are arranged in a shutting direction and disposed on at least two edges of the lid or at least two edges of the base, respectively. The positioning members each include a connecting portion, a correcting portion and a guiding slope portion. The connecting portion connects the edges of the lid. The correcting portion has one end connected to the connecting portion and extending in a shutting direction and an opposing end connected to the guiding slope portion. The guiding slope portion has a slope extending outward. The reticle pod having a positioning member is error-free, allowing the lid to shut precisely relative to the base.