A reticle carrier described herein is configured to quickly discharge the residual charge on a reticle so as to reduce, minimize, and/or prevent particles in the reticle carrier from being attracted to and/or transferred to the reticle. In particular, the reticle carrier may be configured to provide reduced capacitance between an inner baseplate of the reticle carrier and the reticle. The reduction in capacitance may reduce the resistance-capacitance (RC) time constant for discharging the residual charge on the reticle, which may increase the discharge speed for discharging the residual charge through support pins of the reticle carrier. The increase in discharge speed may reduce the likelihood that an electrostatic force in the reticle carrier may attract particles in the reticle carrier to the reticle. This may reduce pattern defects transferred to substrates that are patterned using the reticle, may increase semiconductor device manufacturing quality and yield, and may reduce scrap and rework of semiconductor devices and/or wafers.

A reticle enclosure includes a base including a first surface, a cover including a second surface and disposed on the base, wherein the base and the cover form an internal space therebetween that includes a reticle, and a layer of electrostatic discharge material disposed on the first surface, wherein the electrostatic discharge material reduces electrostatic charges on the reticle.

Provided is a quick-release valve including: a quick-release member having a collar detachably coupled to a bottom opening of a base; and a sleeve having a flow passage for allowing a gas to enter or exit a substrate container. The collar has a pair of ear portions extending outward therefrom along a diameter direction and a handle extending outward therefrom along a radius direction. The ear portions are at a height substantially different from the handle.

A reticle carrier described herein is configured to quickly discharge the residual charge on a reticle so as to reduce, minimize, and/or prevent particles in the reticle carrier from being attracted to and/or transferred to the reticle. In particular, the reticle carrier may be configured to provide reduced capacitance between an inner baseplate of the reticle carrier and the reticle. The reduction in capacitance may reduce the resistance-capacitance (RC) time constant for discharging the residual charge on the reticle, which may increase the discharge speed for discharging the residual charge through support pins of the reticle carrier. The increase in discharge speed may reduce the likelihood that an electrostatic force in the reticle carrier may attract particles in the reticle carrier to the reticle. This may reduce pattern defects transferred to substrates that are patterned using the reticle, may increase semiconductor device manufacturing quality and yield, and may reduce scrap and rework of semiconductor devices and/or wafers.

Reticle pod inner pods include a cover and a baseplate, with the cover and the baseplate contacting one another at contact surfaces. The contact surfaces of the cover and the baseplate each include different materials. The different materials can each be metals. The different materials can differ in hardness. The difference in hardness can be 50 Brinell hardness or greater. One of the different materials can be a ductile material, having elongation at break of 25% or greater. Methods can include providing the cover and the baseplate each including a first material, and providing a second, different material at the contact surfaces of one of the cover or the baseplate.

A storage container in which a uniform flow velocity of the purge gas can be achieved is provided with a plurality of stages of storage units each having an accommodating region to accommodate an article. A supply portion supplies a purge gas; a duct portion communicates with other duct portions of other storage units and serves as a flow path for the purge gas supplied from the supply portion; and an introducing portion communicably connects the duct portion with the accommodating region and introduces the purge gas to the accommodating region. In the flow path for the purge gas in the duct portion, a diffusion member is arranged.

A reticle pod includes an outer pod, an inner pod cover and an inner base plate. A reticle is supported on the base and is contained within the environment created by the inner pod cover and the inner pod base. The inner pod cover can include a plurality of reticle retainers configured to contact a side wall of the reticle and limit movement of the reticle in a horizontal direction.

A system for coupling a mask to a mask holder. The system includes a base, an aperture; mask holder cover supporting elements arranged to move between a first position and a third position while supporting the mask holder cover; mask supporting elements arranged to move between a fourth position and a sixth position while supporting the mask; mask holder base supporting elements arranged to support the mask holder base. When the mask holder cover supporting elements are at the first position and the mask supporting elements are at the third position the mask holder cover, the mask and the base are spaced apart from each other. When the mask holder cover supporting elements are at the third position and the mask supporting elements are at the sixth position the mask holder cover, the mask and the base are connected to each other.

A reticle enclosure includes a base including a first surface, a cover including a second surface and coupled to the base with the first surface facing the second surface. The base and the cover form an internal space that includes a reticle. The reticle enclosure includes restraining mechanisms arranged in the internal space and for securing the reticle, and structures disposed adjacent the reticle in the internal space. The structures enclose the reticle at least partially, and limit passage of contaminants between the internal space and an external environment of the reticle enclosure. The structures include barriers disposed on the first and second surfaces. In other examples, a padding is installed in gaps between the barriers and the first and second surfaces. In other examples, the structures include wall structures disposed on the first and second surfaces and between the restraining mechanisms.

A photomask blank substrate container having an inner member, inner cassette and retainer member, container main body having a lower box and an upper lid, and a sealing tape, in which the container main body and inner member include a polymer-based material in which when 0.1 g of a sample thereof is retained at 40° C. for 60 minutes to release an outgas component, the outgas total amount detected by a gas chromatography mass spectrometer is 1.9×103 ng or less in terms of n-tetradecane, and the sealing tape is a material in which when a size of 10 mm×10 mm of a sample thereof is retained at 150° C. for 10 minutes to release an outgas component, the outgas total amount detected by a gas chromatography mass spectrometer is 1.8×103 ng or less in terms of n-tetradecane. This photomask blank substrate container allows storing and transporting the photomask blank substrate while suppressing influence on the resist pattern.