Patent classifications
H01L21/67386
Membrane diffuser for a substrate container
Purge diffusers for use in systems for transporting substrates include: i) a purge diffuser core having an internal purge gas channel, one or more diffuser ports and an outer surface; ii) filter media secured to the outer surface of the purge diffuser core; and iii) a purge port connector for mounting the purge diffuser to a purge port of a substrate container for transporting substrates. The purge diffuser core may be a unitary article, may be formed by injection molding, and may include diverters internal to the internal purge gas channel.
CALIBRATION POD FOR ROBOTIC WAFER CARRIER HANDLING AND CALIBRATION PERFORMED USING SAME
A calibration pod for calibrating a robotic wafer pod handling apparatus includes a pod body configured for handling by the robotic pod handling apparatus, at least one laser disposed on a bottom of the pod body, and a power module disposed on or in the pod body and operatively connected to power the at least one laser. In a manufacturing method, the pod body comprises a wafer carrier for carrying a cassette of semiconductor wafers, which has a bottom with a plurality of holes for aligning placement of the wafer carrier in a load port of a semiconductor device fabrication facility. The at least one laser here includes a plurality of lasers corresponding to the plurality of holes in the bottom of the wafer carrier, and each laser is mounted in a respective hole of the bottom of the wafer carrier.
WAFER TRANSPORT BOX
A wafer transport box according to an embodiment of the present disclosure includes a lower housing including a bottom plate and at least one lower rib which is formed vertically on an upper surface of the bottom plate and which forms a wall formed in an arc shape so that wafers are stacked in an inner space, an upper housing including an upper plate and an upper rib which is formed vertically on a lower surface of the upper plate and which forms a wall formed in an arc shape, and a sidewall member coupled inside the lower rib. Further, when the upper housing and the lower housing are coupled to each other, the sidewall member fixes the wafers stacked in the inner space.
WAFER TRANSPORT BOX
A wafer transport box according to an embodiment of the present disclosure includes a lower housing including a bottom plate and at least one lower rib which is formed vertically on an upper surface of the bottom plate and which forms a wall formed in an arc shape so that wafers are stacked in an inner space, and includes an upper housing including an upper plate and an upper rib which is formed vertically on a lower surface of the upper plate and which forms a wall formed in an arc shape. Further, the lower rib includes at least one of protrusion members which are provided at an inner surface of the lower rib and which are spaced apart from each other at a predetermined distance, and the protrusion members fix the wafers stacked in the inner space when the upper housing is coupled to the lower housing.
SUBSTRATE STORAGE CONTAINER
A substrate storage container includes: an opening on a front surface side; and a gas supply mechanism on a bottom surface. The gas supply mechanism has: an introduction path configured to receive a gas from a bottom surface side; a check valve disposed at a position that does not overlap with the introduction path in a horizontal plane along the bottom surface; and a flow path configured to supply the gas from the introduction path to the check valve.
Sealed substrate carriers and systems and methods for transporting substrates
A semiconductor processing system includes a first component and a second component. The first component forms a first chamber with a first sealed environment at a first state within the first chamber. The second component is coupled to the first component. The second component forms a second chamber with a second sealed environment at a second state within the second chamber. A third component is to change the first state of the first sealed environment within the first chamber to cause the first state to be substantially similar to the second state of the second sealed environment within the second chamber. The second sealed environment is at the second state prior to changing of the first state of the first sealed environment to be substantially similar to the second state.
WAFER TRANSPORT CONTAINER
A wafer transport carrier includes various components to provide improved air sealing to reduce air leakage into the wafer transport carrier. The wafer transport carrier may include a housing having a hollow shell that contains a vacuum or an inert gas to minimize and/or prevent humidity and oxygen ingress into the wafer transport carrier, a wafer rack that is integrated into the shell of the housing to minimize and/or prevent air leakage around the wafer rack, and/or an enhanced magnet-based door latch to provide air sealing around the full perimeter of the opening of the housing. These components and/or additional components described herein may reduce and/or prevent debris, moisture, and/or other types of contamination from the semiconductor fabrication facility from entering the wafer transport carrier and causing wafer defects and/or device failures.
Substrate storage apparatus and apparatus for processing substrate using the same
Provided are a substrate storage apparatus and a substrate processing apparatus using the substrate storage apparatus. The substrate storage apparatus includes a housing having a loading/unloading port for loading/unloading of a substrate and configured to provide a loading space for a loaded substrate, a separation membrane coupled to the housing to divide the loading space into a plurality of separation spaces isolated from each other, a gas supplier configured to supply a purge gas into the loading space to clean the substrate, a gas discharger configured to discharge the purge gas accommodated in the loading space, and a controller configured to control supply and discharge of the purge gas for each of the plurality of separation spaces.
Method for PUF generation using variations in transistor threshold voltage and subthreshold leakage current
Disclosed is a physical unclonable function generator circuit and method. In one embodiment, a physical unclonable function (PUF) generator comprising: a plurality of PUF cells, wherein each of the plurality of PUF cells comprises a first MOS transistor and a second MOS transistor, wherein terminal S of the first MOS transistor is connected to terminal D of the second MOS transistor at a dynamic node, terminal D of the first MOS transistor is coupled to a first bus and terminal G of the first NMOS transistor is coupled to a second bus, and terminals S and G of the second NMOS transistor are coupled to ground; a plurality of dynamic flip-flop (DFF) circuits wherein each of the plurality of DFF circuits is coupled to each of the plurality of PUF cells respectively; a population count circuit coupled to the plurality of DFF circuits; and an evaluation logic circuit having an input coupled to the population count circuit and an output coupled to the plurality of DFF circuits.
WAFER HOLDER
A wafer holder includes a holding base having a circular holding surface, including, on a side of the holding surface, an annular first groove and an annular second groove that is surrounded by the first groove, and internally including a plurality of first suction holes opening in a region located between the first groove and the second groove on the holding surface, a plurality of second suction holes opening in a region surrounded by the second groove on the holding surface, and a suction channel communicating to the first suction holes and the second suction holes and opening in a back surface on a side opposite to the holding surface. The first suction holes and the second section holes are configured in such a manner that the first suction holes each have a pressure loss greater than that at each of the second suction holes.