H01L21/67389

Metrology method in wafer transportation

A method for fault detection in a fabrication facility is provided. The method includes moving a wafer carrier along a predetermined path multiple times using a transportation apparatus. The method also includes collecting data associated with an environmental condition within the wafer carrier or around the wafer carrier using a metrology tool on the predetermined path in a previous movement of the transportation apparatus. The method further includes measuring the environmental condition within the wafer carrier or around the wafer carrier using the metrology tool during the movement of the wafer carrier. In addition, the method includes issuing a warning when the measured environmental condition is outside a range of acceptable values. The range of acceptable values is derived from the data collected in the previous movement of the transportation apparatus.

LOAD PORT AND METHODS OF OPERATION

A load port is capable of monitoring various environmental parameters associated with a transport carrier to minimize and/or prevent exposure of the semiconductor substrates therein to increased humidity, increased oxygen, increased vibration, and/or one or more other elevated environmental conditions that might otherwise contaminate the semiconductor substrates, damage the semiconductor substrates, and/or cause processing defects. For example, the load port may monitor the environmental parameters as indicators of a potential blockage of a diffuser of the transport carrier, and a relief valve may be used to divert a gas away from the transport carrier based on a determination that a diffuser blockage has occurred. In this way, the gas may be diverted through the relief valve and away from the transport carrier to prevent increased humidity, contaminants, and/or vibration from contaminating and/or damaging the semiconductor substrates.

SYSTEMS, DEVICES, AND METHODS FOR AIR FLOW OPTIMIZATION INCLUDING ADJACENT A FOUP

A system comprises a front opening universal pod (FOUP) configured to hold one or more semiconductor wafers and a load dock having a stage and a receiving portion extending above the stage. The FOUP is positioned on the stage. A fan filter unit (FFU) positioned above the load dock. An air flow optimizer device is disposed on the receiving portion and under the FFU. The air flow optimizer device has an inlet opening and an outlet opening and a channel extends between the inlet opening and the outlet opening.

POLLUTANT DETECTION DEVICES AND MONITORING SYSTEM HAVING THE SAME

A detection device includes a transfer device to travel along a rail while gripping a carrier, and a detection structure mounted on the carrier. The detection structure includes a collector to suck in air, a detector connected to the collector, the detector including a plurality of sensors, a plurality of sensor control boards receiving electrical signals from the plurality of sensors, the plurality of sensor control boards generating, based on the electrical signals, type data and concentration data regarding pollutants included in the air sucked in by the collector, and a communication control board connected to the plurality of sensor control boards.

TRANSFER SYSTEM

A transfer system includes a ceiling carrier, a ceiling storage shelf, and a purging device. The ceiling carrier transfers a foup along a running rail. The ceiling storage shelf is provided along the running rail. The ceiling storage shelf stores the foup transferred by the ceiling carrier. The purging device purges the foup stored in the ceiling storage shelf. The ceiling storage shelf includes placement portions and for placing the foup thereon. The placement portions and can be moved with respect to a storage shelf body of the ceiling storage shelf by a driving gas supplied to the purging device.

AIRFLOW DETECTION DEVICE AND METHODS OF USE

An airflow detection device is capable of detecting airflow issues associated with a transport carrier, such as a blockage of a diffuser in a transport carrier or leakage of a transition bracket, among other examples. The airflow detection device includes an air tunnel through which a gas in a transport carrier may flow. The airflow detection device includes an airflow sensor configured to generate airflow data based on a flow of the gas through the air tunnel. In some implementations, the airflow detection device is included in an airflow detection system to perform automated measurements and to determine, identify, and/or detect airflow issues associated with a transport carrier. In this way, the airflow detection system may perform one or more automated actions (or may cause one or more other devices to perform one or more automated actions) based on a detection of a diffuser blockage or a transition bracket leak.

Substrate vacuum transport and storage apparatus

Embodiments of substrate transfer apparatus are provided herein. In some embodiments, an apparatus for storing and transporting at least one substrate in a vacuum includes a carrying case for storing one or more substrates, wherein the carrying case includes a vacuum port and a plurality of holders to hold one or more substrates within an inner volume of the carrying case; and a vacuum source in fluid connection with the carrying case via the vacuum port.

SIDE STORAGE PODS, EQUIPMENT FRONT END MODULES, AND METHODS FOR OPERATING EFEMS

Electronic device processing systems including an equipment front end module (EFEM) with a side storage pod are described. The EFEM includes an EFEM chamber and a recirculation duct. The side storage pod is fluidly coupled to the recirculation duct. The side storage pod includes an interior chamber and a side storage container disposed within the interior chamber. The side storage container is configured to receive one or more substrates from the EFEM chamber. The electronic device processing system further includes an environmental control system. The environmental control system is configured to circulate a purge gas between the EFEM chamber and the side storage pod via the recirculation duct.

Bottom gas purge unit, load port apparatus, and bottom gas purge method
11273472 · 2022-03-15 · ·

Provided is a bottom gas purge device including a nozzle that can be appropriately connected to a purge port. A bottom gas purge device configured to introduce a cleaning gas into a container from a bottom portion of the container accommodating a substrate includes: a mounting table on which the container is mounted; a nozzle provided so as to be movable relative to the mounting table in an upward-downward direction and connectable from below to a purge port provided in the bottom portion of the container; a gas supply unit configured to supply the cleaning gas to the nozzle; and a pressure sensor provided at a tip end portion of the nozzle and configured to detect a pressure rising between the purge port and the nozzle when the nozzle is connected to the purge port.

WORKPIECE CONTAINER SYSTEM

The instant disclosure discloses a workpiece container system comprising a storage assembly. The storage assembly comprises a seat member and a seat cover. The seat member defines a workpiece receiving region that encompasses a geometric center region thereof, configured to receive a workpiece; wherein a lower diffuse inducing component is provided on the seat member within a planar projection of the workpiece yet offsets the geometric center region. The seat cover is configured to engage the seat member at a periphery region around the workpiece receiving region thereof, so as to cooperatively form an enclosure for housing the workpiece; wherein an upper diffuse inducing component is provided on the seat cover over the planar projection of the workpiece and protectively overlaps the geometric center region of the seat member.