Patent classifications
H01L21/67706
Robot apparatus, drive assemblies, and methods for transporting substrates in electronic device manufacturing
A substrate-transporting robot apparatus is disclosed. The robot apparatus may include an upper arm, a forearm independently rotatable relative to the upper arm, a wrist member independently rotatable relative to the forearm, and an end effector adapted to carry a substrate. In some aspects, the independent rotation is provided by a robot drive assembly having a second driving pulley mounted for rotation on a first driving pulley. In another aspect, robot drive assemblies including base-mounted and web-mounted pulleys are disclosed. Robot drive assemblies and operational methods are provided, as are numerous other aspects.
Substrate conveying system
A substrate conveying system includes a substrate supply unit including a movable rack and an up-down unit which moves the movable rack down, a lift unit which has one or more ejection holes which eject a gas upward and is configured to lift-up the substrate supported on the movable rack by the pressure of the gas ejected through ejection holes when the up-down unit moves the movable rack down, and a conveying unit which includes a conveyor, and hook elements extending upward from the conveyor, and is configured to push in a conveying direction the substrate W being lifted-up by the pressure of the gas ejected through the ejection holes.
System for glass sheet semiconductor coating and resultant product
A glass sheet semiconductor deposition system (20) for coating semiconductor material on glass sheets is performed by conveying the glass sheets vertically suspended at upper extremities thereof by a pair of conveyors (38) through a housing (22) including a vacuum chamber (24). The glass sheets are conveyed on shuttles (42) through an entry load station (26) into the housing vacuum chamber (24), through a heating station (30) and at least one semiconductor deposition station (32, 34) in the housing (22), and to a cooling station (36) prior to exiting of the system through an exit load lock station (28). The semiconductor deposition station construction includes a deposition module (102) and a radiant heater (104) between which the vertical glass sheets are conveyed for the semiconductor deposition.
TRANSPORT DEVICE
A transport device is capable of reliably determining a presence or absence of a lid provided on a container and/or determining detachment of the lid, with a simple configuration. The transport device transports a container that includes a lid on a side surface. The transport device includes a lid fall preventive member disposed so as to face an upper end of the lid of the container located in a transport position, and a lid detector that is disposed in the lid fall preventive member and detects the presence or absence of the upper end of the lid.
SUBSTRATE PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD
A substrate processing apparatus including a plurality of processing devices each of which processes a substrate is provided. The apparatus comprises a conveying device including a conveyance path and conveys, to one of the plurality of processing devices, a substrate conveyed into one end of the conveyance path from an outside of the substrate processing apparatus, and an adjusting device configured to perform adjustment of a pre-alignment state of the substrate conveyed from the one end and to be conveyed into one of the plurality of processing devices, wherein the adjusting device is arranged on the conveyance path and between a processing devices of the plurality of processing devices, farthest from the one end, and a processing device, of the plurality of processing devices, closest to the one end.
Article transporter in semiconductor fabrication
A transporter for transporting an article used in semiconductor fabrication is provided. The transporter includes a robotic arm. The transporter further includes two platens connected to the robotic arm. Each of the two platens an inner surface facing the other, and a number of gas holes are formed on each of the inner surfaces of the two platens. The transporter also includes a gas supplier placed in communication with the gas holes. The gas supplier is used to control the flow of gas through the gas holes.
Load station
A substrate loading station including a frame forming a chamber configured to hold a controlled environment, a transfer robot connected to the frame and one or more substrate cassette holding locations each capable of having a substrate cassette holder disposed within the frame. Each of the one or more substrate cassette holding locations being configured to removably support a respective substrate cassette in a predetermined position for communication with the transfer robot to effect substrate transfer between a respective cassette and the transfer robot where the one or more substrate cassette holding locations are configured to effect the interchangeability of one or more substrate cassette holders with other substrate cassette holders for changing a substrate cassette holding capacity of the substrate loading station.
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
During a position deviation detection operation, a hand of a transport mechanism is moved to a true target position in a substrate supporter. A substrate supported at a preset reference position by the substrate supporter is received by the hand of the transport mechanism. A positional relationship between the substrate received by the hand and the hand is detected by a position detector. A deviation amount between the reference position and the true target position in the substrate supporter is acquired based on the detected positional relationship. An alarm is output in the case where the acquired deviation amount is larger than a predetermined threshold value.
Treatment device, plating apparatus including the same, conveying device, and treatment method
To stably convey a substrate (workpiece) while suppressing the workpiece from bending. A treatment device is provided. This treatment device includes: a conveying part that conveys a workpiece in a state where a flat surface of the workpiece is inclined around a conveying directional axis relative to a horizontal plane; and a treatment part in which at least one of polishing and cleaning is performed on the flat surface of the workpiece, wherein the conveying part has a drive part configured to be brought into physical contact with an end part of the workpiece and apply force in a conveying direction to the workpiece, a first Bernoulli chuck arranged to face the flat surface of the workpiece, and a second Bernoulli chuck arranged to face an end face of an opposite end part to the end part of the workpiece.
Guide module and driving device having the same
Disclosed is a guide module and a driving device having the guide module. The driving device includes a moving unit mounted on a pinion interacting with a rack and moving with the pinion along a trajectory of the rack, and a guide module arranged at at least any one side of the rack, connected to the moving unit, and guiding a movement of the moving unit that moves with the pinion along the trajectory of the rack.