There is provided a conveyance system that conveys a workpiece to each of plural processing apparatuses. The conveyance system includes a conveyance passage, an automated workpiece conveying vehicle that travels on the conveyance passage, a stock unit, and a control unit. The conveyance passage is set in a space directly above the processing apparatus across the plural processing apparatus. The stock unit includes a placement base on which a workpiece stocker capable of housing plural workpieces is placed, two temporary putting bases on which the workpiece carried out from the workpiece stocker on the placement base is temporarily put, a temporary putting base movement part that moves the two temporary putting bases in such a manner as to interchange the two temporary putting bases between a first position that faces the placement base and a second position adjacent to the first position.

A method and apparatus for loading substrates in an inspection station is disclosed herein. In one embodiment a loading module is disclosed that includes a loading station for two or more substrate cassettes, a first lane comprising a first conveyor that is substantially aligned with one of the two or more substrate cassettes and a conveyor system, a second lane comprising a second conveyor that is substantially aligned with another of the two or more substrate cassettes and positioned in a spaced-apart relation relative to the first lane, and a lateral transfer module positioned between the first lane and the second lane that is adapted to move substrates from the second lane to the first lane.

A wafer manufacturing apparatus includes an ingot grinding unit for grinding an upper surface of an ingot to planarize the upper surface of the ingot, a laser applying unit for forming peel-off layers in the ingot at a depth therein, which corresponds to the thickness of a wafer to be produced from the ingot, from the upper surface of the ingot, a wafer peeling unit for holding the upper surface of the ingot and peeling off a wafer from the ingot at the peel-off layers, a tray having an ingot support portion and a wafer support portion, and a belt conveyor unit for delivering the ingot supported on the tray between the ingot grinding unit, the laser applying unit, and the wafer peeling unit.

An apparatus configured to join electronic components to an electronic substrate includes a chamber housing including a tunnel extending through multiple processing zones, a conveyor configured to transport electronic substrates in the tunnel through the multiple processing zones, and a heat detection system including at least one temperature sensor coupled to the chamber housing. The at least one temperature sensor is configured to detect temperatures of the electronic substrates passing proximate to the at least one temperature sensor. The apparatus further includes a controller coupled to the multiple processing zones, the conveyor and the heat detection system. The controller is configured to receive temperature data from the heat detection system.

A substrate processing apparatus including a frame, a first SCARA arm connected to the frame, including an end effector, configured to extend and retract along a first radial axis; a second SCARA arm connected to the frame, including an end effector, configured to extend and retract along a second radial axis, the SCARA arms having a common shoulder axis of rotation; and a drive section coupled to the SCARA arms is configured to independently extend each SCARA arm along a respective radial axis and rotate each SCARA arm about the common shoulder axis of rotation where the first radial axis is angled relative to the second radial axis and the end effector of a respective arm is aligned with a respective radial axis, wherein each end effector is configured to hold at least one substrate and the end effectors are located on a common transfer plane.

The present disclosure provides an electrochemical deposition apparatus set. The electrochemical deposition apparatus set includes: an electrochemical deposition device configured to form an electrochemical deposition film layer on an area to be coated of a substrate; an antioxidation treatment device located on a side of the electrochemical deposition device and configured to performing antioxidation treatment on the substrate formed with the electrochemical deposition film layer; a transmission device configured to carry the substrate and drive the substrate to move at least from the electrochemical deposition device to the antioxidation treatment device.

The present application relates to a substrate transfer device, comprising a horizontally arranged cross beam, and support beams longitudinally arranged at two ends of the cross beam, wherein a substrate carrier is suspended on the cross beam, the substrate carrier is located between the two support beams, and the substrate carrier is parallel to a plane where the two support beams are located, the substrate carrier comprises two side walls oppositely arranged in a horizontal direction, and each of the support beams is provided with an auxiliary clamping structure for clamping the substrate carrier during transferring of the substrate carrier.

In an embodiment, a system includes: a warehousing apparatus configured to interface with a semiconductor die processing tool configured to process a semiconductor die singulated from a wafer, wherein the semiconductor die processing tool comprise an in-port and an out-port, wherein the warehousing apparatus is configured to: move a first die vessel that contains the semiconductor die to the in-port from a first die vessel container, wherein the first die vessel container is configured to house the first die vessel; move the first die vessel from the in-port to a buffer region; and move a second die vessel from the buffer region to the out-port.

A wafer transport device is moved on a transport rail, and stopped above a load port having a top surface. A light beam is projected onto the top surface of the load port, and image of the top surface is and the light beam is captured. A position of the hoist unit of the wafer transport device is aligned with respect to a position of the load port according to the image. The hoist unit is lowered toward the load port.

Provided is a transport vehicle system SYS1 in which: an overhead transport vehicle includes a main body, a holder, a lift driver, and a lateral extender; a port pitch P is less than the overall length VL of the overhead transport vehicle in an extending direction D; and a first portion, which is raised or lowered by the lift driver moved in a lateral direction by a lateral extender, of an overhead transport vehicle stopped at a first position P1 on a first track for transferring an article W to a first transfer location S1 is offset in the extending direction D from a second portion, which is moved in a lateral direction by means of the drive of a lateral extender, of an overhead transport vehicle stopped at a second position P2 on the second track for transferring an article W to a second transfer location S2.