H01L21/67712

CARRIER FOR A SUBSTRATE AND METHOD FOR CARRYING A SUBSTRATE
20210233783 · 2021-07-29 ·

A carrier configured for holding and transporting a substrate in a transport direction in a vacuum processing system and a method for carrying a substrate in a transport direction during a deposition process in a deposition chamber with a carrier is described. The carrier includes two side edges opposing each other, a joining structure arranged between the side edges, having a flat structure comprising a plurality of apertures, each exposing the same substrate and an aperture ratio of at least 0.5, and a holding assembly configured for holding the substrate adjacent to the joining structure.

Substrate processing system

A substrate processing system includes a substrate processing set and a substrate holding unit. The substrate processing set includes a substrate supporting part for supporting a vertical substrate. The substrate holding unit includes two cantilevers and two substrate holding parts. Each of the substrate holding parts is respectively located on each of the cantilevers. The two substrate holding parts are used for holding the substrate vertically. When the substrate holding unit moves next to the substrate processing set and the two substrate holding parts touch the substrate, the two substrate holding parts hold the substrate.

Substrate treating apparatus

A substrate treating apparatus includes the following elements: an indexer block including indexer robots provided for respective carrier receivers and disposed in horizontally fixed positions, each of the indexer robots having arms for taking substrates out of a carrier and loading the substrates into the carrier on the carrier receiver; a bridge block disposed adjacent the indexer block; and a treating block including a plurality of stacked stories each having at least one treating unit. The bridge block includes a buffer, a pass having a plurality of tables covering a range from a bottom story to a top story of the plurality of stories, and two bridge robots each having an arm for transferring the substrates to and from the pass.

PLASMA TREATMENT APPARATUS
20210233751 · 2021-07-29 · ·

A plasma treatment apparatus includes a plurality of plasma treatment chambers S2 to S6 in which a plasma treatment is performed on a base material X, a tray Y configured to hold the base material X in a standing posture, and a lift mechanism 10 configured to continuously convey the tray Y to the plurality of plasma treatment chambers S2 to S6 in order to continuously perform a plasma treatment even when the base material is difficult to wind on a roll.

CIRCULATION CONVEYOR TRANSPORT WHEEL, SUBSTRATE CARRIER AND METHOD
20210221622 · 2021-07-22 ·

According to various aspects of the disclosure, a circulation conveyor transport wheel (100) may have: a framework (102) at which the circulation conveyor transport wheel (100) can be rotatably mounted; a multiplicity of coupling devices (104) which are arranged at an outer circumference of the framework (102) and of which each of the coupling devices has at least one form-fit contour (104f) for the form-fitting coupling-on of a substrate carrier (400), wherein the multiplicity of coupling devices (104) has a pair (302) of coupling devices (104), the form-fit contours of which have a smaller spacing to one another along the circumference than to the form-fit contours of the multiplicity of coupling devices (104) which are arranged immediately adjacent to the pair (302).

SYSTEMS AND METHODS FOR FIXED FOCUS RING PROCESSING
20210202295 · 2021-07-01 ·

In an embodiment, a system includes: a base with a bore hole, wherein the base is configured to secure a wafer at a first position on the base; a pin extending through the bore hole; a focus ring horizontally surrounding the wafer at the first position and extending upwardly from the base, wherein the wafer is configured to be moved vertically between the first position and a second position above the focus ring via the pin; and a slit valve above the focus ring, wherein the wafer is configured to be moved horizontally between the second position and the slit valve via a robotic arm.

MICRO-LED ARRAY TRANSFER METHOD, MANUFACTURING METHOD AND DISPLAY DEVICE

A micro-LED transfer method, manufacturing method and display device are provided. The micro-LED transfer method comprises: bonding the micro-LED array on a first substrate onto a receiving substrate through micro-bumps, wherein the first substrate is laser transparent; applying underfill into a gap between the first substrate and the receiving substrate; irradiating laser onto the micro-LED array from a side of the first substrate to lift-off the micro-LED array from the first substrate; and removing the underfill.

Micro-LED array transfer method, manufacturing method and display device

A micro-LED transfer method, manufacturing method and display device are provided. The micro-LED transfer method comprises: bonding the micro-LED array on a first substrate onto a receiving substrate through micro-bumps, wherein the first substrate is laser transparent; applying underfill into a gap between the first substrate and the receiving substrate; irradiating laser onto the micro-LED array from a side of the first substrate to lift-off the micro-LED array from the first substrate; and removing the underfill.

Methods and apparatus for novel fabricators with Cleanspace
11024527 · 2021-06-01 ·

The present disclosure provides various apparatus and methods for novel cleanspace fabricator designs. In some examples, a cleanspace fabricator may be comprised of vertically stacked tools wherein the product and the processing tools are conveyed through the cleanspace. The fabricator may comprise a processor performing cognitive computing algorithms. In some examples, the processor may be located at a remote location and communication with the cleanspace fabricator. Product may be comprised of or processed upon substrates in some examples. In other examples product may be comprised of materials contained within vessels. In some examples the product within vessels may be in liquid or powder form.

PROCESSING APPARATUS
20210166963 · 2021-06-03 ·

A processing apparatus includes a chuck table that holds a workpiece, a cutting unit that processes the workpiece held by the chuck table, a cassette placing region where a cassette is placed, a carrying unit that carries the workpiece between the cassette placed in the cassette placing region and the chuck table, and a surrounding wall that partitions a route for lifting the cassette upward and downward from an external space, in a space directly above the cassette placing region. A height of the surrounding wall is equal to or more than a height of a ceiling wall of the processing apparatus and is so as not to interfere with the cassette held by a carrier that travels.