A storage system includes an overhead stocker having a first overhead track, a rack including a plurality of storages arranged vertically, and a crane that travels along the first overhead track and delivers and receives an article to and from the storages; and an overhead transport vehicle system having a second overhead track provided below a lower end of the overhead stocker, and an overhead transport vehicle that travels along the second overhead track and delivers and receives an article to and from a predetermined transfer destination, wherein the first overhead track has an elevating track capable of supporting and lowering the crane that is stopped traveling at a portion deviated from the second overhead track in planar view.

A substrate treating apparatus includes a carrier platform, a transport mechanism, and a controller. The carrier platform places a carrier thereon. The carrier includes a plurality of shelves arranged in an up-down direction. The shelves are each configured to place one substrate thereon in a horizontal posture. The transport mechanism is configured to transport a substrate to a carrier placed on the carrier platform. The controller controls the transport mechanism. The transport mechanism includes a hand and a hand driving unit. The hand supports a substrate. The hand driving unit moves the hand. The controller changes a height position of the hand when the hand is inserted between two of the shelves adjacent to each other in the up-down direction, depending on a shape of a substrate taken from or placed on one of the shelves by the transport mechanism.

A system and an operating method for automated wafer carrier handling are provided. The system includes a storage rack including a standby position and a storage position separated from each other, a first and second moving mechanism, and a controller operatively coupled to the first and second moving mechanism to control operations of the first and second moving mechanism. The storage position is for buffering a wafer carrier awaiting transfer to a load port. The first moving mechanism is movably coupled to the storage rack and provides at least one degree of freedom of movement to transfer the wafer carrier from the storage position to the standby position. The second moving mechanism is disposed over the storage rack, operatively coupled the storage rack to the load port, and provides at least one degree of freedom of movement to transfer the wafer carrier from the standby position to the load port.

According to one embodiment, there is provided a substrate storage apparatus including a storage unit and an exhaust unit. The storage unit includes a plurality of plates. The exhaust unit includes an exhaust passage and a wall portion. The exhaust passage communicates with an exhaust port. The wall portion intervenes between the storage unit and the exhaust passage. The wall portion includes a plurality of slit holes. The plurality of plates protrude inward from a cabinet in the storage unit. Plates among the plurality of plates are capable of mounting a substrate. The plurality of plates are arrayed in a vertical direction. The plurality of slit holes are arrayed in the vertical direction to correspond to the plurality of plates. Each of the plurality of slit holes extends in a horizontal direction and penetrates the wall portion.

A storage system includes shelves each with a nozzle to supply clean gas into containers, flow amount controllers to control a supply amount of clean gas to a nozzle, a transport apparatus to transfer the containers to and from the shelves, and a controller to control the transport apparatus and the flow amount controllers. The controller makes an assignment of at least one shelf in preparation to store an incoming container and before the occurrence of the incoming container, and controls a flow amount controlling device to supply clean gas to the nozzle in the at least one shelf, based upon the assignment.

A mobile stocker described herein is configured to be easily installed and relocated to various locations in a semiconductor fabrication facility. The mobile stocker is capable of being programmed with, and/or autonomously learning, the layout of a semiconductor fabrication facility, and automatically relocating to a new location based on the layout using a navigation system. Accordingly, the mobile stocker is capable of being flexibly relocated in the semiconductor fabrication facility to dynamically support changes in demand and production capacity. Moreover, the capability to quickly assign a location identifier to the mobile stocker and to automatically interface with transport systems in the semiconductor fabrication facility reduces downtime of the mobile stocker, which increases productivity in the semiconductor fabrication facility.

A wafer stocker is capable of further improving an environment around wafers. The wafer stocker includes a housing, a loading device provided on a front surface of the housing, a wafer cassette shelf arranged in the housing, a wafer transfer robot configured to move the wafers from a transfer container mounted on the loading device to a wafer cassette in the wafer cassette shelf, a wafer cassette delivery device configured to move the wafer cassette in the wafer cassette shelf to a stage having a different height, and a fan filter unit configured to generate a laminar flow in a wafer transfer space and in a wafer cassette transfer space.

Various examples include a system and network to map of substrates within a substrate carrier (e.g., such as silicon wafers within a wafer cassette), and a classification of a state of each substrate, as well as the carrier in which the substrates are placed. In various examples provided herein, an image acquisition system, such as a camera, acquires multiple images of the substrates within the carrier. The image or images are then processed with a deep-convolutional neural-network to classify a state of the substrate relative to a substrate slot including empty slots, occupied slots (e.g., properly loaded slots), double-loaded slots, cross-slotted, and protruded (where a substrate is not fully loaded into a slot).

The treating arrangement (900) for an epitaxial reactor (1000) comprises: a reaction chamber (100) for treating substrates, a transfer chamber (200) adjacent to the reaction chamber (100), for transferring substrates placed over substrates support devices, a loading/unloading group (300) at least in part adjacent to the transfer chamber (200), arranged to contain a substrates support device with one or more substrates, a loading/unloading chamber (400) at least in part adjacent to the loading/unloading group (300), having a first storage zone (410) for treated and/or untreated substrates and a second storage zone (420) for substrates support devices without any substrate, at least one external robot (500) for transferring treated substrates, untreated substrates and substrates support devices without any substrate between said loading/unloading chamber (400) and said loading/unloading group (300), at least one internal robot (600) for transferring substrates support devices with one or more substrates between said loading/unloading group (300) and said reaction chamber (100) via said transfer chamber (200); wherein said external robot (500) comprises an articulated arm (510) arranged to handle both treated substrates and untreated substrates as well as substrates support devices.

A substrate transfer device includes a transfer unit configured to transfer, in a first direction, a carrier in which substrates are stored, an upper interface unit configured to move the transfer unit, a lower interface unit configured to receive the carrier from the transfer unit, and a controller configured to control the upper interface unit and the lower interface unit integrally such that the transfer unit and the carrier move in the first direction at the same time.