A first lid opening-and-closing mechanism includes: a first holder that holds an upper lid of a first container; a first protrusion provided to protrude from the first holder toward one side direction with respect to the first holder and extends to outside of a casing; and a first raising/lowering driver that raises and lowers the first holder in a cantilevered manner with the first protrusion interposed therebetween. A second lid opening-and-closing mechanism includes: a second holder that holds an upper lid of a second container; a second protrusion provided to protrude from the second holder toward the one side direction and extends to the outside of the casing; and a second raising/lowering driver that raises and lowers the second holder in a cantilevered manner with the second protrusion interposed therebetween. The first raising/lowering driver and the second raising/lowering driver are located outside the casing in the one side direction.

The present disclose relates to a substrate delivery method that uses a substrate delivery device including an elevating body for moving upward and downward a plurality of mounting parts, on which a transport container for a substrate is placed. The substrate delivery method of the present disclosure comprises loading and unloading the substrate in the transport container; temporarily suspending the loading and unloading for the transport container when the external transport mechanism tries to deliver a transport container to and from another mounting part; and positioning said other mounting part at the delivery height position and delivering the transport container to and from the external transport mechanism.

There is provided a transfer abnormality detection system capable of receiving information from a container transfer device configured to transfer a transfer container and a mounting device configured to load the transfer container that is transferred by the container transfer device, the system including: a determination part configured to: record which container transfer device is transferring the transfer container based on a container identification ID assigned to each transfer container and a transfer device identification ID assigned to each transfer device; and determine an abnormality in either or both of the container transfer device and the transfer container by combining vibration detection information of the container transfer device obtained by a vibration detection part provided in the container transfer device and state detection information of the transfer container obtained by a container state detection part provided in the mounting device.

A system comprises a front opening universal pod (FOUP) configured to hold one or more semiconductor wafers and a load dock having a stage and a receiving portion extending above the stage. The FOUP is positioned on the stage. A fan filter unit (FFU) positioned above the load dock. An air flow optimizer device is disposed on the receiving portion and under the FFU. The air flow optimizer device has an inlet opening and an outlet opening and a channel extends between the inlet opening and the outlet opening.

A system includes a filter purge apparatus configured to supply a flushing gas to a portion of a factory interface chamber located upstream of a chamber filter to minimize moisture contamination of the chamber filter by ambient air. The filter purge apparatus is configured to supply the flushing gas in association with breach of the factory interface chamber which compromises controlled environment of the factory interface chamber.

A load port control unit performs an opening operation of a sealable container according to a first operation procedure when a sensor has detected a normal placement of the sealable container, and retries the opening operation according to a second operation procedure for being able to more reliably perform the opening operation of the sealable container, to prevent a transfer device from stopping, when the sensor has detected a placement abnormality of the sealable container.

Proposed is an EFEM configured to perform wafer transfer between a wafer storage device and process equipment. More particularly, proposed is an EFEM that prevents harmful gases inside a transfer chamber in which wafer transfer is performed from escaping out of the EFEM.

A substrate loading device including a frame adapted to connect to a substrate processing apparatus, the frame having a transport opening through which substrates are transported to the processing apparatus, a cassette support connected to the frame for holding at least one substrate cassette container proximate the transport opening, the support configured so that a sealed internal atmosphere of the container is accessed from the support at predetermined access locations of the container, and the cassette support has a predetermined continuous steady state differential pressure plenum region, determined at least in part by boundaries of fluid flow generating differential pressure, so that the predetermined continuous steady state differential pressure plenum region defines a continuously steady state fluidic flow isolation barrier disposed on the support between the predetermined access locations of the container and another predetermined section of the support isolating the other predetermined section from the predetermined access locations.

A pod opener includes an elevating mechanism elevating the cassette in a vertical direction, a first hook member engaging with an engagement means of the cassette and supporting the cassette, a second hook member supported by the first hook member, a forward and backward movement mechanism moving the first hook member and the second hook member forward and backward with respect to the cassette, an urging member urging the second hook member upward, and an atmosphere maintaining device maintaining an internal space having the cassette disposed therein in a predetermined atmosphere and the second hook member is displaceable with respect to the first hook member.

Provided is a holding device 45 capable of holding securely and transporting a thin plate-shaped substrate for which surface processing has been completed without causing a natural oxide film to form on the surface to be processed thereof. This holding device 45 comprises a holding member 47 for holding the thin plate-shaped substrate, a purge plate 46 having formed therein a flow path 52 for the purpose of flowing therethrough an inert gas, and a piping member for connecting an inert gas supply source to the flow path 52. The purge plate 46 is equipped with discharged ports 51, which communicate with the flow path 52 and are provided on a surface facing the surface to be processed of the thin plate-shaped substrate held by the holding member 47, for the purpose of discharging the inert gas onto the processing surface of the thin plate-shaped substrate. In addition, the holding device 45 is equipped with a raising and lowering mechanism 48 that cause the holding member 47 and the purge plate 46 to be raised and lowered relative to each other.