Patent classifications
H01L23/49822
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
An electronic device and a method of manufacturing an electronic device. As non-limiting examples, various aspects of this disclosure provide various methods of manufacturing electronic devices, and electronic devices manufactured thereby, that comprise utilizing metal studs to further set a semiconductor die into the encapsulant.
INTERCONNECTION STRUCTURE AND SEMICONDUCTOR PACKAGE INCLUDING THE SAME
A method for manufacturing a semiconductor package may include: forming a photoimageable dielectric layer on a substrate including a pad; forming a preliminary via hole in the photoimageable dielectric layer to expose the pad; forming a hard mask layer on the photoimageable dielectric layer and the pad; etching the photoimageable dielectric layer and the hard mask layer to form a via hole, a first hole, and a trench; forming a metal layer on the photoimageable dielectric layer connected to the pad; planarizing the metal layer to form a wiring pattern; and placing a semiconductor chip electrically connected to the wiring pattern. The first hole may be disposed on the via hole and connected thereto, and a diameter of the first hole may be larger than a diameter of the via hole.
CHIP-SUBSTRATE COMPOSITE SEMICONDUCTOR DEVICE
A semiconductor device includes a high-voltage semiconductor transistor chip having a front side and a backside. A low-voltage load electrode and a control electrode are disposed on the front side of the semiconductor transistor chip. The semiconductor device further includes a dielectric inorganic substrate having a first side and a second side opposite the first side. A pattern of first metal structures runs through the dielectric inorganic substrate and is connected to the low-voltage load electrode. At least one second metal structure runs through the dielectric inorganic substrate and is connected to the control electrode. The front side of the semiconductor transistor chip is attached to the first side of the dielectric inorganic substrate. The dielectric inorganic substrate has a thickness measured between the first side and the second side of at least 50 μm.
SEMICONDUCTOR DEVICE
A semiconductor chip includes a front surface and a back surface, a source pad, a drain pad and a gate pad on the front surface; a die pad under the semiconductor chip and bonded to the semiconductor chip; a source lead, electrically connected to the die pad; a drain lead and a gate lead, disposed on a periphery of the die pad; and a sealing resin. A plurality of vias for external connection are formed to connect to the source pad. A first subset of the plurality of vias for external connection is disposed along a first side of the source pad, and a second subset of the plurality of vias for external connection is disposed along a second side of the source pad, wherein the first and second sides are arranged adjacent to each other to form a first edge of the source pad.
ESTER COMPOUND AND RESIN COMPOSITION
Compounds containing, in one molecule thereof, a structure represented by formula (1), a structure represented by formula (2), and a structure represented by formula (3) (all the symbols are those described in the specification).
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are useful as epoxy resin curing agents.
High-Speed Signal Transition Across Thick Package Cores
A tuning structure to mitigate a capacitive discontinuity in an integrated circuit (IC) package includes an electrical conductor having a first end, a second end, and a conductor body between the first end and the second end. The first end is electrically coupled to a signal via, and the second end electrically coupled to an IC package core via cap. The electrical conductor is disposed substantially coplanar with the core via cap, and the conductor body is disposed along an outer perimeter of the core via cap. The second end is coupled to the via cap at a contact location. The contact location is determined based on a measurement of a performance metric associated with the transmission path through the IC package core, the core via cap, the electrical conductor, and the signal via.
Semiconductor device and method of forming dual-sided interconnect structures in FO-WLCSP
A semiconductor device has a substrate with first and second conductive layers formed over first and second opposing surfaces of the substrate. A plurality of bumps is formed over the substrate. A semiconductor die is mounted to the substrate between the bumps. An encapsulant is deposited over the substrate and semiconductor die. A portion of the bumps extends out from the encapsulant. A portion of the encapsulant is removed to expose the substrate. An interconnect structure is formed over the encapsulant and semiconductor die and electrically coupled to the bumps. A portion of the substrate can be removed to expose the first or second conductive layer. A portion of the substrate can be removed to expose the bumps. The substrate can be removed and a protection layer formed over the encapsulant and semiconductor die. A semiconductor package is disposed over the substrate and electrically connected to the substrate.
Semiconductor package and method of forming the same
Various embodiments may provide a semiconductor package. The semiconductor package may include a semiconductor chip, a first mold compound layer at least partially covering the semiconductor chip, and a redistribution layer over the first mold compound layer, the redistribution layer including one or more electrically conductive lines in electrical connection with the semiconductor chip. The semiconductor package may additionally include a second mold compound layer over the redistribution layer, and an antenna array over the second mold compound layer, the antenna array configured to be coupled to the one or more electrically conductive lines.
Patterning of dual metallization layers
Embodiments may relate to a semiconductor package that includes a routing trace coupled with a substrate. The routing trace may be linear on a side of the routing trace between the substrate and a top of the routing trace. The semiconductor package may further include a power trace coupled with the substrate. The power trace may be concave on a side of the power trace between the substrate and a top of the power trace. Other embodiments may be described and/or claimed.
Integrated memory coplanar transmission line package having ground path that brackets data path to extend memory speeds
Embodiments disclosed herein include electronic packages and methods of forming such packages. In an embodiment, the electronic package comprises a package substrate, that comprises a bumpout region on a first surface of the package substrate, and a pin region on a second surface of the package substrate. In an embodiment, a data path from the bumpout region to the pin region is included in the electronic package. In an embodiment, a ground path brackets the data path from the bumpout region to the pin region.