The present embodiment relates to a radiation detector having a structure enabling suppression of polarization in a thallium bromide crystalline body and suppression of corrosion of an electrode in the air. The radiation detector comprises a first electrode, a second electrode, and a thallium bromide crystalline body provided between the first and second electrodes. One of the first and the second electrodes includes an alloy layer and a low-resistance metal layer provide on the alloy layer. The alloy layer is comprised of an alloy of metallic thallium and another metal different from the metallic thallium. The low-resistance metal layer has a resistance value lower than a resistance value of the alloy layer and is electrically connected to a pad on a readout circuit while the radiation detector is mounted on the readout circuit.

An semiconductor detector includes an n-type semiconductor substrate, a detection electrode formed on a first surface of the semiconductor substrate, a plurality of drift electrodes formed to surround the detection electrode and applied with a voltage causing a potential gradient in which a potential changes toward the detection electrode, a radiation incidence window provided on a second surface of the semiconductor substrate, a P-type semiconductor region formed by adding boron to a surface side on the second surface of the semiconductor substrate through the radiation incidence window, and a depleting electrode causing a reverse bias between the P-type semiconductor region formed on the second surface and an N-type semiconductor region formed in the semiconductor substrate. F is added to the P-type semiconductor region, and a region with the highest concentration of F is located deeper than a region with the highest concentration of B.

The present invention relates to a betavoltaic battery comprising: a substrate; an intrinsic semiconductor unit disposed on the substrate; an N-type semiconductor unit and a P-type semiconductor unit that are disposed on at least a portion of a surface of the intrinsic semiconductor unit and arranged alternately; and beta ray sources that are disposed on the N-type semiconductor unit and the P-type semiconductor unit. The present invention also relates to a method for manufacturing a betavoltaic battery, comprising the steps of: (A) forming an intrinsic semiconductor unit on a substrate; (B) forming an N-type semiconductor unit and a P-type semiconductor unit alternately by irradiating at least a portion of the surface of the intrinsic semiconductor unit with an ion beam; and (C) disposing a beta ray source on the N-type semiconductor unit and the P-type semiconductor unit.

The low-penetrating particles low gain avalanche detector comprises a multi-layered structure and receives particles from a radiation source (13). It consists of a thin entry region that receives the particles from the radiation source (13); a low-penetrating particles detection region, with a p++ shallow field stop (1), positioned beneath the entry region, and a p absorption layer (3), positioned beneath the p++ shallow field stop (1), and an n multiplication layer (4); and a high-penetrating particles detection region positioned beneath the n multiplication layer (4), consisting of a n-- silicon substrate (5). Due to the chosen doping polarities, the primary electrons (created by the particles from the radiation source (13)) drift away from the entry region. That way, signals from low-penetrating particles or radiation experience amplification, while the noise is kept similar to a conventional PIN structure, thus increasing the signal-to-noise ratio.

The low-penetrating particles low gain avalanche detector comprises a multi-layered structure and receives particles from a radiation source (13). It consists of a thin entry region that receives the particles from the radiation source (13); a low-penetrating particles detection region, with a p++ shallow field stop (1), positioned beneath the entry region, and a p absorption layer (3), positioned beneath the p++ shallow field stop (1), and an n multiplication layer (4); and a high-penetrating particles detection region positioned beneath the n multiplication layer (4), consisting of a n-- silicon substrate (5). Due to the chosen doping polarities, the primary electrons (created by the particles from the radiation source (13)) drift away from the entry region. That way, signals from low-penetrating particles or radiation experience amplification, while the noise is kept similar to a conventional PIN structure, thus increasing the signal-to-noise ratio.

A one-piece device for detecting particles with semiconductor material includes a substrate layer and at least one additional layer disposed on a first face of the substrate layer so as to form at least one first detector comprising a first space charge zone through which a beam of particles passes and first collector means for charge carriers produced by this passage. It further includes at least one other additional layer disposed on a second face of the same substrate layer, opposite the first face, so as to form at least one second detector comprising a second space charge zone through which the beam of particles also passes and second collector means for charge carriers produced by this passage.

Disclosed herein is a radiation detector comprising: a layer of quantum dots configured to emit a pulse of visible light upon absorbing a radiation particle; an electronic system configured to detect the radiation particle by detecting the pulse of visible light.

Disclosed herein is a radiation detector comprising: a layer of quantum dots configured to emit a pulse of visible light upon absorbing a radiation particle; an electronic system configured to detect the radiation particle by detecting the pulse of visible light.

The present embodiment relates to a radiation detector having a structure enabling suppression of polarization in a thallium bromide crystalline body and suppression of corrosion of an electrode in the air. The radiation detector comprises a first electrode, a second electrode, and a thallium bromide crystalline body provided between the first and second electrodes. One of the first and the second electrodes includes an alloy layer and a low-resistance metal layer provide on the alloy layer. The alloy layer is comprised of an alloy of metallic thallium and another metal different from the metallic thallium. The low-resistance metal layer has a resistance value lower than a resistance value of the alloy layer and is electrically connected to a pad on a readout circuit while the radiation detector is mounted on the readout circuit.

Disclosed is a photosensitive component, including: an intrinsic layer; a first doped layer provided on a light incident side of the intrinsic layer; and a second doped layer provided on a light exit side of the intrinsic layer; the intrinsic layer, the first doped layer and the second doped layer are all doped with a dopant, and silicon ions are injected into the intrinsic layer, the first doped layer and the second doped layer. An X-ray detector and a display device are further disclosed.