A manufacturing method for the LED structure, including: growing a first conductive-type semiconductor layer on a substrate; growing an active layer on the first conductive-type semiconductor layer, where the active layer includes a potential well layer, an insertion layer and a potential barrier layer that are stacked, the insertion layer includes a first insertion layer and a second insertion layer that are stacked, a quantum confinement Stark effect is generated between the first insertion layer and the potential well layer, the materials of the potential well layer, the first insertion layer and the potential barrier layer are all group III-V semiconductor materials, and the material of the second insertion layer includes SiN bonds for repairing V-type defects of the first insertion layer; and growing a second conductive-type semiconductor layer on the active layer, where the first conductive-type semiconductor layer and the second conductive-type semiconductor layer have opposite conductivity types.

The present invention is applicable to display device-related technical fields and may provide a transfer substrate in which multiple semiconductor light-emitting elements of a first color and a light conversion layer formed on at least a portion of the semiconductor light-emitting elements to convert the first color into a second color or a third color are formed, the transfer substrate comprising: multiple unit pixels including one light-emitting element among the multiple semiconductor light-emitting elements; and a pixel including at least one of the multiple unit pixels, wherein the pixel includes a first pixel and a second pixel adjacent to each other and the light conversion layer of the unit pixel disposed at a position adjacent to the first pixel and the second pixel includes a light-emitting element which converts the first color into the same color.

A light-emitting device includes a substrate having a top surface, wherein the top surface includes a first portion and a second portion; a first semiconductor stack on the first portion, including a first upper surface and a first side wall; and a second semiconductor stack on the first upper surface, including a second upper surface and a second side wall, and wherein the second side wall connects the first upper surface; wherein the first semiconductor stack includes a dislocation stop layer; and wherein the first side wall and the second portion of the top surface form an acute angle between thereof.

A micro-light emitting diode (LED) pixel element and a method of fabricating the same. The pixel element includes a mask layer and a N-type core partially in an opening of the mask layer; a quantum well structure on the N-type core including at least one quantum well, each quantum well including an active layer, and at least two barrier layers including a first barrier layer and a second barrier layer, and a P-cladding layer on the quantum well structure. The active layer includes at least one of AlInN, InGaN, InGaNY or InGaNSc. The at least two barrier layers include: GaScN, wherein the active layer is in contact with and between the first barrier layer and the second barrier layer; or a GaN-based material, wherein the first barrier layer includes GaN, and is in contact with a surface of the active layer facing away from the N-type core, and the second barrier layer is a cap layer that includes at least one of AlGaN or ScGaN, and is in contact with a surface of the first barrier layer facing away from the N-type core. The cap layer is grown using pulse metalorganic chemical vapor deposition at a temperature below 600 degrees Celsius.

A method for manufacturing an image display device includes: preparing a substrate, the substrate comprising a semiconductor layer, the semiconductor layer comprising a light emitting layer, the semiconductor layer being formed on a first substrate; bonding the semiconductor layer to a second substrate, the second substrate comprising a circuit that comprises a circuit element; forming a light emitting element by etching the semiconductor layer; forming an insulating film covering the light emitting element; forming a via reaching the circuit through the insulating film; and electrically connecting the light emitting element and the circuit element through the via, the via connecting the light emitting element and the circuit element provided in different layers.

A method for manufacturing a micro light emitting diode device is provided. A connection layer and a plurality of epitaxial structures are formed on a substrate, wherein the epitaxial structures are separated from each other and relative positions therebetween are fixed via the connection layer. A first pad is formed on each of the epitaxial structures. A plurality of light blocking layers are formed between the epitaxial structures, wherein the light blocking layers and the epitaxial structures are alternately arranged. Each of the epitaxial structures is bonded to a destination substrate after forming the light blocking layers. The substrate is removed to expose the connection layer. A light conversion layer is formed corresponding to each of the epitaxial structures, wherein a width of the light conversion layer is greater than or equal to a distance between any two of the light blocking layers.

A light-emitting device, includes a substrate structure, including a base portion having a surface and a plurality of protrusions formed on the base portion; a buffer layer covering the plurality of protrusions and the surface; and III-V compound semiconductor layers formed on the buffer layer; wherein one of the plurality of protrusions has a height not greater than 1.5 m; wherein the light-emitting device has a full width at half maximum (FWHM) of smaller than 250 arcsec in accordance with a (102) XRD rocking curve.

Methods of forming an integrated InGaN/GaN or AlInGaP/InGaP LED on Si CMOS for RGB colors and the resulting devices are provided. Embodiments include forming trenches having a v-shaped bottom through an oxide layer and a portion of a substrate; forming AlN or GaAs in the v-shaped bottom; forming a n-GaN or n-InGaP pillar on the AlN or GaAs through and above the first oxide layer; forming an InGaN/GaN MQW or AlInGaP/InGaP MQW over the n-GaN or n-InGaP pillar; forming a p-GaN or p-InGaP layer over the n-GaN pillar and InGaN/GaN MQW or the n-InGaP pillar and AlInGaP/InGaP MQW down to the first oxide layer; forming a TCO layer over the first oxide layer and the p-GaN or p-InGaP layer; forming a second oxide layer over the TCO layer; and forming a metal pad on the TCO layer above each n-GaN or n-InGaP pillar.

An embodiment provides a semiconductor element, which comprises: a plurality of semiconductor structures, each of which comprises a first conductive semiconductor layer, a second conductive semiconductor layer, an active layer disposed between the first conductive semiconductor layer and the second conductive semiconductor layer, and a first recess extending through the second conductive semiconductor layer and the active layer to a partial area of the first conductive semiconductor layer; a second recess disposed between the plurality of semiconductor structures; a first electrode disposed at the first recess and electrically connected to the first conductive semiconductor layer; a reflective layer disposed under the second conductive semiconductor layer; and a protrusion part disposed on the second recess and protruding higher than the upper surfaces of the semiconductor structures, wherein a surface, on which the first electrode contacts the first conductive semiconductor layer in the first recess, is 300 to 500 nm distant from the upper surfaces of the semiconductor structures.

A vertical type light emitting element is disclosed. The vertical type light emitting element includes: a color conversion electrode part including a first electrode pad and a color conversion layer; a reflective electrode part including a second electrode pad and a reflective layer; and a light emitting semiconductor part interposed between the color conversion electrode part and the reflective electrode part. The color conversion electrode part further includes an electrically conductive light transmissive plate. The first electrode pad and the color conversion layer are interposed between the light transmissive plate and the upper surface of the light emitting semiconductor part. Roughnesses are formed on the upper surface of the light emitting semiconductor part bordering the color conversion electrode part to increase the amount of light entering the color conversion electrode part through the light emitting semiconductor part.