A semiconductor light emitting device including a first conductive electrode and a second conductive electrode; a first conductive semiconductor layer on which the first conductive electrode is disposed; a second conductive semiconductor layer overlapping the first conductive semiconductor layer, on which the second conductive electrode is disposed; and an active layer disposed between the first conductive semiconductor layer and the second conductive semiconductor layer. Further, the second conductive semiconductor layer includes a first layer including a porous material capable of being electro-polished and disposed on an outer surface of the semiconductor light emitting device; a second layer disposed under the first layer and having a lower impurity concentration than the first layer; and a third layer disposed between the second layer and the active layer and having a higher impurity concentration than the second layer.

A method of manufacturing a light emitting device can include forming an n-type GaN-based layer on a sapphire substrate; forming a GaN-based active layer on the n-type GaN-based layer; forming a p-type GaN-based layer on the GaN-based active layer; forming a p-type electrode on the p-type GaN-based layer; forming a metal substrate on the p-type electrode; removing the sapphire substrate; forming an n-type electrode on the n-type GaN-based layer; forming a passivation layer on a side surface of the p-type GaN-based layer, a side surface of the GaN-based active layer, a side surface of the n-type GaN-based layer, an upper surface of the n-type GaN-based layer, a side surface of the n-type electrode, and an upper surface of the n-type electrode after the forming the n-type electrode; and forming an open space to expose the n-type electrode by patterning the passivation layer.

A method of manufacturing a light emitting diode is provided. The method of manufacturing a light emitting diode includes the steps of forming a mask layer including a plurality of grooves on one side of a substrate, forming an insulating layer on the other side of the substrate, preparing a plurality of sub pixel areas on the substrate on which the mask layer has been formed, forming a nanostructure in at least one groove included in each of the plurality of sub pixel areas, forming a first electrode on the mask layer and the nanostructure corresponding to each of the plurality of sub pixel areas, etching an area of the insulating layer corresponding to each of the plurality of sub pixel areas and forming a first semiconductor layer and a second electrode, forming a metallic substance in a via hole which is provided between the plurality of sub pixel areas and connects the one side and the other side of the substrate, and forming a second semiconductor layer and a third electrode in an area corresponding to the via hole on the other side of the substrate.

An oriented alumina substrate for epitaxial growth according to an embodiment of the present invention includes crystalline grains constituting a surface thereof, the crystalline grains having a tilt angle of 1 or more and 3 or less and an average sintered grain size of 20 m or more.

An oriented alumina substrate for epitaxial growth according to an embodiment of the present invention includes crystalline grains constituting a surface thereof, the crystalline grains having a tilt angle of 0.1 or more and less than 1.0 and an average sintered grain size of 10 m or more.

A method of fabricating an ultraviolet (UV) light emitting device includes receiving a UV transmissive substrate, forming a first UV transmissive layer comprising aluminum nitride upon the UV transmissive substrate using a first deposition technique at a temperature less than about 800 degrees Celsius or greater than about 1200 degrees Celsius, forming a second UV transmissive layer comprising aluminum nitride upon the first UV transmissive layer comprising aluminum nitride using a second deposition technique that is different from the first deposition technique, at a temperature within a range of about 800 degrees Celsius to about 1200 degrees Celsius, forming an n-type layer comprising aluminum gallium nitride layer upon the second UV transmissive layer, forming one or more quantum well structures comprising aluminum gallium nitride upon the n-type layer, and forming a p-type nitride layer upon the one or more quantum well structures.

There are provided a method for producing a semiconductor structure exhibiting excellent crystallinity by preventing the occurrence of a strain, and a method for producing a semiconductor device. The semiconductor structure production method includes a decomposition layer formation step, a bridging portion formation step, a decomposition step, and a semiconductor layer formation step. In the decomposition layer formation step, a plurality of threading dislocations are extended during growth of a decomposition layer. In the bridging portion formation step, the threading dislocations are exposed to the surface of the bridging portion. In the decomposition step, the threading dislocations exposed to the surface of the bridging portion are widened to thereby provide a plurality of through holes penetrating the bridging portion, and the decomposition layer exposed in the interior of the through holes is decomposed.

A semiconductor device including a substrate, a semiconductor layer, and a buffer structure is provided. The semiconductor layer is located on the substrate. The buffer structure is located between the substrate and the semiconductor layer. The buffer structure includes a plurality of first layers and a plurality of second layers. The first layers and the second layers are alternately stacked with a same pitch or different pitches.

To provide a method for producing a Group III nitride semiconductor light-emitting device, which allows the formation of a high-temperature AlN buffer layer on an uneven substrate. This production method comprises forming an Al layer or Al droplets on the uneven shape of the uneven substrate, forming an AlN buffer layer while nitriding the Al layer; and forming a Group III nitride semiconductor layer on the AlN buffer layer. In the forming an Al layer, the internal pressure of a furnace is 1 kPa to 19 kPa, the temperature of the uneven substrate is 900 C. to 1,500 C., and an organic metal gas containing Al is supplied at a flow rate of 1.510.sup.4 mol/min or more.

Integrated active-matrix light emitting pixel arrays based displays and methods of fabricating the integrated displays are provided. An example method includes: forming multiple layers on a first substrate to form a light emitting structure, integrating the light emitting structure on the first substrate with a backplane device on a second substrate by connecting a first top layer of the light emitting structure with a second top layer of the backplane device, e.g., by using low temperature bonding, the backplane device including at least one backplane having pixel circuits, and after the integration, patterning the light emitting structure to form an array of light emitting elements each conductively coupled to respective pixel circuits to thereby form an array of active-matrix light emitting pixels. A pattern of different color phosphor or different size quantum dots materials can be deposited on the light emitting pixels to form an array of multi-color display pixels.