Provided is a manufacturing method of a sensor including the following steps. A mold having a cavity is provided. At least one chip is disposed in the cavity. The chip has an active surface and a back surface opposite to each other. The active surface faces toward a bottom surface of the cavity. A polymer material is filled in the cavity to cover the back surface of the chip. A heat treatment is performed, such that the polymer material is solidified to form a polymer substrate. A mold release treatment is performed to isolate the polymer substrate from the cavity. A plurality of conductive lines are formed on a first surface of the polymer substrate. The conductive lines are electrically connected with the chip.

The ringing of a switching waveform of a semiconductor device is restrained. For example, an interconnect (L5) is laid which functions as a source of a power transistor (Q3) and a cathode of a diode (D4), and further functioning as a drain of a power transistor (Q4) and an anode of a diode (D3). In other words, a power transistor and a diode coupled to this power transistor in series are formed in the same semiconductor chip; and further an interconnect functioning as a drain of the power transistor and an interconnect functioning as an anode of the diode are made common to each other. This structure makes it possible to decrease a parasite inductance between the power transistor and the diode coupled to each other in series.

The ringing of a switching waveform of a semiconductor device is restrained. For example, an interconnect (L5) is laid which functions as a source of a power transistor (Q3) and a cathode of a diode (D4), and further functioning as a drain of a power transistor (Q4) and an anode of a diode (D3). In other words, a power transistor and a diode coupled to this power transistor in series are formed in the same semiconductor chip; and further an interconnect functioning as a drain of the power transistor and an interconnect functioning as an anode of the diode are made common to each other. This structure makes it possible to decrease a parasite inductance between the power transistor and the diode coupled to each other in series.

A semiconductor device according to an embodiment includes a semiconductor layer having a first plane and a second plane, an insulating layer provided in the first plane side of the semiconductor layer, a metal layer provided on or above the insulating layer, and a through electrode penetrating through the semiconductor layer and in contact with the metal layer. When a width of the through electrode in the first plane is a first width, a width of the through electrode in an intermediate plane between the first plane and the second plane is a second width, and a width of the metal layer is a third width, a first difference between the second width and the first width is larger than a second difference between the third width and the first width.

A semiconductor device according to an embodiment includes a semiconductor layer having a first plane and a second plane, an insulating layer provided in the first plane side of the semiconductor layer, a metal layer provided on or above the insulating layer, and a through electrode penetrating through the semiconductor layer and in contact with the metal layer. When a width of the through electrode in the first plane is a first width, a width of the through electrode in an intermediate plane between the first plane and the second plane is a second width, and a width of the metal layer is a third width, a first difference between the second width and the first width is larger than a second difference between the third width and the first width.

A die is mounted in an integrated circuit package. The die includes a balun circuit and an electrostatic discharge (ESD) circuit coupled to a ground of the integrated circuit die. The package has a first output pin coupled to a first terminal of the balun and has a second output pin coupled to a second terminal of the balun through first and second bond wires. The second output pin is connected to board ground. A third bond wire is disposed between the second package terminal and the ESD circuit to provide a safe discharge path through the third bond wire for ESD events affecting the first and second output terminals. Thus, a charge that builds up involving one of the output terminals coupled to the balun can be safely dissipated.

A chip package structure is provided. The chip package structure includes a first redistribution structure including a dielectric structure and wiring layers in the dielectric structure. The chip package structure includes a first chip over the first surface. The chip package structure includes a first conductive pillar over the first surface and electrically connected to the wiring layers. The chip package structure includes a second chip over the second surface. The second chip includes a second substrate and a second conductive pad over the second substrate, and the second conductive pad is between the second substrate and the first redistribution structure. The chip package structure includes a second conductive pillar over the second surface and electrically connected to the wiring layers.

A chip package structure is provided. The chip package structure includes a first redistribution structure including a dielectric structure and wiring layers in the dielectric structure. The chip package structure includes a first chip over the first surface. The chip package structure includes a first conductive pillar over the first surface and electrically connected to the wiring layers. The chip package structure includes a second chip over the second surface. The second chip includes a second substrate and a second conductive pad over the second substrate, and the second conductive pad is between the second substrate and the first redistribution structure. The chip package structure includes a second conductive pillar over the second surface and electrically connected to the wiring layers.

An embodiment method includes forming a first plurality of bond pads on a device substrate, depositing a spacer layer over and extending along sidewalls of the first plurality of bond pads, and etching the spacer layer to remove lateral portions of the spacer layer and form spacers on sidewalls of the first plurality of bond pads. The method further includes bonding a cap substrate including a second plurality of bond pads to the device substrate by bonding the first plurality of bond pads to the second plurality of bond pads.

An embodiment method includes forming a first plurality of bond pads on a device substrate, depositing a spacer layer over and extending along sidewalls of the first plurality of bond pads, and etching the spacer layer to remove lateral portions of the spacer layer and form spacers on sidewalls of the first plurality of bond pads. The method further includes bonding a cap substrate including a second plurality of bond pads to the device substrate by bonding the first plurality of bond pads to the second plurality of bond pads.