Stealth-dicing-compatible devices and methods to prevent acoustic backside reflections on acoustic wave devices are disclosed. An acoustic wave device comprises a substrate having opposing top and bottom surfaces, where a first portion of the bottom surface has a higher roughness than a second portion of the bottom surface, and an acoustic resonator over the top surface of the substrate. The acoustic resonator comprises a piezoelectric layer having opposing top and bottom surfaces and a plurality of electrodes, at least some of which are disposed on the top surface of the piezoelectric layer. The first portion of the bottom surface of the substrate is below and opposite from the acoustic resonator, and the second portion of the bottom surface of the substrate is not located below and opposite from the acoustic resonator. Multiple first portions, each separated from the other by second portions, may exist.

A bulk acoustic wave (BAW) resonator includes a substrate having a top side surface and a bottom side surface. A Bragg mirror is on the top side surface of the substrate. A bottom electrode layer is on the Bragg mirror, and a piezoelectric layer is on the bottom electrode layer. A top dielectric layer is on the piezoelectric layer, and a top electrode layer is on the top dielectric layer. The bottom side surface of the substrate has a surface roughness of at least 1 ?m root mean square (RMS).

A back side of a diamond or other substrate is thinned using plasma etches and a mask situated away from the back side by a spacer having a thickness between 50 m and 250 m. Typically, a combined RIE/ICP etch is used to thin the substrate from 20-40 m to less than 1 m. For applications in which color centers are implanted or otherwise situated on a front side of the diamond substrate, after thinning, a soft graded etch is applied to reduce color center linewidth, particularly for nitrogen vacancy (NV) color centers.

A piezoelectric device includes a first piezoelectric substrate, a second piezoelectric substrate and an adhesive layer. First conductor patterns are provided on a front surface of the first piezoelectric substrate. A first piezoelectric element is defined by the first conductor patterns. Second conductor patterns are provided on a front surface of the second piezoelectric substrate. A second piezoelectric element is provided of these patterns. The adhesive layer adheres a rear surface of the first piezoelectric substrate and a rear surface of the second piezoelectric substrate to each other. The adhesive layer adheres the first and second substrates to each other such that a compressive stress is applied to the first and second piezoelectric substrates in a bonded state.

A crystal oscillator includes a piezoelectric substrate having a thinned portion with opposite upper and lower surfaces respectively defining upper and lower surface work portions, and at least one side portion having at least one recessed portion with a bottom surface flush with the upper surface of the thinned portion. A top electrode layer has a top work portion disposed on the upper surface work portion, and a top extension extending from the top work portion onto the bottom surface of the recessed portion. A bottom electrode layer has a bottom work portion disposed on the lower surface work portion, and a bottom extension extending from the bottom work portion toward the one end of the thinned portion and then bending upward and inward onto the bottom surface of the recessed portion. A method of making the crystal oscillator is also disclosed.

Stealth-dicing-compatible devices and methods to prevent acoustic backside reflections on acoustic wave devices are disclosed. An acoustic wave device comprises a substrate having opposing top and bottom surfaces, where a first portion of the bottom surface has a higher roughness than a second portion of the bottom surface, and an acoustic resonator over the top surface of the substrate. The acoustic resonator comprises a piezoelectric layer having opposing top and bottom surfaces and a plurality of electrodes, at least some of which are disposed on the top surface of the piezoelectric layer. The first portion of the bottom surface of the substrate is below and opposite from the acoustic resonator, and the second portion of the bottom surface of the substrate is not located below and opposite from the acoustic resonator. Multiple first portions, each separated from the other by second portions, may exist.

A bulk acoustic wave (BAW) resonator includes a substrate having a top side surface and a bottom side surface. A Bragg mirror is on the top side surface of the substrate. A bottom electrode layer is on the Bragg mirror, and a piezoelectric layer is on the bottom electrode layer. A top dielectric layer is on the piezoelectric layer, and a top electrode layer is on the top dielectric layer. The bottom side surface of the substrate has a surface roughness of at least 1 m root mean square (RMS).

A structure includes a substrate including a wafer or a portion thereof; and a piezoelectric bulk material layer comprising a first portion deposited onto the substrate and a second portion deposited onto the first portion, the second portion comprising an outer surface having a surface roughness (Ra) of 4.5 nm or less. Methods for depositing a piezoelectric bulk material layer include depositing a first portion of bulk layer material at a first incidence angle to achieve a predetermined c-axis tilt, and depositing a second portion of the bulk material layer onto the first portion at a second incidence angle that is smaller than the first incidence angle. The second portion has a second c-axis tilt that substantially aligns with the first c-axis tilt.