A method for producing an adjustable bulk acoustic wave resonator comprising a transducer stack (E1) and a tuning stack (E2). According to the invention, transducer stack (E1) includes two defined electrodes (4, 6) and piezoelectric material (2), and stack (E2) includes a layer of piezoelectric material (8) and two defined electrodes (10, 12). The method includes: a) production of the transducer stack; b) formation of an electrically insulating layer on an electrode (6) of the transducer stack; c) formation of a defined electrode (10) of the tuning stack on the electrically insulting layer such that it is aligned with the electrodes of the transducer stack; d) assembly, on the electrode (10), of a substrate of piezoelectric material; e) fracturing of the substrate of piezoelectric material; and f) formation of the other defined electrode (12) of the tuning stack, aligned with the defined electrode (10).

A solidly mounted resonator having an electromagnetic shielding structure and a method for manufacturing the same. The solidly mounted resonator includes: a substrate; an acoustic-wave reflecting layer formed on the substrate; a resonance function layer formed on the acoustic-wave reflecting layer; and a metal shielding wall formed on the substrate, wherein the metal shielding wall surrounds an effective region in the acoustic-wave reflecting layer and the resonance function layer. The electromagnetic shielding structure is formed simultaneously with the resonator, and it is not necessary to provide an additional electromagnetic shielding device. An influence of an external or internal electromagnetic interference source on the resonator is avoided while ensuring a small dimension and a high performance of the resonator.

A crystal oscillator includes a piezoelectric substrate, a first electrode, a second electrode, and a support frame. The first electrode includes a first electrode portion disposed on a first surface of the piezoelectric substrate. The second electrode is disposed on a second surface of the piezoelectric substrate opposite to the first surface of the piezoelectric substrate. The support frame is made of a photoresist material, and is disposed on the second surface. The support frame surrounds the second electrode portion. At least a portion of the second extending electrode portion is located outside the support frame. A method for making the crystal oscillator is also provided herein.

A crystal oscillator includes an oscillating substrate, a hollow frame, a first electrode, and a second electrode. The oscillating substrate includes a main oscillating region and a thinned region that has a thickness smaller than that of the main oscillating region. The first and second electrodes are disposed on a first surface of the oscillating substrate and a second surface opposite to the first surface, respectively. The hollow frame is disposed on the second surface. The second electrode includes a second electrode portion that has at least one opening in positional correspondence with the thinned region. A method for making the crystal oscillator is also provided herein.

Embodiments of this disclosure relate to bulk acoustic wave resonators on a substrate. The bulk acoustic wave resonators include a first bulk acoustic wave resonator, a second bulk acoustic wave resonator, a conductor electrically connecting the first bulk acoustic wave resonator to the second bulk acoustic wave resonator, and an air gap positioned between the conductor and a surface of the substrate.

A vibrator device has a base, a semiconductor element having an oscillation circuit, and a vibrator having an excitation electrode sequentially stacked and includes a first wire electrically coupling between the excitation electrode and the semiconductor element, a second wire electrically coupling between a second external terminal as an external output terminal placed on the base and the semiconductor element, and a shield wire placed between at least a part of the first wire and at least a part of the second wire.

A thin film bulk acoustic resonator and a method for manufacturing the same. The thin film bulk acoustic resonator comprises a bottom electrode layer, a piezoelectric layer, and a top electrode layer, which are disposed on a substrate in which an acoustic reflection structure is located, where a portion which is of the piezoelectric layer and corresponds to a boundary of the acoustic reflection structure is depolarized to form a depolarized portion. The method comprises providing a bottom electrode layer on a substrate to cover an acoustic reflection structure which is formed or to be formed on the substrate; providing a piezoelectric layer on the bottom electrode layer; depolarizing a portion, which is of the piezoelectric layer and corresponds to a boundary of the acoustic reflection structure, to form a depolarized portion; and providing a top electrode layer on the piezoelectric layer.

Aspects of this disclosure relate to methods of manufacturing bulk acoustic wave components. Such methods include plasma dicing to singulate individual bulk acoustic wave components. A buffer layer can be formed over a substrate of bulk acoustic wave components such that streets are exposed. The bulk acoustic wave components can be plasma diced along the exposed streets to thereby singulate the bulk acoustic wave components

A bulk acoustic wave (BAW) resonator comprises: a first electrode; a second electrode comprising a plurality of sides, wherein at least one of the sides is a connection side; a piezoelectric layer disposed between the first and second electrodes, and an acoustic reflective element disposed beneath the first electrode, the second electrode and the piezoelectric layer, wherein an overlap of the reflective element, the first electrode, the second electrode, and the piezoelectric layer defines an active area of the acoustic resonator; a bridge adjacent to a termination of the active area of the BAW resonator; and a discontinuity disposed in the bridge.

An acoustic resonator structure is provided. The acoustic resonator structure includes an acoustic resonator configured to resonate in a first frequency to pass a radio frequency (RF) signal. However, the acoustic resonator may create an electrical capacitance outside the first frequency, which can cause the acoustic resonator to resonate at a second frequency in parallel to the first frequency, thus compromising performance of the acoustic resonator. In this regard, a passive acoustic circuit is provided in parallel to the acoustic resonator in the acoustic resonator structure. The passive acoustic circuit can be configured to resonate in the second frequency to cancel the electrical capacitance created by the acoustic resonator. As such, it may be possible to improve performance of the acoustic resonator without significantly increasing complexity and footprint of the acoustic resonator structure.