An apparatus includes a substrate, a thin film piezoelectric layer, a transducer, and a low resistivity layer. The thin film piezoelectric layer is over the substrate, the transducer includes a number of electrodes in contact with the thin film piezoelectric layer and configured to transduce an acoustic wave in the thin film piezoelectric layer. The low resistivity layer is between at least a portion of the substrate and the thin film piezoelectric layer. By providing the low resistivity layer between at least a portion of the substrate and the thin film piezoelectric layer, a spurious response of the apparatus may be significantly reduced, thereby improving the performance thereof.

A resonator that includes a rectangular vibrating portion having first and second pairs of sides that provides contour vibration. A frame surrounds a periphery of the vibrating portion and a first holding unit between the frame and one of the first sides and includes a first arm substantially in parallel to the vibrating portion, multiple second arms connecting the first arm with the vibrating portion, and a third arm connecting the first arm with the frame. A first connection line is on the first arm; a first terminal is on the frame; three or more electrodes are on the vibrating portion; and multiple first extended lines are on the second arms and connect first and second electrodes with the first connection line. The first extended lines are connected to the first connection line, which is electrically connected to the first terminal.

A surface elastic wave resonator comprises a piezoelectric material to propagate the surface elastic waves and a transducer inserted between a pair of reflectors comprising combs of interdigitated electrodes and having a number Nc of electrodes connected to a hot spot and an acoustic aperture W wherein the relative permittivity of the piezoelectric material is greater than about 15, a product of Nc.Math.W/fa for the transducer being greater than 100 m.Math.MHz.sup.1, where fa is the antiresonance frequency of the resonator. A circuit comprises a load impedance and a resonator according to the invention and having an electrical response manifesting as a peak in the coefficient of reflection S.sub.11 at a frequency of a minimum value of the parameter S.sub.11 that is lower than 10 dB, the antiresonance peak of the resonator being matched to the impedance of the load.

A resonator device may include a stacked first resonator and second resonator. The first resonator may be configured to resonate at a first operating frequency, and the second resonator may be configured to resonate at a second operating frequency different from the first operating frequency. The first resonator may include a first electrode and a first active layer arranged over the first electrode. The second resonator may include a second active layer arranged over the first active layer, and a second electrode arranged over the second active layer. The stacked first resonator and second resonator may be coupled to a reconfiguration switch for selectively operating at the first operating frequency or the second operating frequency. One of the first resonator and the second resonator is active upon selection by the reconfiguration switch, while the other resonator is inactive.

A method for generating high order harmonic frequencies includes: providing a piezoelectric resonant film; and inputting a driving signal with a single tone frequency for driving the piezoelectric resonant film to oscillate in a non-linear region so as to generate a plurality of high order harmonic frequencies. Therefore, the quantity of the high order harmonic frequencies can be adjusted by applying an electrical controlling method.

A surface acoustic wave device includes a piezoelectric material layer, a pair of busbars, a plurality of electrode fingers, and reflectors. The piezoelectric material layer has a thickness that is in a range of 1 to 2.5 times of an acoustic wavelength. A main mode of an elastic wave excited on the piezoelectric material layer by the electrode fingers is a leaky surface acoustic wave. A design variable is set such that a minimum propagation loss frequency where a propagation loss becomes minimum and a frequency of a plate wave spurious formed due to a slow shear wave excited together with the leaky surface acoustic wave are matched. A propagation velocity of a slowest bulk wave of an elastic wave that propagates in a lower layer of the piezoelectric material layer is equal to or more than 1.05 times of a velocity of the leaky surface acoustic wave.

A MEMS device including an active layer having a first surface and a second surface is provided. A first electrode and a second electrode, and at least one reconfigurable electrode segment are arranged over the first surface of the active layer. At least one reconfiguration layer is arranged over the second surface of the active layer. The at least one reconfigurable electrode segment and the at least one reconfiguration layer overlaps. One or more via contacts are disposed through the active layer configured to couple the at least one reconfigurable electrode segment and the at least one reconfiguration layer. The at least one reconfiguration layer is coupled to a reconfiguration switch for reconfiguring electrical connections to the at least one reconfigurable electrode segment. The MEMS device is configured to generate different resonant frequencies by reconfiguring the electrical connections to the at least one reconfigurable electrode segment using the reconfiguration switch.

There is provided a SAW filter manufacturing method for manufacturing a SAW filter from a piezoelectric substrate having planned dividing lines set on a top surface of the piezoelectric substrate, and having a device including comb-shaped electrodes in regions demarcated by the planned dividing lines. The method includes a structure forming step of forming a structure having projections and depressions on an undersurface side of the piezoelectric substrate by irradiating the piezoelectric substrate with a laser beam of a wavelength absorbable by the piezoelectric substrate from the undersurface side of the piezoelectric substrate, and a dividing step of dividing the piezoelectric substrate along the planned dividing lines after the structure forming step.

An acoustic wave filter includes: a series-arm resonator disposed on a path that connects input/output terminals; and a parallel-arm circuit connected to a node on the path and a ground. The parallel-arm circuit includes a parallel-arm resonator and a capacitor connected in parallel to each other. The capacitor includes a comb-shaped electrode that includes electrode fingers. A frequency at which impedance of the capacitor has a local maximum value is located outside a passband of the acoustic wave filter. The comb-shaped electrode has at least two different electrode finger pitches or at least two different electrode finger duty ratios.

A first filter of a multiplexer has a ladder filter structure including a plurality of series resonators and a plurality of parallel resonators. Each resonator is an acoustic wave resonator that includes an IDT electrode including a pair of comb-shaped electrodes. A portion having a unit area, in a plan view of a substrate on which the resonators are provided, has a larger weight in at least one of the IDT electrode of the series resonator that is closest to the common terminal, among the series resonator, and the IDT electrode of the parallel resonator that is closest to the common terminal than in the IDT electrode of each of the remainder of the plurality of acoustic wave resonators.