Fabrication of radio-frequency (RF) devices involves providing a field-effect transistor (FET) formed over an oxide layer formed on a semiconductor substrate, removing at least part of the semiconductor substrate to expose at least a portion of a backside of the oxide layer, applying an interface material to at least a portion of the backside of the oxide layer, removing at least a portion of the interface material to form a trench, and covering at least a portion of the interface material and the trench with a substrate layer to form a cavity.

Fabrication of radio-frequency (RF) devices involves providing a field-effect transistor (FET), forming one or more electrical connections to the FET, forming one or more dielectric layers over at least a portion of the electrical connections, and disposing an electrical element at least partially above the one or more dielectric layers, the electrical element being in electrical communication with the FET via the one or more electrical connections. RF device fabrication further involves applying an interface material over at least a portion of the one or more dielectric layers, removing at least a portion of the interface material to form a trench above at least a portion of the electrical element, and covering at least a portion of the interface material and the trench with a substrate layer to form a cavity, the electrical element being disposed at least partially within the cavity.

A longitudinally coupled resonator-type surface acoustic wave filter includes a low acoustic velocity film and a piezoelectric film stacked over a high acoustic velocity component in which a bulk wave propagates at an acoustic velocity higher than an acoustic velocity of an elastic wave that propagates in the piezoelectric film. IDT electrodes are provided on one surface of the piezoelectric film. The longitudinally coupled resonator-type surface acoustic wave filter uses a SH wave. At least one of the IDT electrodes has a duty factor that is adjusted over an entire length of the one of the IDT electrodes in the direction of elastic wave propagation to suppress a Rayleigh wave spurious response.

A guided acoustic wave device includes a substrate, a lithium tantalate layer on the substrate, and a transducer on the lithium tantalate film. The lithium tantalate has a crystalline orientation defined by (YXl), where is between 10 and 37. The inventors discovered that limiting the crystalline orientation of the lithium tantalate in this manner provides significant increases in the electromechanical coupling coefficient of the acoustic wave device, thereby increasing bandwidth and improving performance.

A method for fabricating a surface acoustic wave (SAW) device includes the steps of forming a buffer layer on a substrate, forming a high velocity layer on the buffer layer, forming a medium velocity layer on the high velocity layer, forming a low velocity layer on the medium velocity layer, forming a piezoelectric layer on the low velocity layer, and forming an electrode on the piezoelectric layer. Preferably, the buffer layer includes silicon oxide, the high velocity layer includes graphene, the medium velocity layer includes silicon oxynitride, and the low velocity layer includes titanium oxide.

An integrated device based on a third-generation semiconductor and a manufacturing method thereof are provided. The integrated device at least includes a SiC substrate, a buffer layer, a GaN film layer and a piezoelectric material layer; the SiC substrate includes a first buffer layer stacked on a first SiC substrate and a second buffer layer stacked on a second SiC substrate; the GaN film layer at least includes a first GaN film layer stacked on the first buffer layer and a second GaN film layer stacked on the second buffer layer; the first SiC substrate, the first buffer layer, the first GaN film layer and the piezoelectric material layer which are stacked are used for forming a piezoelectric multi-layer film; the piezoelectric multi-layer film is used for forming a surface acoustic wave (SAW) filter.

An acoustic wave device has a substrate, an optional functional layer disposed over at least a portion of the substrate, a piezoelectric layer disposed over at least a portion of the functional layer and/or substrate, and an interdigital transducer electrode disposed on the piezoelectric layer. The piezoelectric layer has an outer edge spaced inward of an outer edge of the substrate, the outer edge of the piezoelectric layer being tapered at an angle relative to a surface of the substrate to thereby reduce an acoustic reflection magnitude at said outer edge of the piezoelectric layer.

An integrated device based on a third-generation semiconductor and a manufacturing method thereof are provided. The integrated device at least includes a SiC substrate, a buffer layer, a GaN film layer and a piezoelectric material layer; the SiC substrate includes a first buffer layer stacked on a first SiC substrate and a second buffer layer stacked on a second SiC substrate; the GaN film layer at least includes a first GaN film layer stacked on the first buffer layer and a second GaN film layer stacked on the second buffer layer; the first SiC substrate, the first buffer layer, the first GaN film layer and the piezoelectric material layer which are stacked are used for forming a piezoelectric multi-layer film; the piezoelectric multi-layer film is used for forming a surface acoustic wave (SAW) filter.

Disclosed are a resonant device and an acoustic filter. The resonant device includes a wafer substrate, a piezoelectric layer and an interdigital electrode layer. The piezoelectric layer is located on a side of the wafer substrate and includes a piezoelectric monocrystal material, and the piezoelectric monocrystal material includes a first crystal axis, a second crystal axis and a third crystal axis perpendicular to each other. A direction of an electric field generated by the interdigital electrode layer in the piezoelectric layer is a device direction.

An IDT electrode includes first and second busbar electrodes opposed to each other, first and second electrode fingers extending respectively from the first and second busbar electrodes on a piezoelectric substrate. The first busbar electrode and a tip end of the second electrode finger are opposed to each other with a gap therebetween, and bottom surfaces of the first and second busbar electrodes are opposed to each other with a first gap therebetween. The first and second busbar electrodes respectively include portions opposed to each other with a second gap shorter than the first gap therebetween on the top surface side. In a first area located between a first side surface and a second side surface, a second area located between the piezoelectric substrate and the first busbar electrode or the second electrode finger includes a hollow portion.