A layered body includes a ceramic substrate formed of a polycrystalline ceramic and having a supporting main surface and a piezoelectric substrate formed of a piezoelectric material and having a bonding main surface that bonds to the supporting main surface through Van der Waals force. The ceramic substrate includes a supporting main surface amorphous layer formed so as to include the supporting main surface. The piezoelectric substrate includes a bonding main surface amorphous layer formed so as to include the bonding main surface. The supporting main surface amorphous layer has a smaller thickness than the bonding main surface amorphous layer.

A multiplexer includes a filter located between a common terminal and an individual terminal, and a filter that is located between the common terminal and an individual terminal and that has a pass band whose frequency is lower than the pass band of the filter. The filter includes serial arm resonators provided on the first path connecting the common terminal to the individual terminal. Each of the serial arm resonators includes a piezoelectric substrate and an IDT electrode which use leaky waves as principal acoustic waves. The occurrence frequency of the Rayleigh wave response of the serial arm resonator is different from that of the serial arm resonator.

An acoustic wave device includes a substrate, an interdigital transducer electrode including electrode fingers on a main surface of the substrate, and a protection film covering the main surface of the substrate, and side surfaces and upper surfaces of the electrode fingers. The protection film includes a portion covering the main surface of the substrate, an intermediate portion between two of the electrode fingers adjacent to each other, and a vicinity portion of the electrode fingers. The intermediate portion is thicker than the vicinity portion.

An acoustic wave device includes: a piezoelectric substrate; and a pair of comb-shaped electrodes that is located on the piezoelectric substrate, includes a metal film, and excites a surface acoustic wave, the metal film being mainly composed of a metal having a melting point equal to or higher than a melting point of Pt, the metal film having a first region in which a crystal grain has a columnar shape and a second region that is located on and/or under the first region in a stacking direction and has less crystallinity than the first region or has an amorphous structure.

Aspects of this disclosure relate to an acoustic wave resonator with hyperbolic mode suppression. The acoustic wave resonator can include a piezoelectric layer, an interdigital transducer electrode, a temperature compensation layer, and a mass loading strip. The mass loading strip can be a conductive strip. The mass loading strip can overlap edge portions of fingers of the interdigital transducer electrode. A layer of the mass loading strip can have a density that is at least as high as a density of a material of the interdigital transducer electrode. The material of the interdigital transducer can impact acoustic properties of the acoustic wave resonator.

A bonding layer 3 is formed over a piezoelectric material substrate, and the bonding layer 3 is made of or more material selected from the group consisting of silicon nitride, aluminum nitride, alumina, tantalum pentoxide, mullite, niobium pentoxide and titanium oxide. Neutralized beam A is irradiated onto a surface 4 of the bonding layer and a surface of a supporting body to activate the surface of the bonding layer and the surface of the supporting body. The surface of the bonding layer and the surface of the supporting body are bonded by direct bonding.

An elastic wave device includes a lamination layer film including a piezoelectric thin film on a support substrate. The lamination layer film is not partially present in a region located in an outer side portion of a region where IDT electrodes are provided. A first insulation layer extends from at least a portion of a region where the lamination layer film is not present to an upper portion of the piezoelectric thin film. A wiring electrode has a width of about 6 m and extends from the upper portion of the piezoelectric thin film to an upper portion of the first insulation layer, and extends onto a section of the first insulation layer in the region.

An acoustic wave element includes an electrode-finger pitch of reflecting-electrode fingers greater than an electrode-finger pitch pi of comb-shaped electrode fingers, and a center-to-center distance between a reflecting-electrode finger and a comb-shaped electrode finger is equal to or less than about 0.9 times the electrode-finger pitch of the reflecting-electrode fingers. When a reflecting-electrode finger counted from a closest reflecting-electrode finger is designated as a k-th reflecting-electrode finger in order, a reflecting-electrode finger farthest from the IDT electrode is defined as an (n+1)-th reflecting-electrode finger, and an electrode-finger pitch between the k-th reflecting-electrode finger and a (k+1)-th reflecting-electrode finger is defined as a k-th electrode-finger pitch p.sub.k, a value of electrode-finger pitches from a first electrode-finger pitch p.sub.1 to the k-th electrode-finger pitch p.sub.k is less than a value of electrode-finger pitches from a (k+1)-th electrode-finger pitch p.sub.k+1 to an n-th electrode-finger pitch p.sub.n.

Aspects of this disclosure relate to a method for making an acoustic wave resonator with hyperbolic mode suppression. The acoustic wave resonator can include a piezoelectric layer, an interdigital transducer electrode, a temperature compensation layer, and a mass loading strip. The mass loading strip can be a conductive strip. The mass loading strip can overlap edge portions of fingers of the interdigital transducer electrode. A layer of the mass loading strip can have a density that is at least as high as a density of a material of the interdigital transducer electrode. The material of the interdigital transducer can impact acoustic properties of the acoustic wave resonator.

An elastic wave device includes a lamination layer film including a piezoelectric thin film on a support substrate. The lamination layer film is not partially present in a region located in an outer side portion of a region where IDT electrodes are provided. A first insulation layer extends from at least a portion of a region where the lamination layer film is not present to an upper portion of the piezoelectric thin film. A wiring electrode extends from the upper portion of the piezoelectric thin film to an upper portion of the first insulation layer, and extends onto a section of the first insulation layer in the region.