A method for fabricating a surface acoustic wave (SAW) device includes the steps of forming a first dielectric layer on a substrate, forming a piezoelectric layer on the first dielectric layer, forming a second dielectric layer on the piezoelectric layer, performing a photo-etching process to remove the second dielectric layer for forming a recess in the second dielectric layer, forming a metal layer in the recess, and then performing a planarizing process to remove the metal layer for forming an electrode in the recess.

A surface acoustic wave (SAW) filter includes a bottom substrate, a piezoelectric layer disposed above the bottom substrate, the piezoelectric layer having a bottom surface facing the bottom substrate and a top surface opposite to the bottom surface, a cavity disposed below the piezoelectric layer, an interdigital transducer (IDT) disposed on the top surface of the piezoelectric layer, and a back electrode disposed on the bottom surface of the piezoelectric layer. At least a portion of the back electrode is exposed in the cavity.

A fabrication method of a surface acoustic wave (SAW) filter, includes: obtaining a piezoelectric substrate; forming a back electrode on a first portion of the piezoelectric substrate; forming a sacrificial layer on the first portion of the piezoelectric substrate, covering the back electrode; forming a first dielectric layer on the first portion of the piezoelectric substrate, covering the sacrificial layer; bonding a bottom substrate to the first dielectric layer; removing a second portion of the piezoelectric substrate to expose the first portion of the piezoelectric substrate, the first portion of the piezoelectric substrate constituting a piezoelectric layer; forming one or more release holes through the piezoelectric layer; forming an interdigital transducer (IDT) on the piezoelectric layer; and etching and releasing the sacrificial layer via the one or more release holes to form a lower cavity exposing the back electrode.

An acoustic wave device includes an acoustic wave element substrate, filter electrodes on a first surface of the acoustic wave element substrate, a first insulator layer covering a second surface of the acoustic wave element substrate, and a second insulator layer laminated on the first insulator layer and sandwiching the first insulator layer between the second insulator layer and the acoustic wave element substrate. The products of propagation speeds of an acoustic wave in those layers and densities of those layers satisfy a predetermined relationship.

An acoustic wave device includes an element substrate having piezoelectricity, a functional electrode on a first main surface of the element substrate, an extended wiring line electrically connected to the functional electrode and extending from the first main surface to a side surface of the element substrate, an external terminal electrically connected to the extended wiring line and on a second main surface of the element substrate, a first resin portion to seal the acoustic wave device, and a second resin portion at least between the extended wiring line on the side surface and the first resin portion. The second resin portion has a lower Young's modulus than the first resin portion.

The present disclosure provides a package structure of an air gap type semiconductor device and its fabrication method. The fabrication method includes forming a bonding layer having a first opening on a carrier; disposing a semiconductor chip on the bonding layer, thereby forming a first cavity at the first opening, where the first cavity is at least aligned with a portion of an active region of the semiconductor chip; performing an encapsulation process to encapsulate the semiconductor chip on the carrier; lastly, forming through holes passing through the carrier where each through hole is aligned with a corresponding input/output electrode region of the semiconductor chip, and forming interconnection structures on a side of the carrier different from a side with the bonding layer, where each interconnection structure passes through a corresponding through hole and is electrically connected to an corresponding input/output electrode.

The multiplexer includes a plurality of IDT electrodes on a substrate, an insulating cover located on the substrate so as to configure one or more spaces above the plurality of IDT electrodes, an antenna terminal, transmission terminal, and reception terminal which are all located on the substrate and pass through the cover, and a reinforcing layer which is located on the cover and is made of metal. By the plurality of IDT electrodes, a transmission filter located in a signal path connecting the antenna terminal and the transmission terminal and a receiving filter located in a signal path connecting the antenna terminal and the reception terminal. The reinforcing layer includes a first area part facing the transmission filter and a second area part which faces the receiving filter and is separated from the first area part.

An acoustic wave device includes a silicon support substrate that includes first and second main surfaces opposing each other, a piezoelectric structure provided on the first main surface and including the piezoelectric layer, an IDT electrode provided on the piezoelectric layer, a support layer provided on the first main surface of the silicon support substrate and surrounding the piezoelectric layer, a cover layer provided on the support layer, a through-via electrode that extending through the silicon support substrate and the piezoelectric structure, and a first wiring electrode connected to the through-via electrode and electrically connected to the IDT electrode. The piezoelectric structure includes at least one layer having an insulating property, the at least one layer including the piezoelectric layer. The first wiring electrode is provided on the layer having an insulating property in the piezoelectric structure.

An elastic wave device includes a substrate, an IDT electrode, a spacer layer, a cover, and a protective layer. The spacer layer is provided on the substrate and surrounds the IDT electrode. The cover is provided on the spacer layer, is spaced apart from the IDT electrode, and includes a first main surface adjacent to the spacer layer and a second main surface facing the first main surface. The protective layer includes a third main surface contacting the second main surface, a fourth main surface facing the third main surface, and a side surface connected to the fourth main surface. In at least portion of the side surface of the protective layer, a portion including an intersection line between the side surface and the fourth main surface is located farther inward than an outer edge of the substrate in plan view in the thickness direction of the substrate.

An acoustic wave filter includes a first signal terminal, an antenna terminal, a ladder-type filter connected between the first signal terminal and the antenna terminal and including one or more serial resonators and one or more parallel resonators connected in a ladder shape, and a capacitor part and an inductor part which are connected in series between the first signal terminal and a reference potential.