Patent classifications
H03H9/131
ACOUSTIC WAVE DEVICE
An acoustic wave device includes a piezoelectric substrate and an IDT electrode including electrode fingers, a barrier layer on the piezoelectric substrate, and a first layer on the barrier layer, and including Cu as a main component. The first layer includes a first principal surface on a side closest to the piezoelectric substrate, a second principal surface opposite to the first principal surface, and a side surface connected to the first principal surface and the second principal surface. The barrier layer covers the first principal surface 5a and the side surface of the first layer. A thickness of a portion of the barrier layer covering the first principal surface of the first layer is smaller than a thickness of a portion of the barrier layer covering the side surface of the first layer.
BULK ACOUSTIC WAVE FILTER STRUCTURE WITH CONDUCTIVE BRIDGE FORMING ELECTRICAL LOOP WITH AN ELECTRODE
Disclosed is a Bulk Acoustic Wave (BAW) filter structure with a conductive bridge forming an electrical loop with an electrode for reduced electrical losses. In exemplary aspects disclosed herein, the BAW filter structure includes a transducer with electrodes, a piezoelectric layer between the electrodes, and at least one conductive bridge offset from at least a portion of one of the electrodes by an insulating volume. The conductive bridge forms a first electrical loop between a medial end and a distal end of the electrode. Such a configuration reduces electrical resistance, heat resistance, and/or ohmic losses for improved electrical loss of the BAW filter structure.
ELECTRODE STRUCTURE OF CRYSTAL UNIT, CRYSTAL UNIT, AND CRYSTAL OSCILLATOR
The present invention is able to reduce a CI value without requiring precise processing of a crystal blank.
An electrode structure of a crystal unit (1) according to the present invention includes driven electrodes (21, 22) arranged at least at a center on main surfaces (11, 12) of a crystal blank (10). The driven electrodes (21, 22) have a structure in which vibration energy of thickness shear vibration of the crystal blank (10) is concentrated in a central region of the crystal blank (10).
BULK ACOUSTIC WAVE RESONATOR AND METHOD OF MANUFACTURING BULK ACOUSTIC WAVE RESONATOR
A method of manufacturing a bulk acoustic wave (BAW) resonator according to an embodiment of the present invention may include: forming a lower electrode above a substrate; forming a nitrogen layer on an upper surface of the lower electrode through nitrogen (N.sub.2) plasma surface treatment; forming a piezoelectric layer made of an AlScN material above the nitrogen layer to align an upper surface of the piezoelectric layer to an N polarity; and forming an upper electrode above the piezoelectric layer aligned to the N polarity.
Method for the production of a bulk acoustic wave resonator with a reduced parasitic capacitance
A method for producing an adjustable bulk acoustic wave resonator comprising a transducer stack (E1) and a tuning stack (E2). According to the invention, transducer stack (E1) includes two defined electrodes (4, 6) and piezoelectric material (2), and stack (E2) includes a layer of piezoelectric material (8) and two defined electrodes (10, 12). The method includes: a) production of the transducer stack; b) formation of an electrically insulating layer on an electrode (6) of the transducer stack; c) formation of a defined electrode (10) of the tuning stack on the electrically insulting layer such that it is aligned with the electrodes of the transducer stack; d) assembly, on the electrode (10), of a substrate of piezoelectric material; e) fracturing of the substrate of piezoelectric material; and f) formation of the other defined electrode (12) of the tuning stack, aligned with the defined electrode (10).
BULK ACOUSTIC WAVE FILTER
A bulk acoustic wave filter includes series resonators connected to a series arm, and parallel resonators connected to a parallel arm connected to the series arm. Two or more of the series resonators are disposed in parallel on the series arm, and each includes a substrate, a lower electrode on the substrate, a piezoelectric layer on the lower electrode, and an upper electrode on the piezoelectric layer, wherein, when an active region in which the lower electrode, the piezoelectric layer, and the upper electrode overlap each other is viewed from above, a centroid of the active region and a center of a rectangle defining an aspect ratio of the active region match each other, and when the active region is viewed from above, the active region has a shape of polygon symmetrical with respect to at least one axis passing through a center of the rectangle defining the aspect ratio.
ACOUSTIC WAVE DEVICE
An acoustic wave device includes a piezoelectric layer made of lithium niobate or lithium tantalate and including a first main surface, and an IDT electrode and a first dielectric film on the first main surface. A ratio d/p is equal to or less than about 0.5, when a thickness of the piezoelectric layer is d and a center-to-center distance between adjacent electrodes is p. The first dielectric film includes first and second surfaces facing each other. The second surface is a surface on a side of the piezoelectric layer. The IDT electrode includes third and fourth surfaces facing each other. The fourth surfaces are on the side of the piezoelectric layer. The first surface of the first dielectric film is at a same height as or higher than the third surfaces of the IDT electrode. A second dielectric film is on the first surface of the first dielectric film.
Filter device, RF front-end device and wireless communication device
A filter device, an RF front-end device and a wireless communication device are provided. The filter device includes a substrate, a passive device and at least one resonance device, wherein the passive device has a first side and a second side opposite to the first side, the substrate is located on the first side, and the at least one resonance device is located on the second side. The RF filter device formed by integrating the resonance device (such as an SAW or BAW resonance device) and the passive device (such as an IPD) can broaden the pass-band width, has a high out-of-band rejection, and occupies less space in an RF front-end chip.
BULK ACOUSTIC RESONATOR WITH HEAT DISSIPATION STRUCTURE AND FABRICATION PROCESS
A bulk acoustic resonator having a heat dissipation structure, and a fabrication process are provided according to the present application. The bulk acoustic resonator includes a substrate, a metal heat dissipation layer formed on the base substrate and provided with an insulating layer on the surface thereof, and a resonance functional layer formed on the insulating layer, where the metal heat dissipation layer and the insulating layer together define a cavity on the substrate, a side wall of the cavity is formed by the insulating layer, and a bottom electrode layer in the resonance function layer covers the cavity.
BULK ACOUSTIC WAVE RESONATOR STRUCTURE
Embodiments of this disclosure relate to bulk acoustic wave resonators on a substrate. The bulk acoustic wave resonators include a first bulk acoustic wave resonator, a second bulk acoustic wave resonator, a conductor electrically connecting the first bulk acoustic wave resonator to the second bulk acoustic wave resonator, and an air gap positioned between the conductor and a surface of the substrate.