A film bulk acoustic wave resonator includes a first substrate; a first insulating material layer, formed on the first substrate; a first cavity, formed in the first insulating material layer with an opening facing away from the first substrate; and an acoustic-wave resonant plate, including a first electrode, a piezoelectric oscillation plate, and a second electrode stacked on the first insulating material layer. The piezoelectric oscillation plate is disposed between the first electrode and the first electrode. The first electrode includes a first electrode cavity above the first cavity. The second electrode includes a second cavity above the first cavity. At least a portion of a boundary of the piezoelectric oscillation plate is formed by a boundary of the first electrode cavity and a boundary of the second electrode cavity. The boundary of the piezoelectric oscillation plate has an irregular polygonal shape without having two parallel edges.

An elastic wave device in which a recess is provided on an upper side of a support, a piezoelectric thin film covers the recess, and an IDT electrode is provided on an upper surface of the piezoelectric thin film. A plate wave of an S0 mode or SH0 mode is used. A plurality of grooves are provided in the upper surface or lower surface of the piezoelectric thin film at a portion of the piezoelectric thin film that is positioned on a hollow section.

A piezoelectric film that includes crystalline AlN; at least one first element partially replacing Al in the crystalline AlN; and a second element doping the crystalline AlN and which has an ionic radius smaller than that of the first element and larger than that of Al.

A hybrid acoustic resonator. An interdigital electrode is provided in a first region of a surface of a piezoelectric film facing away from a substrate, and forms an interdigital transducer. At least two trenches are provided in a second region of the surface of the piezoelectric film facing away from the substrate. A bulk-acoustic-wave propagation portion is formed between adjacent trenches. A bulk-acoustic-wave electrode is provided on a side surface of the bulk-acoustic-wave propagation portion, and there is an air gap at a surface of the bulk-acoustic-wave electrode facing away from the bulk-acoustic-wave propagation portion. Thereby, the hybrid acoustic resonator includes both the surface acoustic resonator and the bulk acoustic resonator. An acoustic wave in the bulk-acoustic-wave propagation portion and an acoustic wave in the interdigital transducer are both transmitted along a transversal direction.

A resonator comprising a piezoelectric film which creates an acoustic path that is slightly longer in a central region of the resonator than at an edge of the resonator.

A hybrid acoustic resonator. An interdigital electrode is provided in a first region of a surface of a piezoelectric film facing away from a substrate, and forms an interdigital transducer. At least two trenches are provided in a second region of the surface of the piezoelectric film facing away from the substrate. A bulk-acoustic-wave propagation portion is formed between adjacent trenches. A bulk-acoustic-wave electrode is provided on a side surface of the bulk-acoustic-wave propagation portion, and there is an air gap at a surface of the bulk-acoustic-wave electrode facing away from the bulk-acoustic-wave propagation portion. Thereby, the hybrid acoustic resonator includes both the surface acoustic resonator and the bulk acoustic resonator. An acoustic wave in the bulk-acoustic-wave propagation portion and an acoustic wave in the interdigital transducer are both transmitted along a transversal direction.

An elastic wave device in which a recess is provided on an upper side of a support, a piezoelectric thin film covers the recess, and an IDT electrode is provided on an upper surface of the piezoelectric thin film. A plate wave of an S0 mode or SH0 mode is used. A plurality of grooves are provided in the upper surface or lower surface of the piezoelectric thin film at a portion of the piezoelectric thin film that is positioned on a hollow section.

Techniques are disclosed for forming high frequency film bulk acoustic resonator (FBAR) devices having multiple resonator thicknesses on a common substrate. A piezoelectric stack is formed in an STI trench and overgrown onto the STI material. In some cases, the piezoelectric stack can include epitaxially grown AlN. In some cases, the piezoelectric stack can include single crystal (epitaxial) AlN in combination with polycrystalline (e.g., sputtered) AlN. The piezoelectric stack thus forms a central portion having a first resonator thickness and end wings extending from the central portion having a different resonator thickness. Each wing may also have different thicknesses. Thus, multiple resonator thicknesses can be achieved on a common substrate, and hence, multiple resonant frequencies on that same substrate. The end wings can have metal electrodes formed thereon, and the central portion can have a plurality of IDT electrodes patterned thereon.

In bulk acoustic wave (BAW) resonators having convex surfaces, an example BAW resonator includes a first electrode, a piezoelectric layer formed on the first electrode, the piezoelectric layer having a convex surface, and a second electrode formed on the convex surface. An example integrated circuit (IC) package includes a BAW resonator in the IC package, the BAW resonator including a piezoelectric layer having a convex surface.

An elliptical-shaped resonator device. The device includes a bottom metal plate, a piezoelectric layer overlying the bottom metal plate, and a top metal plate overlying the piezoelectric layer. The top metal plate, the piezoelectric layer, and the bottom metal plate are characterized by an elliptical shape having a horizontal diameter (dx) and a vertical diameter (dy), which can be represented as ellipse ratio R=dx/dy. Using the elliptical structure, the resulting bulk acoustic wave resonator (BAWR) can exhibit equivalent or improved insertion loss, higher coupling coefficient, and higher quality factor compared to conventional polygon-shaped resonators.