Patent classifications
H10N30/073
PIEZOELECTRIC FILM CAVITY STRUCTURE FOR A BULK ACOUSTIC WAVE (BAW) RESONATOR AND METHOD THEREFOR
A method for forming a Bulk Acoustic Wave (BAW) structure comprises forming a piezoelectric material on a first substrate; applying a first metal layer on a top surface of the piezoelectric material; forming a metal pattern on a second substrate, the metal pattern forming a cavity pattern between raised areas of the metal pattern; attaching the first metal layer to a top area of the metal pattern forming a plurality of cavity areas; removing the first substrate; and applying a second metal layer on a bottom surface of the piezoelectric material.
Method of manufacturing an integrated capacitor structure using a donor substrate for transferring layers to a receiver substrate
A method for producing an at least partially transparent device is provided, including producing, on a first substrate, first and second separation layers one against the other; producing, on the second separation layer, an at least partially transparent functional layer; making the functional layer integral with a second at least partially transparent substrate; forming a mechanical separation at an interface between the separation layers; removing the second separation layer; producing a first at least partially transparent electrode layer on the functional layer; where the materials of the stack are chosen such that the interface between the separation layers corresponds to that, among all the interfaces of the stack, having the lowest adherence force.
Method of manufacturing an integrated capacitor structure using a donor substrate for transferring layers to a receiver substrate
A method for producing an at least partially transparent device is provided, including producing, on a first substrate, first and second separation layers one against the other; producing, on the second separation layer, an at least partially transparent functional layer; making the functional layer integral with a second at least partially transparent substrate; forming a mechanical separation at an interface between the separation layers; removing the second separation layer; producing a first at least partially transparent electrode layer on the functional layer; where the materials of the stack are chosen such that the interface between the separation layers corresponds to that, among all the interfaces of the stack, having the lowest adherence force.
Method for manufacturing a substrate for a radiofrequency device
A process for fabricating a substrate for a radiofrequency device by joining a piezoelectric layer to a carrier substrate by way of an electrically insulating layer, the piezoelectric layer having a rough surface at its interface with the electrically insulating layer, the process being characterized in that it comprises the following steps: providing a piezoelectric substrate having a rough surface for reflecting a radiofrequency wave, depositing a dielectric layer on the rough surface of the piezoelectric substrate, providing a carrier substrate, depositing a photo-polymerizable adhesive layer on the carrier substrate, bonding the piezoelectric substrate to the carrier substrate by way of the dielectric layer and of the adhesive layer, in order to form an assembled substrate, irradiating the assembled substrate with a light flux in order to polymerize the adhesive layer, the adhesive layer and the dielectric layer together forming the electrically insulating layer.
Method for manufacturing a substrate for a radiofrequency device
A process for fabricating a substrate for a radiofrequency device by joining a piezoelectric layer to a carrier substrate by way of an electrically insulating layer, the piezoelectric layer having a rough surface at its interface with the electrically insulating layer, the process being characterized in that it comprises the following steps: providing a piezoelectric substrate having a rough surface for reflecting a radiofrequency wave, depositing a dielectric layer on the rough surface of the piezoelectric substrate, providing a carrier substrate, depositing a photo-polymerizable adhesive layer on the carrier substrate, bonding the piezoelectric substrate to the carrier substrate by way of the dielectric layer and of the adhesive layer, in order to form an assembled substrate, irradiating the assembled substrate with a light flux in order to polymerize the adhesive layer, the adhesive layer and the dielectric layer together forming the electrically insulating layer.
Integrated multilayer actuators
A multilayer actuator includes a primary electrode, a secondary electrode overlapping at least a portion of the primary electrode, and an electroactive layer disposed between and abutting the primary electrode and the secondary electrode. The multilayer actuator further includes a primary antireflective coating overlapping at least a portion of the primary electrode opposite the electroactive layer, a secondary antireflective coating overlapping at least a portion of the secondary electrode opposite the electroactive layer, and a barrier layer overlapping the secondary antireflective coating opposite the secondary electrode.
Integrated multilayer actuators
A multilayer actuator includes a primary electrode, a secondary electrode overlapping at least a portion of the primary electrode, and an electroactive layer disposed between and abutting the primary electrode and the secondary electrode. The multilayer actuator further includes a primary antireflective coating overlapping at least a portion of the primary electrode opposite the electroactive layer, a secondary antireflective coating overlapping at least a portion of the secondary electrode opposite the electroactive layer, and a barrier layer overlapping the secondary antireflective coating opposite the secondary electrode.
Heterostructure and method of fabrication
The present invention relates to a heterostructure, in particular, a piezoelectric structure, comprising a cover layer, in particular, a layer of piezoelectric material, the material of the cover layer having a first coefficient of thermal expansion, assembled to a support substrate, the support substrate having a second coefficient of thermal expansion substantially different from the first coefficient of thermal expansion, at an interface wherein the cover layer comprises at least a recess extending from the interface into the cover layer, and its method of fabrication.
METHOD FOR MANUFACTURING A FILM ON A FLEXIBLE SHEET
A method for manufacturing film, notably monocrystalline, on a flexible sheet, comprises the following steps: providing a donor substrate, forming an embrittlement zone in the donor substrate so as to delimit film, forming the flexible sheet by deposition over the surface of the film, and detaching the donor substrate along the embrittlement zone so as to transfer the film onto the flexible sheet.
SOFT, ADAPTIVE, SELF-CLEANING ELECTROSTATIC GECKO-LIKE ADHESIVE AND GRIPPER
An adhesive apparatus with an electrostatic adhesive including a microstructured adhesive disposed over an electrode and/or a piezoelectric element. The adhesive can be added to any robotic gripper, such as a gripper finger formed of a flexible material and including a grip surface. The electrode and/or a piezoelectric element can be used for applying an electrostatic field and/or ultrasonic vibration, configured for cleaning the microstructured adhesive, releasing the adhesive, and/or sensing a load on the adhesive apparatus.