Patent classifications
H
H01
H01J
37/00
H01J37/32
H01J37/32009
H01J37/32192
H01J37/32266
H01J37/32284
H01J37/32284
Plasma Systems and Methods of Processing Using Thereof
A plasma system includes a plasma chamber comprising a chamber wall with a first focal line and a second focal line disposed within the chamber wall. A first antenna is disposed within the plasma chamber at the first focal line. The chamber wall is configured to focus radiation from the first antenna on to the second focal line.