A coating apparatus includes a chamber body having a reaction chamber, a supporting rack, a monomer discharge source and a plasma generation source. The supporting rack has a supporting area for supporting the substrate. The monomer discharge source has a discharge inlet for introducing a coating forming material into the reaction chamber. The plasma generation source is arranged for exciting the coating forming material, wherein the supporting area of the supporting rack is located at a position between the monomer discharge source and the plasma generation source, so that the coating is evenly formed on the surface of the substrate, and the deposition velocity is increased.

A pretreatment assembly includes a product support assembly and a pretreatment device. The product support assembly includes a primary support assembly, a primary drive assembly, a number of secondary support assemblies, and a secondary drive assembly. The primary drive assembly is operatively coupled to the primary support assembly. The primary drive assembly imparts a generally constant motion to the primary support assembly. Each secondary support assembly is structured to support a number of work pieces. Each secondary support assembly is movably coupled to the primary support assembly. The secondary drive assembly is operatively coupled to each secondary support assembly. The secondary drive assembly selectively imparts a motion to each secondary support assembly. The pretreatment device is disposed adjacent the product support assembly.

A plasma etching apparatus for processing a workpiece of a frame unit including the workpiece formed with division start points or division grooves along a plurality of mutually intersecting streets, and a frame that has an opening and that supports the workpiece on inside of the opening through an expanding tape includes a plasma etching unit that has a chuck table for holding the workpiece on a holding surface through the expanding tape and that supplies a plasmatized gas to the workpiece held by the chuck table, and an expanding unit that expands the expanding tape to divide the workpiece along the division start points or to widen a width of the division grooves.

Exemplary systems and methods associated with activating fluids using indirect plasma. In particular, liquid can be activated to high concentrations and at high volumes by thinning and mixing the liquid as it is exposed to the plasma, resulting more efficient activation. Further increases in activation can be reached by re-circulating fluid for additional exposure to the plasma. High flow rates can be achieved with integrated systems that utilize multiple activation systems with coordinated control.

A powder coating apparatus which can form a thin film in which freely selected elements are combined without an impurity being mixed and satisfies that a composition of the obtained thin film is uniform. The powder coating apparatus according to the present invention is a powder coating apparatus including a barrel, exhaust device for evacuating an inside of the barrel, and a sputtering device installed inside the barrel, the barrel having a main axis C directed in a horizontal direction and rotating around the main axis, the sputtering device forming a coating film on a surface of powder put in the barrel, in which the sputtering device has one fixing portion for one target to mount two or more targets, and respective targets are disposed in parallel to each other at the same level position with respect to a direction of the main axis when the target is mounted on the fixing portion.

An apparatus for depositing a polymer layer containing nanomaterial on a substrate material includes a carrier for carrying the substrate material; a transport structure for providing a polymerization material near a surface of the substrate material and conducting a gas flow near the surface of the substrate material with the gas flow comprising a nanomaterial; and a plasma chamber wherein a plasma electrode structure is arranged for depositing the polymer layer containing nanomaterial on the surface of the substrate material by applying a plasma polymerization process.

An apparatus for processing or curing a substrate, the apparatus comprising: a support (102) arranged to transport a moving flexible substrate (104), a plasma generator (110) arranged to generate plasma (112), a magnet array (114) arranged to spatially define the plasma, wherein the magnet array comprises: a first elongate magnet (404) having a first polarity; a second elongate magnet (406), substantially parallel to the first elongate magnet, having a second polarity, opposite to the first polarity, such that the first and second elongate magnets define a first straight magnetic flux portion (204); a third elongate magnet (408), substantially parallel to the first elongate magnet, having the first polarity, such that the second and third elongate magnets define a second straight magnetic flux portion, connected to the first straight magnetic flux portion by a first curved magnetic flux portion (206); a fourth elongate magnet (410), substantially parallel to the first elongate magnet, having the second polarity, such that the third and fourth elongate magnets define a third straight magnetic flux portion, connected to the second straight magnetic flux portion by a second curved magnetic flux portion.

Exemplary systems and methods associated with activating fluids using indirect plasma. In particular, liquid can be activated to high concentrations and at high volumes by thinning and mixing the liquid as it is exposed to the plasma, resulting more efficient activation. Further increases in activation can be reached by re-circulating fluid for additional exposure to the plasma. High flow rates can be achieved with integrated systems that utilize multiple activation systems with coordinated control.

A layer-forming device includes a feeding mechanism that feeds a substrate during layer formation, an injector unit having a plurality of injectors that supplies a layer-forming gas to the substrate, along a feeding passage of the substrate, and a reactant supply unit which generates a reactant. The injector unit supplies the reactant through gaps between the injectors to a layer of the layer-forming component. A substrate opposing surface of the injector includes a layer-forming gas supply slot through which the layer-forming gas is output, first gas exhaust slots that suck an excess gas such as the layer-forming gas, the first gas exhaust slots being provided on both sides of the layer-forming gas supply slot in a feeding direction of the substrate, and inert gas supply slots that supply an inert gas provided on far sides of the respective first gas exhaust slots away from the layer-forming gas supply slot.

A liquid treatment apparatus includes a flow channel, first and second electrodes at least part of each of which is disposed within the flow channel, an insulator, a gas supply device, and a power supply source that applies a voltage between the first and second electrodes and generates plasma. The insulator has a tubular shape and an opening on an end surface of the insulator, and surrounds a lateral surface of the first electrode with a space interposed between the insulator and the first electrode. The gas supply device supplies and ejects a gas into the liquid via the opening. At least part of the flow channel extends in a first direction which is inclined with respect to a horizontal direction so that the liquid flows obliquely upward with respect to the horizontal direction. The opening is positioned within the at least part of the flow channel.