Patent classifications
H01J2237/31744
METHOD OF MATERIAL DEPOSITION
A method and apparatus for material deposition onto a sample to form a protective layer composed of at least two materials that have been formulated and arranged according to the material properties of the sample.
Method of processing a material-specimen
A method for generating a smooth surface in a material-specimen includes generating a substantially smooth, first surface region by removing a first material-volume by particle beam etching. The first material-volume is partially defined by the first surface region. An angle between a beam direction and a surface normal of the first surface region is greater than 80 and less than 90. The method also includes generating a substantially smooth, second surface region by removing a second material-volume. The second material-volume is partially defined by the first surface region and is partially defined by the second surface region. An angle between the beam direction and a surface normal of the second surface region is less than 60.
Focused Ion Beam System
There is provided a focused ion beam (FIB) system capable of exhausting gas remaining in a nozzle. The FIB system is operative to mill a sample by irradiating it with an ion beam and includes the nozzle for blowing the gas from a blowoff port against the sample (to deposit a film, and a tank for supplying the gas into the nozzle. The nozzle is provided with exhaust holes for exhausting the gas in the nozzle.
Charged particle assessment tool, inspection method
A charged particle assessment tool includes: an objective lens configured to project a plurality of charged particle beams onto a sample, the objective lens having a sample-facing surface defining a plurality of beam apertures through which respective ones of the charged particle beams are emitted toward the sample; and a plurality of capture electrodes adjacent respective ones of the beam apertures and configured to capture charged particles emitted from the sample.