The present invention provides apparatus for an imaging system comprising a multitude of imaging elements upon a substrate. In some embodiments the substrate may be approximately round with a radius of approximately one inch. Various methods relating to using and producing an imaging system are discussed.

The present invention provides apparatus for an imaging system comprising a multitude of imaging elements upon a substrate. In some embodiments the substrate may be approximately round with a radius of approximately one inch. Various methods relating to using and producing an imaging system are discussed.

A Register Transfer Level (RTL) representation is recovered from a netlist representing an integrated circuit (IC). The netlist is converted to a graph comprising nodes belonging to a set of node types and edges connecting the nodes. The set of node types includes an instance node type representing an electronic component and a wire node type representing signal transfer between components. The graph is converted to a standardized graph by replacing subgraphs of the graph with standardized subgraphs. An RTL representation of the standardized graph is generated by operations including building signal declarations in a hardware description language (HDL) from the wire nodes of the standardized graph and building signal assignments in the HDL from instance nodes of the standardized graph.

According to one aspect of the present invention, a charged particle beam writing method includes calculating a positional deviation amount distribution which defines an amount of positional deviation, at a time of irradiation by a charged particle beam to a target object, deviated from a design position due to an irreversible deformation at each position of the target object which deforms irreversibly depending on a dose distribution of the charged particle beam and includes a substrate body, a multilayer film arranged on the substrate body and reflecting a light, and an absorber film arranged on the multilayer film and absorbing the light, and calculating, using the positional deviation amount distribution, a correction amount for correcting an irradiation position of the charged particle beam such that a defect occurred in the target object is included in a region where the absorber film remains after writing.