The solution provides a device formed in a layer stack that includes a source contact layer and a gate contact layer with a first insulation between the gate contact layer and the source contact layer and a drain contact layer with a second insulation between the gate contact layer and the drain contact layer. The layer stack can include a device region orthogonal to a plane defined by a surface of at least one of the layers of the stack. The device region includes a source and a drain separated by a channel at least partially surrounded by a gate dielectric interposed between the gate contact layer and the channel and a first region that can include a silicide or a germanicide at a first end proximal to the source and a second region that can include the silicide or the germanicide at a second end proximal to the drain.

A method of forming a vertical transport fin field effect transistor device is provided. The method includes replacing a portion of a sacrificial exclusion layer between one or more vertical fins and a substrate with a temporary inner spacer. The method further includes removing a portion of a fin layer and the sacrificial exclusion layer between the one or more vertical fins and the substrate, and forming a bottom source/drain on the temporary inner spacer and between the one or more vertical fins and the substrate. The method further includes replacing a portion of the bottom source/drain with a temporary gap filler, and replacing the temporary gap filler and temporary inner spacer with a wrap-around source/drain contact having an L-shaped cross-section.

A semiconductor device includes: a semiconductor substrate; a first gate trench and a second gate trench both extending from a first main surface of the semiconductor substrate into the semiconductor substrate; a semiconductor mesa delimited by the first and second gate trenches; and a field plate trench extending from the first main surface through the semiconductor mesa. The field plate trench includes a field plate separated from each sidewall and a bottom of the field plate trench by an air gap. The field plate is anchored to the semiconductor substrate at the bottom of the field plate trench by an electrically insulative material that occupies a space in a central part of the field plate, the electrically insulative material spanning the air gap to contact the semiconductor substrate at the bottom of the field plate trench. Methods of producing the semiconductor device are also described.

A semiconductor device includes an enhancement-mode first p-channel MISFET, an enhancement-mode second p-channel MISFET, a drain conductor electrically and commonly connected to the first p-channel MISFET and the second p-channel MISFET, a first source conductor electrically connected to a source of the first p-channel MISFET, a second source conductor electrically connected to a source of the second p-channel MISFET, and a gate conductor electrically and commonly connected to a gate of the first p-channel MISFET and a gate of the second p-channel MISFET.

A semiconductor device includes a switch element having a surface and first and second regions and including a first semiconductor material having a band-gap. The first region of the switch element is coupled to a source contact. A floating electrode has first and second ends. The first end of the floating electrode is coupled to the second region of the switch element. A voltage-support structure includes a second semiconductor material having a band-gap that is larger than the band-gap of the first semiconductor material. The voltage-support structure is in contact with the second end of the floating electrode. A drain contact is coupled to the voltage-support structure.

First conductive layer is connected to an impurity region which is a source region or an emitter region. A first conductive layer having an emitter pad and a second conductive layer having a Kelvin emitter pad and a relay pad are separated. A plane occupied area of the Kelvin emitter pad is smaller than a plane occupied area of the emitter pad.

A semiconductor device includes a stack structure, a channel layer passing through the stack structure, a memory layer enclosing the channel layer and including first and second openings which expose the channel layer, a well plate coupled to the channel layer through the first opening, and a source plate coupled to the channel layer through the second opening.

In one general aspect, an apparatus can include a first trench disposed in a semiconductor region and including a gate electrode and a second trench disposed in the semiconductor region. The apparatus can include a mesa region disposed between the first trench and the second trench. The apparatus can include a source region segment of a first conductivity type disposed in a first side of the mesa region where the source region segment is included in a plurality of source region segments and where the plurality of source region segments are aligned along the longitudinal axis. The apparatus can include a body region segment of a second conductivity type disposed in a second side of the mesa region opposite the first side of the mesa region and having a portion disposed above the source region segment where the body region segment is included in a plurality of body region segments.

A semiconductor structure and a method of making the same includes a first recessed region in a semiconductor structure, the first recessed region defining a first opening with a first positive tapering profile, as at least part of the first positive tapering profile, widening the first opening in a direction towards a top source/drain region of the semiconductor structure at a first tapering angle, and a top source/drain contact within the first opening, the top source/drain contact surrounding a surface of the top source/drain region. The semiconductor structure further includes a protective liner located at an interface between a bottom portion of the top source/drain region, a top spacer adjacent to the top source/drain region and a dielectric material between two consecutive top source/drain regions, the protective liner protects the top source/drain regions during contact patterning.

A cell architecture and a method for placing a plurality of cells to form the cell architecture are provided. The cell architecture includes at least a 1.sup.st cell and a 2.sup.nd cell placed next to each other in a cell width direction, wherein the 1.sup.st cell includes a one-fin connector which is formed around a fin among a plurality of fins of the 1.sup.st cell, and connects a vertical field-effect transistor (VFET) of the 1.sup.st cell to a power rail of the 1.sup.st cell, wherein a 2.sup.nd cell includes a connector connected to a power rail of the 2.sup.nd cell, wherein the fin of the 1.sup.st cell and the connector of the 2.sup.nd cell are placed next to each other in the cell width direction in the cell architecture, and wherein the one-fin connector of the 1.sup.st cell and the connector of the 2.sup.nd cell are merged.