The present disclosure, in some embodiments, relates to an integrated chip. The integrated chip includes a semiconductor substrate having sidewalls that define a recess within an upper surface of the semiconductor substrate. A plurality of upper electrode segments are arranged over the semiconductor substrate and are vertically separated from the upper surface of the semiconductor substrate by a first dielectric layer. A lower electrode segment is arranged directly between the sidewalls of the semiconductor substrate and directly between adjacent ones of the plurality of upper electrode segments. A second dielectric layer is arranged directly between the sidewalls of the semiconductor substrate and the lower electrode segment and also directly between the plurality of upper electrode segments and the lower electrode segment.

A semiconductor substrate includes excavations which form trenches sunk. A capacitive element includes: a first dielectric envelope conforming to sides and bottoms of the trenches; a first semiconductor layer conforming to a surface of the first dielectric envelope in the trenches; a second dielectric envelope conforming to a surface of the first semiconductor layer in the trenches; and a second semiconductor layer conforming to a surface of the second dielectric envelope in the trenches.

The present disclosure relates to a process to integrate sintered components in a laminate substrate. The disclosed process starts with providing a precursor substrate, which includes a substrate body having an opening through the substrate body, and a first foil layer. Herein, the first foil layer is formed underneath the substrate body, so as to fully cover a bottom of the opening. Next, a sinterable base material is applied into the opening and over the first foil layer, and then sintered at a first sintering temperature to create a sintered base component. A sinterable contact material is applied over the sintered base component, and then sintered at a second sintering temperature to create a sintered contact film. The sintered base component is confined within the opening by the substrate body on sides, by the first foil layer on bottom, and by the sintered contact film on top.

Described is a ferroelectric-based capacitor that improves reliability of a ferroelectric memory by providing tensile stress along a plane (e.g., x-axis) of a ferroelectric or anti-ferroelectric material of the ferroelectric/anti-ferroelectric based capacitor. Tensile stress is provided by a spacer comprising metal, semimetal, or oxide (e.g., metal or oxide of one or more of: Al, Ti, Hf, Si, Ir, or N). The tensile stress provides polar orthorhombic phase to the ferroelectric material and tetragonal phase to the anti-ferroelectric material. As such, memory window and reliability of the ferroelectric/anti-ferroelectric oxide thin film improves.

Various embodiments of the present disclosure are directed towards an integrated circuit (IC) including a substrate comprising sidewalls that define a trench. A capacitor comprising a plurality of conductive layers and a plurality of dielectric layers that define a trench segment is disposed within the trench. A width of the trench segment continuously increases from a front-side surface of the substrate in a direction towards a bottom surface of the trench.

An integrated resistor-capacitor (RC) structure (400) is disclosed. The integrated RC structure includes a vertical capacitor (302,402,306) and a resistive element (308,310) disposed above the capacitor. The integrated RC structure uses a low ohmic substrate (302) to ensure a good ground return path for the capacitor. Further, a resistivity of the substrate is configured such that a top plate (306) of the capacitor provides a reference ground above a predefined frequency. The impedance of the resistive element (308,310) is matched, relative to the reference ground, to a predetermined resistance. As such, the resistance of the resistive element (308,310) can be controlled to provide an impedance controlled RC structure over a range of operating frequencies.

A capacitive element is located in an active region of the substrate and on a front face of the substrate. The capacitive element includes a first electrode and a second electrode. The first electrode is formed by a first conductive region and the active region. The second electrode is formed by a second conductive region and a monolithic conductive region having one part covering a surface of said front face and at least one part extending into the active region perpendicularly to said front face. The first conductive region is located between and is insulated from the monolithic conductive region and a second conductive region.

A semiconductor memory device includes a substrate; a film stack on the substrate; a silicon device layer on the film stack; and a trench with corrugated sidewall surface extending into the silicon device layer, the film stack, and the substrate. A trench capacitor is located in the trench. The trench capacitor includes an inner electrode and an outer electrode with a node dielectric layer therebetween. The node dielectric layer is in direct with the film stack and the bulk semiconductor substrate. A transistor is disposed on the substrate. The transistor includes a source region and a drain region, a channel region between the source region and the drain region, and a gate over the channel region. The source region is electrically connected to the inner electrode of the trench capacitor.

A semiconductor device including field-effect transistors (finFETs) and fin capacitors are formed on a silicon substrate. The fin capacitors include silicon fins, one or more electrical conductors between the silicon fins, and insulating material between the silicon fins and the one or more electrical conductors. The fin capacitors may also include insulating material between the one or more electrical conductors and underlying semiconductor material.

A semiconductor structure includes a substrate having a doped silicon substrate, a buried oxide layer, and a silicon device layer. A trench capacitor having an inner electrode and a node dielectric layer is formed in a trench of the substrate. The inner electrode and the node dielectric layer extend into the doped silicon substrate. A select transistor is disposed in the silicon device layer. An embedded contact is disposed atop the trench capacitor to electrically couple a doped region of the select transistor with the inner electrode. A first dielectric layer is disposed around the select transistor. A second dielectric layer is deposited on the first dielectric layer. A contact plug is formed in the second dielectric layer and the first dielectric layer and is in direct contact with the embedded contact. A memory stack with a MTJ element is disposed on the contact plug.