The invention provides a solution based process based on high molecular weight block copolymer (BCP) nanolithography for fabrication of periodic structures on large areas of optical surfaces. In one embodiment there is provided method of fabricating a nano-patterned surface for application in a photonic, optical or other related device, said method comprising the steps of: providing a substrate material; depositing a block copolymer (BCP) material on the substrate material; and phase separating the BCPs using at least one solvent selected to facilitate polymer chain mobilisation and lead to phase separation to fabricate said nano-patterned surface; wherein the nano-patterned surface comprises an ordered array of structures and having a domain or diameter of 100 nm or greater. A new photonic device and optical device is also described.

A solar cell and a photovoltaic module including the same are provided. The solar cell includes a substrate having a first surface and a second surface opposite to each other; a first passivation stack disposed on the first surface and including a first oxygen-rich dielectric layer, a first silicon-rich dielectric layer, a second oxygen-rich dielectric layer, and a second silicon-rich dielectric layer that are sequentially disposed in a direction away from the first surface, wherein an atomic fraction of oxygen in the first oxygen-rich dielectric layer is less than an atomic fraction of oxygen in the second oxygen-rich dielectric layer; a tunneling oxide layer disposed on the second surface; a doped conductive layer disposed on a surface of the tunneling oxide layer; and a second passivation layer disposed on a surface of the doped conductive layer.

A solar cell and a photovoltaic module including the solar cell. The solar cell includes: a semiconductor substrate including a first surface and a second surface opposite to each other; a first dielectric layer located on the first surface; a first N+ doped layer located on a surface of the first dielectric layer; a first passivation layer located on a surface of the first N+ doped layer; a first electrode located on a surface of the first passivation layer; a second dielectric layer located on the second surface; a first P+ doped layer located on a surface of the second dielectric layer; a second passivation layer located on a surface of the first P+ doped layer; and a second electrode located on a surface of the second passivation layer.

Methods of fabricating solar cell emitter regions with differentiated P-type and N-type regions architectures, and resulting solar cells, are described. In an example, a back contact solar cell includes a substrate having a light-receiving surface and a back surface. A first polycrystalline silicon emitter region of a first conductivity type is disposed on a first thin dielectric layer disposed on the back surface of the substrate. A second polycrystalline silicon emitter region of a second, different, conductivity type is disposed on a second thin dielectric layer disposed on the back surface of the substrate. A third thin dielectric layer is disposed laterally directly between the first and second polycrystalline silicon emitter regions. A first conductive contact structure is disposed on the first polycrystalline silicon emitter region. A second conductive contact structure is disposed on the second polycrystalline silicon emitter region.

A solar cell superfine electrode transfer thin film is described. The electrode transfer thin film sequentially includes from bottom to top a substrate, a release layer, a resin layer and a hot melt adhesive layer; the resin layer is formed with electrode trenches therein; the electrode trenches are formed with electrodes therein; superfine conductive electrodes are continuously prepared on a transparent thin film via a roll-to-roll nanoimprinting method, the width of an electrode wire being 2 μm-50 μm, and the width of a typical line being 10 μm-30 μm. Directly attach the superfine electrodes of the hot melt adhesive layer to a solar cell by peeling off the substrate material, and sintering at a high temperature to volatilize the hot melt adhesive layer material while retaining the electrodes, thus the electrodes are integrally transferred, without poor local transfer.

A solar cell can include a silicon semiconductor substrate; an oxide layer on a first surface of the silicon semiconductor substrate; a polysilicon layer on the oxide layer; a diffusion region at a second surface of the silicon semiconductor substrate; a dielectric film on the polysilicon layer; a first electrode connected to the polysilicon layer through the dielectric film; a passivation film on the diffusion region; and a second electrode connected to the diffusion region through the passivation film.

To provide a cover glass for a solar cell module which can sufficiently maintain the power generation efficiency of a solar cell module, even when a design is imparted to the entire surface of the cover glass so as to make solar cells be invisible from the outside, and a solar cell module. To provide a cover glass 14 to be bonded on light-receiving surfaces 16A and 16B of solar cells 16 via an encapsulant material 18, which has a visible transmittance of from 0% to 60% and an average infrared transmittance of from 20% to 100%, which is a value calculated by simply averaging transmittances at 5 nm intervals in an infrared region at a wavelength of from 780 nm to 1,500 nm.

A tandem solar cell includes a perovskite solar cell including a perovskite absorption layer, a silicon solar cell placed under the perovskite solar cell, a junction layer placed between the perovskite solar cell and the silicon solar cell, an upper electrode placed on the perovskite solar cell, and a lower electrode placed under the silicon solar cell.

A process for the preparation of colored solar cells or colored solar cell modules containing a colored polymer film with oriented effect pigments, and colored solar cells or colored solar cell modules prepared by this process.

Provided are a solar cell, a method for manufacturing a solar cell and a photovoltaic module. The solar cell includes a semiconductor substrate including a surface having a first texture structure and a first passivation layer located on the first texture structure of the semiconductor substrate. The first texture structure includes a pyramid-shaped microstructure, a length of a bevel edge of the pyramid-shaped microstructure is C μm, and 0.4≤C≤1.9. A non-uniformity of the first passivation layer is N≤4%, and N=(D.sub.max−D.sub.min)/D.sub.max. D.sub.max is a maximum thickness of the first passivation layer on the pyramid-shaped microstructure, and D.sub.min is a minimum thickness of the first passivation layer on the pyramid-shaped microstructure.