Patent classifications
H01L31/02963
AMPHOTERIC P-TYPE AND N-TYPE DOPING OF GROUP III-VI SEMICONDUCTORS WITH GROUP-IV ATOMS
Methods of forming a p-type IV-doped III-VI semiconductor are provided which comprise exposing a substrate to a vapor composition comprising a group III precursor comprising a group III element, a group VI precursor comprising a group VI element, and a group IV precursor comprising a group IV element, under conditions to form a p-type IV-doped III-VI semiconductor via metalorganic chemical vapor deposition (MOCVD) on the substrate. Embodiments make use of a flow ratio defined as a flow rate of the group VI precursor to a flow rate of the group III precursor wherein the flow ratio is below an inversion flow ratio value for the IV-doped III-VI semiconductor.
Vapor transport deposition method and system for material co-deposition
An improved feeder system and method for continuous vapor transport deposition that includes at least two vaporizers couple to a common distributor through an improved seal for separately vaporizing and collecting at least any two vaporizable materials for deposition as a material layer on a substrate. Multiple vaporizer provide redundancy and allow for continuous deposition during vaporizer maintenance and repair.
Photovoltaic devices and method of making
A photovoltaic device is presented. The photovoltaic device includes a layer stack; and an absorber layer is disposed on the layer stack. The absorber layer comprises selenium, wherein an atomic concentration of selenium varies across a thickness of the absorber layer. The photovoltaic device is substantially free of a cadmium sulfide layer.
SOLAR CELL AND METHOD FOR PREPARING SAME
A method for preparing a solar cell, includes: forming a first electrode on a substrate; forming a light absorbing layer on the first electrode; and forming a second electrode on the light absorbing layer, wherein the method further comprises forming an impurity material layer including an impurity element on the light absorbing layer adjacent to the first electrode or the second electrode in any one side or both sides thereof, and forming a doping layer by diffusing the impurity element into a portion of the light absorbing layer.
DISPLAY APPARATUS
A display apparatus including a display panel is provided. The display panel has a plurality of display blocks, wherein each display block includes a light conversion circuit, a pixel array, and a data voltage selection circuit. The light conversion circuit receives the light pulse signal and has a pull-up circuit and a pull-down circuit, wherein the pull-up circuit and the pull-down circuit are coupled between a system high voltage and a system low voltage, and the pull-up circuit and the pull-down circuit output the system high voltage or system low voltage according to the light pulse signal to form a voltage pulse signal. The data voltage selection circuit is coupled to the light conversion circuit and the pixel array and receives an AC waveform voltage to supply a data signal to the pixel array according to the voltage pulse signal.
Devices and methods featuring the addition of refractory metals to contact interface layers
Disclosed embodiments include CdS/CdTe PV devices (100) having a back contact (110,112) with oxygen gettering capacity. Also disclosed are back contact structures (110, 112) and methods of forming a back contact in a CdS/CdTe PV device (100). The described contacts and methods feature a contact having a contact interface layer (100) comprising a contact interface material, a p-type dopant and a gettering metal.
Photodetection device which has an inter-diode array and is overdoped by metal diffusion and manufacturing method
A photodetection device and a method for manufacturing the device, the device including a substrate and an array of diodes, the substrate including an absorption layer including a first type of doping, and each diode including, in the absorption layer, a collection region including a second type of doping opposite to the first type. The device further includes, under the surface of the substrate, a conductive mesh including at least one conductive channel inserted between the collection regions of two adjacent diodes, the at least one conductive channel including the first type of doping and a higher doping density than the absorption layer. The doping density of the at least one conductive channel is the result of a diffusion of metal in the absorption layer from a metal mesh provided on the surface of the substrate.
Semiconductor nanoparticle dispersion, a photoelectric conversion element, and an image pickup device for substantially uniform absorption edge wavelength
A semiconductor nanoparticle dispersion is provided. The semiconductor nanoparticle including a plurality of semiconductor nanoparticles having a radius equal to or larger than an exciton Bohr radius; and a solvent dispersed with the plurality of semiconductor nanoparticles.
Display apparatus
A display apparatus including a display panel is provided. The display panel has a plurality of display blocks, wherein each display block includes a light conversion circuit, a pixel array, and a data voltage selection circuit. The light conversion circuit receives the light pulse signal and has a pull-up circuit and a pull-down circuit, wherein the pull-up circuit and the pull-down circuit are coupled between a system high voltage and a system low voltage, and the pull-up circuit and the pull-down circuit output the system high voltage or system low voltage according to the light pulse signal to form a voltage pulse signal. The data voltage selection circuit is coupled to the light conversion circuit and the pixel array and receives an AC waveform voltage to supply a data signal to the pixel array according to the voltage pulse signal.
THIN FILM STACKS FOR GROUP V DOPING, PHOTOVOLTAIC DEVICES INCLUDING THE SAME, AND METHODS FOR FORMING PHOTOVOLTAIC DEVICES WITH THIN FILM STACKS
According to the embodiments provided herein, a method for forming a photovoltaic device can include depositing a plurality of semiconductor layers. The plurality of semiconductor layers can include a doped layer that is doped with a group V dopant. The doped layer can include cadmium selenide or cadmium telluride. The method can include annealing the plurality of semiconductor layers to form an absorber layer.