A silicon photodiode according to an embodiment of the present invention comprises: a silicon substrate having a first conductive area and a second conductive area horizontally spaced apart from the first conductive area; a plurality of randomly arranged metal nanoparticles formed on the silicon substrate; an antireflective layer covering the metal nanoparticles; a first contact passing through the antireflective layer and connected to the first conductive layer; and a second contact passing through the antireflective layer and connected to the second conductive layer.

A silicon photodiode according to an embodiment of the present invention comprises: a silicon substrate having a first conductive area and a second conductive area horizontally spaced apart from the first conductive area; a plurality of randomly arranged metal nanoparticles formed on the silicon substrate; an antireflective layer covering the metal nanoparticles; a first contact passing through the antireflective layer and connected to the first conductive layer; and a second contact passing through the antireflective layer and connected to the second conductive layer.

A light-receiving device includes a light-receiving element formed on a main surface of a substrate, a light incidence surface formed on a side portion of the substrate at an acute angle or an obtuse angle with respect to the plane of the substrate and having an inclined surface forming one plane, and a lens for focusing light incident on the light-receiving element. The lens is disposed at a position where the light incident from the light incidence surface is reflected on a side of a back surface of the substrate.

A light-receiving device includes a light-receiving element formed on a main surface of a substrate, a light incidence surface formed on a side portion of the substrate at an acute angle or an obtuse angle with respect to the plane of the substrate and having an inclined surface forming one plane, and a lens for focusing light incident on the light-receiving element. The lens is disposed at a position where the light incident from the light incidence surface is reflected on a side of a back surface of the substrate.

A light-receiving device of an embodiment of the present disclosure includes a photoelectric conversion layer that includes a first compound semiconductor with a first conductivity type and absorbs a wavelength of an infrared region, a first semiconductor layer formed on the photoelectric conversion layer, and an insulation layer formed to surround the photoelectric conversion layer and the first semiconductor layer, the first semiconductor layer having a second conductivity-type region at a middle region excluding a periphery facing the photoelectric conversion layer.

Some disclosed embodiments include an electron detector comprising: a first semiconductor layer having a first portion and a second portion; a second semiconductor layer; a third semiconductor layer; a PIN region formed by the first, second, and third semiconductor layers; a power supply configured to apply a reverse bias between the first and the third semiconductor layers; and a depletion region formed within the PIN region by the reverse bias and configured to generate a detector signal based on a first subset of the plurality of signal electrons captured within the depletion region, wherein the second portion of the first semiconductor layer is not depleted and is configured to provide an energy barrier to block a second subset of the plurality of signal electrons and to allow the first subset of the plurality of signal electrons to pass through to reach the depletion region.

An optoelectronic semiconductor device is disclosed wherein the device is a vertical-cavity surface-emitting laser or a photodiode containing a section, the top part of which is electrically isolated from the rest of the device. The electric isolation can be realized by etching a set of holes and selective oxidation of AlGaAs layer or layers such that the oxide forms a continuous layer or layers everywhere beneath the top surface of this section. Alternatively, a device can be grown epitaxially on a semi-insulating substrate, and a round trench around a section of the device can be etched down to the semi-insulating substrate thus isolating this section electrically from the rest of the device. Then if top contact pads are deposited on top of the electrically isolated section, the pads have a low capacitance, and a pad capacitance below two hundred femto-Farads, and the total capacitance of the device below three hundred femto-Farads can be reached.

In some embodiments, the present disclosure relates to a single-photon avalanche detector (SPAD) device including a silicon substrate including a recess in an upper surface of the silicon substrate. A p-type region is arranged in the silicon substrate below a lower surface of the recess. An n-type avalanche region is arranged in the silicon substrate below the p-type region and meets the p-type region at a p-n junction. A germanium region is disposed within the recess over the p-n junction.

The invention relates to a semiconductor structure intended to receive an electromagnetic wave. The semiconductor structure comprises at least one first semiconductor resonant optical cavity conformed to absorb at least partially the electromagnetic wave and to provide an electrical signal proportional to the part of the electromagnetic wave absorbed. The semiconductor structure further includes a second dielectric resonant optical cavity of which a resonance wavelength is comprised in the predetermined range of wavelengths and is preferentially equal to the wavelength λ.sub.0, the second resonant optical cavity being laid out to intercept at least part of the electromagnetic wave and being optically coupled to the first resonant optical cavity. The second resonant optical cavity is transparent to the predetermined range of wavelengths. The invention further relates to a semiconductor component comprising such a semiconductor structure and a method of manufacturing such a semiconductor structure.

The invention relates to a semiconductor structure intended to receive an electromagnetic wave. The semiconductor structure comprises at least one first semiconductor resonant optical cavity conformed to absorb at least partially the electromagnetic wave and to provide an electrical signal proportional to the part of the electromagnetic wave absorbed. The semiconductor structure further includes a second dielectric resonant optical cavity of which a resonance wavelength is comprised in the predetermined range of wavelengths and is preferentially equal to the wavelength λ.sub.0, the second resonant optical cavity being laid out to intercept at least part of the electromagnetic wave and being optically coupled to the first resonant optical cavity. The second resonant optical cavity is transparent to the predetermined range of wavelengths. The invention further relates to a semiconductor component comprising such a semiconductor structure and a method of manufacturing such a semiconductor structure.