A semiconductor structure, the semiconductor structure including a channel connecting a source on the semiconductor substrate and a drain on the semiconductor substrate, wherein the channel comprises a plasmonic resonator. A sensor including a plasmonic film, wherein the plasmonic film includes a sensitivity to a known analyte, a semiconductor structure including a source and a drain of a field effect transistor, and an electrical connection between the plasmonic film and a gate of the semiconductor structure. A method of forming a sensor including forming a field effect transistor (“FET”) on a semiconductor substrate, the field effect transistor including a source, a drain, and a gate, where the gate includes a plasmonic resonator.

One or more systems and/or methods are disclosed for building a relief print generator with no bezel. An electrode layer having more than one electrode can be used in an electrode-based, electro-luminescence component of the relief print generator. The respective electrodes may be connected to power sources with different voltage phases. An electrical circuit can be created between a biometric object and more than one electrode in the electrode layer when the biometric object contacts a surface of the generator. The electro-luminescent component can be activated by electrical charge and emit light indicative of a relief print of the biometric object. A contact electrode outside the electrode layer may not be used, which may allow for the removal of a bezel from an example device.

A photo transistor and a display device employing the photo transistor are provided. The photo transistor includes a gate electrode disposed on a substrate, a gate insulating layer that electrically insulates the gate electrode, a first active layer overlapping the gate electrode and including metal oxide, wherein the gate insulating layer is disposed between the gate electrode and the active layer, a second active layer disposed on the first active layer and including selenium, and a source electrode and a drain electrode respectively electrically connected to the second active layer.

A photo transistor and a display device employing the photo transistor are provided. The photo transistor includes a gate electrode disposed on a substrate, a gate insulating layer that electrically insulates the gate electrode, a first active layer overlapping the gate electrode and including metal oxide, wherein the gate insulating layer is disposed between the gate electrode and the active layer, a second active layer disposed on the first active layer and including selenium, and a source electrode and a drain electrode respectively electrically connected to the second active layer.

Photovoltaic devices such as solar cells having one or more field-effect hole or electron inversion/accumulation layers as contact regions are configured such that the electric field required for charge inversion and/or accumulation is provided by the output voltage of the photovoltaic device or that of an integrated solar cell unit. In some embodiments, a power source may be connected between a gate electrode and a contact region on the opposite side of photovoltaic device. In other embodiments, the photovoltaic device or integrated unit is self-powering.

A light receiving unit having a first energy source made up of two sub sources. A first terminal contact is formed at the upper face of the first sub source and a second terminal contact is formed at the lower face of the second sub source. The sub source has at least one semiconductor diode that has an absorption edge adapted to a first wavelength of light and the second semiconductor diode has an absorption edge adapted to a second wavelength of light which is different from the first wavelength of light, such that the first sub source generates electric voltage upon being irradiated with the first wavelength of light and the second sub source generates electric voltage upon being irradiated with the second wavelength of light.

In various embodiments, a simple, robust molybdenum disulfide (MoS.sub.2) based photosensor is provided that is able to detect both light intensity and wavelength. The MoS.sub.2 based photosensor may be structured as a field effect transistor (FET) with a back-gate configuration, including MoS.sub.2 nanoflake layers, an insulating layer coated, doped substrate, and source, drain and backgate electrodes. The photoresponse of the MoS.sub.2 based photosensor exhibits a fast response component that is only weakly dependent on the wavelength of light incident on the sensor and a slow response component that is strongly dependent on the wavelength of light incident on the sensor. The fast response component alone may be analyzed to determine intensity of the light, while the slow response component may be analyzed to determine the wavelength of the light.

Crystalline material, phototransistor, and methods of fabrication thereof. The crystalline material comprising a plurality of stacked two-dimensional black phosphorous carbide layers.

The present disclosure relates to an avalanche diode including at least one PN junction; at least one depletion structure located adjacent to the PN junction and configured to form a depletion region; and at least two electrodes to polarize the at least one PN junction.

An electrostatically controlled sensor includes a GaN/AlGaN heterostructure having a 2DEG channel in the GaN layer. Source and drain contacts are electrically coupled to the 2DEG channel through the AlGaN layer. A gate dielectric is formed over the AlGaN layer, and gate electrodes are formed over the gate dielectric, wherein each gate electrode extends substantially entirely between the source and drain contacts, wherein the gate electrodes are separated by one or more gaps (which also extend substantially entirely between the source and drain contacts). Each of the one or more gaps defines a corresponding sensing area between the gate electrodes for receiving an external influence. A bias voltage is applied to the gate electrodes, such that regions of the 2DEG channel below the gate electrodes are completely depleted, and regions of the 2DEG channel below the one or more gaps in the direction from source to drain are partially depleted.