A number of monolithic diode limiter semiconductor structures are described. The diode limiters can include a hybrid arrangement of diodes with different intrinsic regions, all formed over the same semiconductor substrate. In one example, two PIN diodes in a diode limiter semiconductor structure have different intrinsic region thicknesses. The first PIN diode has a thinner intrinsic region, and the second PIN diode has a thicker intrinsic region. This configuration allows for both the thin intrinsic region PIN diode and the thick intrinsic region PIN diode to be individually optimized. The thin intrinsic region PIN diode can be optimized for low level turn on and flat leakage, and the thick intrinsic region PIN diode can be optimized for low capacitance, good isolation, and high incident power levels. This configuration is not limited to two stage solutions, as additional stages can be used for higher incident power handling.

Embodiments of RF amplifiers and RF amplifier devices include a transistor, a multiple-section bandpass filter circuit, and a harmonic termination circuit. The bandpass filter circuit includes a first connection node coupled to the amplifier input, a first inductive element coupled between the first connection node and a ground reference node, a first capacitance coupled between the first connection node and a second connection node, a second capacitance coupled between the second connection node and the ground reference node, and a second inductive element coupled between the second connection node and the transistor input. The harmonic termination circuit includes a third inductive element and a third capacitance connected in series between the transistor input and the ground reference node. The harmonic termination circuit resonates at a harmonic frequency of a fundamental frequency of operation of the RF amplifier.

Devices and methods are provided for fabricating a metal-insulator-metal capacitor within an interconnect structure (e.g., back-end-of-line interconnect structure) to provide capacitive decoupling between positive and negative power supply voltage lines of a power distribution network. Various via contact configurations including interlevel via contacts and truncated via contacts are utilized to connect the metal-insulator-metal capacitor electrodes to power supply voltage lines of the power distribution network to provide an array of high-density, low resistance via contact connections at various locations across the capacitor electrodes to reduce the resistance of the metal-insulator-metal capacitor and, thus, enhance the transient response time and increase the cutoff frequency of the metal-insulator-metal capacitor. The truncated via contacts allow for higher density via contact connections to the capacitor electrodes in regions which have a dense array of wiring of a single polarity, where interlevel via contacts cannot be utilized to provide contacts to the capacitor electrodes.

A microwave module includes an RF device and a multilayer resin substrate. The device includes a metal cover covering at least an internal circuit. The substrate includes a first end face on a side of the device, a second end face on a side opposite to the first end face, a signal through-holes surrounding the circuit and connected to the circuit, ground through-holes surrounding the signal through-holes and connected to the cover, a first surface ground provided on the first end face and connected to the cover, an inner layer surface ground connected to ground through-holes, and an RF transmission line surrounded by the ground through-holes, the first surface ground, and the inner layer surface ground, and connected to the signal through-hole.

Devices and methods are provided for fabricating a metal-insulator-metal capacitor within an interconnect structure (e.g., back-end-of-line interconnect structure) to provide capacitive decoupling between positive and negative power supply voltage lines of a power distribution network. Various via contact configurations including interlevel via contacts and truncated via contacts are utilized to connect the metal-insulator-metal capacitor electrodes to power supply voltage lines of the power distribution network to provide an array of high-density, low resistance via contact connections at various locations across the capacitor electrodes to reduce the resistance of the metal-insulator-metal capacitor and, thus, enhance the transient response time and increase the cutoff frequency of the metal-insulator-metal capacitor. The truncated via contacts allow for higher density via contact connections to the capacitor electrodes in regions which have a dense array of wiring of a single polarity, where interlevel via contacts cannot be utilized to provide contacts to the capacitor electrodes.

The embodiments described herein provide radio frequency (RF) amplifiers, and in some embodiments provide amplifiers that can be used in high power RF applications. Specifically, the amplifiers described herein may be implemented with multiple resonant circuits to provide class F and inverse class F amplifiers and methods of operation. In general, the resonant circuits are implemented inside a device package with a transistor die to provide high efficiency amplification for a variety of applications.

The embodiments described herein provide radio frequency (RF) amplifiers, and in some embodiments provide amplifiers that can be used in high power RF applications. Specifically, the amplifiers described herein may be implemented with multiple resonant circuits to provide class F and inverse class F amplifiers and methods of operation. In general, the resonant circuits are implemented inside a device package with a transistor die to provide high efficiency amplification for a variety of applications.

Embodiments of RF amplifiers and RF amplifier devices include a transistor, a multiple-section bandpass filter circuit, and a harmonic termination circuit. The bandpass filter circuit includes a first connection node coupled to the amplifier input, a first inductive element coupled between the first connection node and a ground reference node, a first capacitance coupled between the first connection node and a second connection node, a second capacitance coupled between the second connection node and the ground reference node, and a second inductive element coupled between the second connection node and the transistor input. The harmonic termination circuit includes a third inductive element and a third capacitance connected in series between the transistor input and the ground reference node. The harmonic termination circuit resonates at a harmonic frequency of a fundamental frequency of operation of the RF amplifier.

There is provided a semiconductor device that enables a semiconductor module that connects a wiring substrate and a semiconductor chip mounted on the wiring substrate via a circuit element and that has reduced a wiring length to improve transmission quality of signals or the like so as to achieve miniaturization of the semiconductor module. The semiconductor device includes a wiring substrate, a semiconductor chip disposed on an upper surface of the wiring substrate, a resin portion formed between the wiring substrate and the semiconductor chip, and a circuit element embedded in the resin portion. The circuit element includes a first terminal connected to wiring formed on the upper surface of the wiring substrate, and a second terminal connected to a bump provided on a lower surface of the semiconductor chip.

A device including a substrate, an upper capacitor, and a lower capacitor is described. The upper capacitor is mounted on the substrate and includes an upper body and a pillar that extends from the upper body towards the substrate. The lower capacitor includes a lower body that is disposed both lateral to the pillar and at least in part between the upper body and the substrate. Each of the upper capacitor and the lower capacitor is a respective discrete circuit component. Such capacitor stacking configurations facilitate the placement of larger numbers of capacitors in close proximity to microprocessor cores in integrated circuit modules without the need to increase module size.