A method, apparatus and system with an autonomic, self-healing polymer capable of slowing crack propagation within the polymer and slowing delamination at a material interface.

A semiconductor device includes a first non-volatile memory structure including a first stack structure including first conductive lines stacked and spaced apart from each other and a first vertical memory structure penetrating through the first stack structure; a second non-volatile memory structure including a second stack structure including second conductive lines stacked and spaced apart from each other and a second vertical memory structure penetrating through the second stack structure; and a peripheral circuit structure electrically connected to the first and second non-volatile memory structures. The peripheral circuit structure, the first non-volatile memory structure, and the second non-volatile memory structure vertically overlap each other. The first vertical memory structure includes a first data storage structure including a first data storage material layer. The second vertical memory structure includes a second data storage structure including a second data storage material layer that is different from the first data storage material layer.

Layouts for data pads on a semiconductor die are disclosed. An apparatus may include circuits, a first edge, a second edge perpendicular to the first edge, a third edge opposite the first edge, and a fourth edge opposite the second edge. The apparatus may also include data pads variously electrically coupled to the circuits. The data pads may include a data pad positioned a first distance from the first edge and a second distance from the second edge. The apparatus may also include dummy data pads electrically isolated from the circuits. The dummy data pads may include a dummy data pad positioned substantially the first distance from the first edge and substantially the second distance from the fourth edge. Associated systems and methods are also disclosed.

A semiconductor package includes a lower semiconductor chip, a first upper semiconductor chip including upper pads, and bonding wires coupled to the substrate and the upper pads. The first upper semiconductor chip has a first overhang region adjacent to a first lateral surface of the first upper semiconductor chip, a second overhang region adjacent to a second lateral surface of the first upper semiconductor chip, and a first corner overhang region adjacent to a corner where the first and second lateral surfaces meet with each other. The upper pads include first upper pads on the first overhang region and second upper pads on the second overhang region. The number of the first upper pads is less than that of the second upper pads. The upper pads are spaced apart from the first corner overhang region.

A semiconductor device of an embodiment includes: a wiring board; a semiconductor chip mounted on the wiring board; and a resin-containing layer bonded on the wiring board so as to fix the semiconductor chip to the wiring board. The resin-containing layer contains a resin-containing material having a breaking strength of 15 MPa or more at 125° C.

A package substrate includes: a core insulation layer having first and second package regions and a boundary region between the first and second package regions; a first upper conductive pattern in the first package region; a second upper conductive pattern in the second package region; a first insulation pattern on the core insulation layer to partially expose the first and second upper conductive patterns, wherein the first insulation pattern includes a first trench at the boundary region, and first reinforcing portions in the first trench; a first lower conductive pattern in the first package region; a second lower conductive pattern in the second package region; and a second insulation pattern on the core insulation layer to partially expose the first and second lower conductive patterns, wherein the second insulation pattern includes a second trench at the boundary region, and second reinforcing portions in the second trench.

Embodiments of semiconductor devices and fabrication methods thereof are disclosed. In an example, a semiconductor device includes NAND memory cells and a first bonding layer including first bonding contacts. The semiconductor device also includes a second semiconductor structure including DRAM cells and a second bonding layer including second bonding contacts. The semiconductor device also includes a third semiconductor structure including a processor, SRAM cells, and a third bonding layer including third bonding contacts. The semiconductor device further includes a first bonding interface between the first and third bonding layers, and a second bonding interface between the second and third bonding layers. The first bonding contacts are in contact with a first set of the third bonding contacts at the first bonding interface. The second bonding contacts are in contact with a second set of the third bonding contacts at the second bonding interface. The first and second bonding interfaces are in a same plane.

A semiconductor storage device includes a memory transistor and a word line connected to a gate electrode of the memory transistor. When a write sequence is interrupted before a k+1.sup.th verification operation is ended after a k.sup.th verification operation is ended in the n.sup.th write loop of the write sequence, a voltage equal to or higher than a verification voltage corresponding to a first verification operation in the n.sup.th write loop is supplied to the word line before start of the k+1.sup.th verification operation after resumption of the write sequence. A time from the resumption of the write sequence to the start of the k+1.sup.th verification operation is shorter than a time from start of the first verification operation to end of the k.sup.th verification operation in the n.sup.th write loop.

A semiconductor package is disclosed. The semiconductor package may include a substrate, a first semiconductor chip on the substrate, an inner mold layer provided on the substrate to at least partially enclose the first semiconductor chip, an inner shielding layer provided on the substrate to at least partially enclose the inner mold layer, a second semiconductor chip stack on the inner shielding layer, an outer mold layer provided on the substrate to at least partially enclose the inner shielding layer and the second semiconductor chip stack, and an outer shielding layer at least partially enclosing the outer mold layer. Each of the inner and outer shielding layers may include a conductive material, and the inner shielding layer may be electrically connected to a ground pad of the substrate.

A semiconductor memory device, includes: a first region including a memory cell array; and a second region including a peripheral circuit. The second region includes a semiconductor substrate having a first surface and a second surface. The semiconductor substrate includes: a semiconductor region between the first and second surfaces; an n-type semiconductor region provided on the first surface and higher in donor concentration than the semiconductor region; a damaged region provided on the second surface; and a p-type semiconductor region provided between the damaged region and the n-type semiconductor region, closer to the second surface than the n-type semiconductor region in a direction from the first surface toward the second surfaces of the semiconductor substrate, and higher in acceptor concentration than the semiconductor region.