A semiconductor device includes: a multilayer wiring substrate including a plurality of wiring layers; a first semiconductor chip disposed on the wiring substrate; and a bonding layer bonding the first semiconductor chip to the wiring substrate. A trace formed on the wiring substrate includes a first trace width portion and a second trace width portion, a width of the first trace width portion being greater than the second trace width portion.

The present disclosure provides a semiconductor structure, comprising a die/die stack attached on a substrate, a conductive top block covering a top surface of the die/die stack, and a plurality of ground wires conductively connect the conductive top block and to the substrate. The conductive top block, the plurality of ground wires, and the substrate form a Faraday cage to provide an electromagnetic interference shielding of the die/die stack.

A memory device might include a controller configured to cause the memory device to generate a first sum of expected peak current magnitudes for a plurality of memory devices, and generate a second sum of expected peak current magnitudes for a subset of the plurality of memory devices, if the memory device were to initiate a next phase of an access operation in a selected operating mode; to compare the first sum to a first current demand budget for the plurality of the memory devices; to compare the second sum to a second current demand budget for the subset of memory devices; and to initiate the next phase of the access operation in the selected operating mode in response to the first sum being less than or equal to the first current demand budget and the second sum being less than or equal to the second current demand budget.

A semiconductor package includes a lower semiconductor die and an upper semiconductor die which are stacked with an offset in a first direction, wherein the lower semiconductor die includes a plurality of lower pads arranged in a second direction, which is perpendicular to the first direction, and wherein the upper semiconductor die includes a plurality of upper pads arranged in the second direction. The semiconductor package also includes bent wires electrically connecting the lower pads of the lower semiconductor die with the upper pads of the upper semiconductor die in the first direction. The semiconductor package further includes vertical wires such that a vertical wire is disposed on any one of the lower pad and the upper pad for each pair of pads electrically connected by a bent wire.

A semiconductor package includes a package substrate, a semiconductor chip on the package substrate, the semiconductor chip including a logic chip and a memory stack structure on the logic chip, a connector and a connector terminal below the package substrate, a molding layer that covers the semiconductor chip, the molding layer having a recess region on a top surface of the molding layer, a housing that covers the molding layer, and an air gap on the semiconductor chip, the air gap being defined by the housing and the recess region of the molding layer, and the molding layer separating the air gap from the memory stack structure of the semiconductor chip.

Calibration of soft bit reference levels in a non-volatile memory system is disclosed. When the soft bit reference levels are to be calibrated, encoded data is read from a group of the memory cells. The encoded data is decoded and error corrected. Therefore, the original data that was programmed into the memory cells is recovered. The group of memory cells are sensed at candidate soft bit reference levels, and possibly other reference levels. For each candidate soft bit reference level, mutual information between the original programmed data and the data for that candidate soft bit reference level is determined. The mutual information serves as a good measure for how well the candidate soft bit reference level will aid in decoding the data. In an aspect, a soft bit reference level having the highest mutual information out of several candidates is selected as the calibrated soft bit reference level.

A multi-mode transmission line includes a first and second conductive layers, first and second waveguide walls, a strip line, and a blind conductor. The second conductive layer that is formed over the first conductive layer. The first waveguide wall is elongated in a first direction and is in contact with the first conductive layer and the second conductive layer in a vertical direction. The second waveguide wall is elongated in the first direction parallel to the first waveguide wall and is in contact with the first conductive layer and the second conductive layer in the vertical direction. The strip line is formed between the first and second conductive layers and between the first and second waveguide walls. The blind conductor is connected to one of the first conductive layer, the second conductive layer, the first waveguide wall, or the second waveguide wall.

A semiconductor device includes a peripheral circuit structure, a semiconductor layer, a source conductive layer, a connecting mold layer, a support conductive layer, a buried insulating layer, a gate stack structure, a mold structure, a channel structure and a supporter through the gate stack structure, a THV through the mold structure and the buried insulating layer, a dam structure between the gate stack structure and the mold structure, an upper supporter layer on the dam structure, and a word line separation layer through the gate stack structure and the upper supporter layer. The dam structure includes a first spacer, a second spacer inside the first spacer, a lower supporter layer connected to the upper supporter layer and partially on or covering an inner side wall of the second spacer, and an air gap with a side wall defined by the second spacer and a top end defined by the lower supporter layer.

A semiconductor device includes: a substrate; a first semiconductor chip; a first adhesive layer; a second semiconductor chip; a second adhesive layer; and a spacer. The substrate has a first surface. The first semiconductor chip is provided above the first surface. The first adhesive layer is provided on a lower surface, which is opposed to the substrate, of the first semiconductor chip and contains a plurality of types of resins different in molecular weight. The second semiconductor chip is provided between the substrate and the first adhesive layer. The second adhesive layer covers surroundings of the second semiconductor chip in a view from a normal direction of a first surface, and contains at least one type of the resin lower in molecular weight than the other resins among the plurality of types of resins contained in the first adhesive layer. The spacer covers surroundings of the second adhesive layer in the view from the normal direction of the first surface.

A connector may include: a first substrate having a top surface, a bottom surface opposite to the top surface of the top substrate and a side surface joining an edge of the top surface of the first substrate and joining an edge of the bottom surface of the first substrate; a second substrate having a top surface, a bottom surface opposite to the top surface of the second substrate and a side surface joining an edge of the top surface of the second substrate and joining an edge of the bottom surface of the second substrate, wherein the side surface of the second substrate faces the side surface of the first substrate, wherein the top surfaces of the first and second substrates are coplanar with each other at a top of the connector and the bottom surfaces of the first and second substrates are coplanar with each other at a bottom of the connector; and a plurality of metal traces between, in a first horizontal direction, the side surfaces of the first and second substrates, wherein each of the plurality of metal traces has a top end at the top of the connector and a bottom end at the bottom of the connector.