A 3D semiconductor device, the device including: a first single crystal layer including a plurality of first transistors; at least one first metal layer disposed above the plurality of first transistors; a second metal layer disposed above the at least one first metal layer; a plurality of second transistors disposed atop the second metal layer; a plurality of third transistors disposed atop the plurality of second transistors; a plurality of fourth transistors disposed atop the plurality of third transistors; a third metal layer disposed above the plurality of fourth transistors; a fourth metal layer disposed above the third metal layer; and a plurality of connecting metal paths from the fourth metal layer or the third metal layer to the second metal layer, where the device includes an array of memory cells, and where at least one of the memory cells includes one of the plurality of third transistors.

A method to form a 3D integrated circuit, the method including: providing a first wafer including a first crystalline substrate, a plurality of first transistors, and first copper interconnecting layers, where the first copper interconnecting layers at least interconnect the plurality of first transistors; providing a second wafer including a second crystalline substrate, a plurality of second transistors, and second copper interconnecting layers, where the second copper interconnecting layers at least interconnect the plurality of second transistors; and then performing a face-to-face bonding of the second wafer on top of the first wafer, where the face-to-face bonding includes copper to copper bonding; and thinning the second crystalline substrate to a thickness of less than 5 micro-meters.

A method for removing devices from a substrate using a supporting plate. One or more bars comprised of semiconductor layers are formed on a substrate, and one or more device structures are formed on the bars. At least one supporting plate is bonded to the bars, and stress is applied to the supporting plate to remove the bars from the substrate. The supporting plate is used to divide the bars into one or more device units after the bars are removed from the substrate, wherein the device units are packaged and arranged into one or more modules. The supporting plate may also be used to make a cleavage facet for one or more of the device structures after the bars are removed from the substrate.

A 3D semiconductor device, the device including: a first single crystal layer including a plurality of first transistors and at least two metal layers; a plurality of logic gates including the at least two metal layers interconnecting the plurality of first transistors; a plurality of second transistors disposed atop the at least two metal layers; a plurality of third transistors disposed atop the second transistors; a top metal layer disposed atop the third transistors; and a memory array including word-lines, where the memory array includes at least two rows by two columns of memory mini arrays, where each of the mini arrays includes at least four rows by four columns of memory cells, where each of the memory cells includes at least one of the second transistors or at least one of the third transistors, and where at least one of the second transistors include a metal gate.

A 3D semiconductor device, the device including: a first level including a first single crystal layer and first single crystal transistors; a first metal layer; a second metal layer disposed atop the first metal layer; second transistors disposed atop of the second metal layer; third transistors disposed atop of the second transistors, where at least one of the third transistors includes at least one replacement gate, being processed to replace a non-metal gate material with a metal based gate, and where a distance from at least one of the third transistors to at least one of the second transistors is less than 1 micron.

A semiconductor device, the device including: a first silicon layer including a first single crystal silicon; a first metal layer disposed over the first silicon layer; a second metal layer disposed over the first metal layer; a first level including a plurality of transistors, the first level disposed over the second metal layer, where the plurality of transistors include a second single crystal silicon; a third metal layer disposed over the first level; a fourth metal layer disposed over the third metal layer, where the fourth metal layer is aligned to the first metal layer with a less than 40 nm alignment error; and a via disposed through the first level, where the first level thickness is less than two microns.

A method for producing a 3D memory device, the method including: providing a first level including a first single crystal layer; forming first alignment marks and control circuits in and on the first level, where the control circuits include first single crystal transistors, where the control circuits include at least two metal layers; forming at least one second level disposed on top of the first level; performing a first etch step within the second level; forming at least one third level disposed on top of the at least one second level; performing a second etch step within the third level; and performing additional processing steps to form a plurality of first memory cells within the second level and a plurality of second memory cells within the third level, where the first memory cells include second transistors, and where the second memory cells include third transistors.

A 3D semiconductor device, the device including: a first level including a first single crystal layer, the first level including first transistors, where the first transistors each include a single crystal channel; first metal layers interconnecting at least the first transistors; and a second level including a second single crystal layer, the second level including second transistors, where the second level overlays the first level, where the second level is bonded to the first level, where the bonded includes oxide to oxide bonds, where the second level includes an array of memory cells, and where each of the memory cells includes at least one recessed-channel-array-transistor (RCAT).

A semiconductor device includes a support member, a first switching element, a second switching element, a first passive element, a second passive element, and an electrical conductor. The support member includes a plurality of wiring parts, and the plurality of wiring parts include a first wiring section and a second wiring section spaced apart from each other in a first direction perpendicular to the thickness direction of the support member. The first switching element is electrically connected to the first wiring section. The second switching element is electrically connected to the first switching element and the second wiring section. The first passive element has a first electrode and a second electrode, and the first electrode is bonded to the first wiring section. The second passive element has a third electrode and a fourth electrode, and the fourth electrode is bonded to the second wiring section. The electrical conductor connects the second electrode and the third electrode to each other. At least one of the first passive element and the second passive element is a capacitor.

A method for producing a 3D memory device, including: providing a first level including a single crystal layer and control circuits, the control circuits include a plurality of first single crystal transistors; forming at least one second level disposed above the first level; processing to form a plurality of second transistors, where the processing includes forming a plurality of memory cells, each of the plurality of memory cells includes at least one of the plurality of second transistors, where the control circuits control the plurality of memory cells, where at least one of the plurality of memory cells is at least partially atop a portion of the control circuits, where processing the control circuits accounts for a thermal budget associated with processing of the second transistors by adjusting annealing of the first transistors accordingly; processing to replace gate material of at least one of the plurality of second transistors.