H01L2924/19103

Electronic package and manufacturing method thereof

An electronic package in which at least one magnetically permeable member is disposed between a carrier and an electronic component, where the electronic component has a first conductive layer, and the carrier has a second conductive layer, such that the magnetically permeable element is located between the first conductive layer and the second conductive layer. Moreover, a plurality of conductive bumps that electrically connect the first conductive layer and the second conductive layer are arranged between the electronic component and the carrier to surround the magnetically permeable member for generating magnetic flux.

INTEGRATED VOLTAGE REGULATOR AND PASSIVE COMPONENTS
20230090121 · 2023-03-23 ·

It is highly desirable in electronic systems to conserve space on printed circuit boards (PCB). This disclosure describes voltage regulation in electronic systems, and more specifically to integrating voltage regulators and associated passive components into semiconductor packages with at least a portion of the circuits whose voltage(s) they are regulating.

Semiconductor package

A semiconductor package includes a package substrate, a lower semiconductor chip on the package substrate, an interposer on the lower semiconductor chip, the interposer including a plurality of pieces spaced apart from each other, an upper semiconductor chip on the interposer, and a molding member covering the lower semiconductor chip and the interposer.

CHIP PACKAGE STRUCTURE WITH CAVITY IN INTERPOSER
20220359320 · 2022-11-10 ·

A package structure and a method of forming the same are provided. The package structure includes a package substrate, an interposer substrate, a first semiconductor device, and a second semiconductor device. The interposer substrate is disposed over the package substrate and includes a silicon substrate. The interposer substrate has a bottom surface facing and adjacent to the package substrate, a top surface opposite the bottom surface, and a cavity formed on the top surface. The first semiconductor device is disposed on the top surface of the interposer substrate. The second semiconductor device is received in the cavity and electrically connected to the first semiconductor device and/or the interposer substrate.

Substrate integrated thin film capacitors using amorphous high-k dielectrics

Embodiments include an electronic package that includes a dielectric layer and a capacitor on the dielectric layer. In an embodiment, the capacitor comprises a first electrode disposed over the dielectric layer and a capacitor dielectric layer over the first electrode. In an embodiment, the capacitor dielectric layer is an amorphous dielectric layer. In an embodiment, the electronic package may also comprise a second electrode over the capacitor dielectric layer.

Semiconductor device

Two transistor rows are arranged on or in a substrate. Each of the two transistor rows is configured by a plurality of transistors aligned in a first direction, and the two transistor rows are arranged at an interval in a second direction orthogonal to the first direction. A first wiring is arranged between the two transistor rows when seen from above. The first wiring is connected to collectors or drains of the plurality of transistors in the two transistor rows. The first bump overlaps with the first wiring when seen from above, is arranged between the two transistor rows, and is connected to the first wiring.

HIGH DENSITY SILICON BASED CAPACITOR
20230092429 · 2023-03-23 ·

Disclosed are devices having a metal-insulator-metal (MIM) capacitor and methods for fabricating the devices. The MIM capacitor includes a plurality of trenches in a Silicon (Si) substrate; a porous Si surface formed in the plurality of trenches, where the porous Si surface has an irregular surface on sidewalls and bottoms of the plurality of trenches; an oxide layer conformally disposed on the porous Si surface; a first plate conformally disposed on the oxide layer; a first dielectric layer conformally disposed on the first plate; and a second plate conformally disposed on the first dielectric, where the first plate, the first dielectric layer, and the second plate, each have an irregular surface that generally conforms to the irregular surface of the porous Si surface.

Semiconductor devices with flexibility in capacitor design for power noise reduction

A semiconductor device includes a first functional block configured to provide a first predetermined function, a second functional block configured to provide a second predetermined function, a first capacitive device, a second capacitive device, a first coupling path, a first switch device and a second switch device. The first capacitive device is disposed physically proximate the first functional block. The second capacitive device is disposed physically proximate the second functional block. The first coupling path includes at least a first connection node connecting to the first functional block. The first switch device is controlled to selectively connect the first capacitive device to the first connection node. The second switch device is controlled to selectively connect the second capacitive device to the second functional block or a second connection node. The second connection node is disposed on the first coupling path and connecting to the first connection node.

Integrated Circuit Structure and Method
20220344287 · 2022-10-27 ·

A semiconductor device includes a first plurality of dies encapsulated by an encapsulant, an interposer over the first plurality of dies, an interconnect structure over and electrically connected to the interposer, and a plurality of conductive pads on a surface of the interconnect structure opposite the interposer. The interposer includes a plurality of embedded passive components. Each die of the first plurality of dies is electrically connected to the interposer. The interconnect structure includes a solenoid inductor in a metallization layer of the interconnect structure.

INTEGRATED PASSIVE DEVICES

Disclosed are a device and techniques for fabricating the device. The device may include a top substrate including a plurality of top vias coupled to a first top metal layer that forms a top winding portion of a first inductor. The device also includes a middle substrate including one or more middle metal layers. The top substrate is disposed on the middle substrate. The one or more middle metal layers form a middle winding portion of the first inductor. The device also includes a bottom substrate electrically coupled to the middle substrate opposite the top substrate, where a first bottom metal layer of the bottom substrate forms a bottom winding portion of the first inductor.