Patent classifications
H01S5/2226
SURFACE EMITTING LASER STRUCTURE
A surface emitting laser with improved efficiency includes a conductive substrate, a metal bonding layer, a laser structure layer, an epitaxial semiconductor reflection layer, and an electrode layer. The laser structure layer has an epitaxial current-blocking layer having a current opening. Currents are only transmitting through the current opening. The epitaxial current-blocking layer is grown by a semiconductor epitaxy process to confine the range of the currents to form electric fields. Heat dissipation and electrical conduction properties are improved by the conductive substrate. Because the epitaxial current-blocking layer is not made by destructive manufacturing method, the efficiency of the surface emitting laser can be improved.
Semiconductor strip laser and semiconductor component
A semiconductor strip laser and a semiconductor component are disclosed. In embodiments the laser includes a first semiconductor region of a first conductivity type of a semiconductor body, a second semiconductor region of a second different conductivity type of the semiconductor body, at least one active zone of the semiconductor body configured to generate laser radiation between the first and second semiconductor regions. The laser further includes a strip waveguide formed at least in the second semiconductor region and providing a one-dimensional wave guidance along a waveguide direction of the laser radiation generated in the active zone during operation, a first electric contact on the first semiconductor region, a second electric contact on the second semiconductor region and at least one heat spreader dimensionally stably connected to the semiconductor body at least up to a temperature of 220 C., and having an average thermal conductivity of at least 50 W/m.Math.K.
Tunable laser source, optical transmitter, and optical transmitter and receiver module
A tunable laser source includes a mirror, a tunable filter, and a semiconductor optical amplifier integrated device including first, second, and third semiconductor optical amplifiers between a first end face facing toward the tunable filter and a second end face facing away from the first end face. The first amplifier is closer to the first end face than the second and third amplifiers. The semiconductor optical amplifier integrated device further includes a partially reflecting mirror and an optical divider that are disposed between the first amplifier and the second and third amplifiers. The partially reflecting mirror is closer to the first amplifier than the optical divider. The optical divider includes first and second branches connected to the second and third semiconductor optical amplifiers, respectively. The tunable filter and the first amplifier are disposed in an optical path between the partially reflecting mirror and the mirror that form a laser resonator.
PROCESS OF FORMING SEMICONDUCTOR OPTICAL DEVICE AND SEMICONDUCTOR OPTICAL DEVICE
A semiconductor laser diode type of a buried-hetero structure (BH-LD) is disclosed. The LD provides a mesa, a first burying layer, and a second burying layer, where the burying layers are provided in respective sides of the mesa so as to expose a top of the mesa. The mesa includes a lower cladding layer, an active layer, and an upper cladding layer, where the cladding layers have conduction type opposite to each other and, combined with the burying layers, constitute a carrier confinement structure. The second burying layer has an even surface overlapping with an even surface of the first burying layer, and has a thickness in a portion of the even surface that is thinner than a thickness thereof in a portion except for the even surface.
Semiconductor Strip Laser and Semiconductor Component
A semiconductor strip laser and a semiconductor component are disclosed. In embodiments the laser includes a first semiconductor region of a first conductivity type of a semiconductor body, a second semiconductor region of a second different conductivity type of the semiconductor body, at least one active zone of the semiconductor body configured to generate laser radiation between the first and second semiconductor regions. The laser further includes a strip waveguide formed at least in the second semiconductor region and providing a one-dimensional wave guidance along a waveguide direction of the laser radiation generated in the active zone during operation, a first electric contact on the first semiconductor region, a second electric contact on the second semiconductor region and at least one heat spreader dimensionally stably connected to the semiconductor body at least up to a temperature of 220 C., and having an average thermal conductivity of at least 50 W/m.Math.K.
TUNABLE LASER SOURCE, OPTICAL TRANSMITTER, AND OPTICAL TRANSMITTER AND RECEIVER MODULE
A tunable laser source includes a mirror, a tunable filter, and a semiconductor optical amplifier integrated device including first, second, and third semiconductor optical amplifiers between a first end face facing toward the tunable filter and a second end face facing away from the first end face. The first amplifier is closer to the first end face than the second and third amplifiers. The semiconductor optical amplifier integrated device further includes a partially reflecting mirror and an optical divider that are disposed between the first amplifier and the second and third amplifiers. The partially reflecting mirror is closer to the first amplifier than the optical divider. The optical divider includes first and second branches connected to the second and third semiconductor optical amplifiers, respectively. The tunable filter and the first amplifier are disposed in an optical path between the partially reflecting mirror and the mirror that form a laser resonator.
SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND METHOD FOR IDENTIFYING SEMICONDUCTOR DEVICE
A semiconductor device according to the present disclosure includes: a semiconductor substrate; semiconductor layers formed on the semiconductor substrate; an identification pattern region provided in a predetermined portion on the semiconductor substrate; and needle-shaped structures or dome-shaped structures in which the needle-shaped structures are covered with a SiO.sub.2 insulating film, which are formed at random positions within the identification pattern region.
Diode laser with current block
The present invention relates to a diode laser with a current block and, in particular, to a diode laser with a modified p-n-p or n-p-n structure as a current block for reducing the tunneling probability. A diode laser according to the invention comprises an active layer and a layered current block formed outside the active layer, wherein the current block is made of a material doped in opposition to its surroundings for a spatially selective current injection of the active layer between an n-substrate and a p-contact; wherein the current block is separated from adjacent layers via an intrinsic outer layer.
Light-emitting device
Provided is a light-emitting device that includes a light emission section, a separation groove, and a high reflectance region. The light emission section includes a stack structure including an active layer, a first reflector, and a second reflector. The active layer performs light emission by current injection. The first reflector and the second reflector are stacked in a first direction with the active layer interposed therebetween. The separation groove is provided symmetrically around the light emission section on an emission surface of light from the stack structure in the first direction. The separation groove is dug in the stack structure in the first direction. The high resistance region is provided in the stack structure on the outer side of an outermost shape of the separation groove on the emission surface. The high resistance region has electrical resistance higher than that of the light emission section.
SEMICONDUCTOR LIGHT-EMITTING ELEMENT AND METHOD OF MANUFACTURING THE SAME
A semiconductor light-emitting element includes: a substrate; an n-type clad layer above the substrate; an active layer above the n-type clad layer; and a p-type clad layer above the active layer. The active layer includes: a well layer; an n-side first barrier layer on an n-type clad layer side of the well layer; and a p-side barrier layer on a p-type clad layer side of the well layer. The p-side barrier layer comprises In. The n-side first barrier layer has an In composition ratio lower than an In composition ratio of the p-side barrier layer. The n-side first barrier layer has a band gap energy smaller than a band gap energy of the p-side barrier layer.