A bulk-acoustic wave resonator may include: a substrate; a resonator unit including a first electrode disposed on the substrate, a piezoelectric layer disposed on the first electrode, and a second electrode disposed on the piezoelectric layer; and a protective layer disposed on a surface of the resonator unit. The protective layer is formed of a diamond film, and a grain size of the diamond film is 50 nm or more.

A resonator includes a silicon substrate, a bottom electrode stacked on a portion of the silicon substrate, a piezoelectric layer covering the bottom electrode and another portion of the silicon substrate, a top electrode stacked on the piezoelectric layer, and a Bragg reflecting ring. The Bragg reflecting ring is formed on a side of the piezoelectric layer connected to the top electrode and surrounds the top electrode. The Bragg reflecting ring includes a Bragg high-resistivity layer and a Bragg low-resistivity layer alternately arranged along the radial direction of the Bragg reflecting ring. An acoustic impedance of the Bragg high-resistivity layer is greater than an acoustic impedance of the Bragg low-resistivity layer. The Bragg reflecting ring forms reflection surfaces to reflect the laterally propagating clutter waves, thereby suppressing the parasitic mode in the working frequency band, improving the frequency response curve of the resonator and the overall performance of the resonator.

A resonance device is provided that includes a lower lid that has a recessed portion, and a resonator that is mounted on the lower lid and has a vibration arm that performs out-of-plane bending vibration in a space including the recessed portion and a frame provided around the vibration arm and having a facing portion facing a tip of the vibration arm. The facing portion of the frame is located in an outer-side portion of the resonator with respect to a straight line connecting an intersection point of a perpendicular extending from the tip of the vibration arm toward the recessed portion of the lower lid and the recessed portion of the lower lid, to a cavity edge of the recessed portion facing the tip of the vibration arm.

A bulk acoustic wave (BAW) resonator includes a substrate, a piezoelectric layer disposed above the substrate, a first electrode disposed below the piezoelectric layer, a second electrode disposed above the piezoelectric layer, a first dielectric layer, a second dielectric layer, and a third dielectric layer disposed between the substrate and the piezoelectric layer, and a bonding layer disposed between the third dielectric layer and the substrate. The first dielectric layer is disposed below the piezoelectric layer and includes a cavity. The third dielectric layer is disposed below the first dielectric layer and includes a protruding structure protruding towards the piezoelectric layer. The second dielectric layer overlays the third dielectric layer including the protruding structure, the second dielectric layer and the protruding structure of the third dielectric layer constituting a double-wall boundary structure surrounding the cavity.

An acoustic wave device includes a support substrate, a piezoelectric layer, and a functional electrode. As seen in a first direction of the support substrate, the piezoelectric layer overlaps the support substrate. The functional electrode extends over a first major surface of the piezoelectric layer. A space is opposite to the first major surface of the piezoelectric layer and at or adjacent to a second major surface of the piezoelectric layer. In the first direction, the functional electrode extends over an overlap region that overlaps the space, and a non-overlap region that does not overlap the space. In the non-overlap region, at least one of an insulating film and a void is located between the functional electrode and the piezoelectric layer.

An acoustic resonator with a reinforcing structure is provided according to the present disclosure. The acoustic resonator includes a substrate and a cavity formed on the substrate, a piezoelectric layer is arranged above the substrate and an opening passing through the piezoelectric layer is formed in a peripheral region of the piezoelectric layer. The reinforcing structure includes a reinforcing layer, part of the reinforcing layer is formed at the edge of the opening with being fitted to the edge, to reinforce a resonant functional layer near the edge of the opening, which can reduce a change in stress of the piezoelectric layer and the lower electrode near the edge of the opening after the cavity is released, so that the piezoelectric layer and the lower electrode do not easily collapse due to stress, thereby ensuring the performance of a device. A method for manufacturing the same is further provided.

An electroacoustic device includes, stacked in a direction a silicon-based substrate, a first electrode, a piezoelectric layer with the basis of a perovskite taken from among lithium niobate LiNbO3, lithium tantalum LiTaO3, or an Li(Nb,Ta)O3 alloy, on the first electrode, a second electrode disposed on the piezoelectric layer. Advantageously, the first electrode is made of a nitride-based electrically conductive refractory material, such as TiN, VN, TaN. The invention also relates to a method for producing such a device.

A method for fabricating a multi-layer resonator assembly includes sequentially fabricating a plurality of vertically-stacked resonator layers including, for each resonator layer of the plurality of resonator layers, depositing a dielectric layer, forming at least one film bulk acoustic resonator (FBAR) cavity in the deposited dielectric layer, filling each FBAR cavity of the at least one FBAR cavity with a sacrificial material block, and depositing a FBAR material stack over the at least one FBAR cavity. The deposited FBAR material stack is in contact with the sacrificial material block and the dielectric layer. The method further includes removing the sacrificial material block from the at least one FBAR cavity for each resonator layer of the plurality of resonator layers subsequent to sequentially fabricating the plurality of resonator layers.

An acoustic resonator package is provided. The acoustic resonator package includes a substrate, a cap, a plurality of acoustic resonators disposed between the substrate and the cap and configured to be electrically connected to each other, a grounding member disposed between the substrate and the cap, and a breakdown voltage shortener configured to provide an air gap to shorten a breakdown voltage between one of the plurality of acoustic resonators and the grounding member.

An acoustic wave device is provided comprising a substrate and at least one resonator structure of a first type and at least one resonator structure of a second type mounted on the substrate. The resonator structures of the first type are configured to operate as capacitors and have a first thickness, causing the resonator structures to have a first passband frequency range. The resonator structures of the second type have a second thickness that is different from the first thickness, causing the resonator structures to have a second passband frequency range. A method for forming such an acoustic wave device is also provided. A die comprising such an acoustic wave device, a filter comprising such an acoustic wave device, a radio-frequency module comprising such an acoustic wave device, and a wireless mobile device comprising such an acoustic wave device are also provided.